Dr. Wolf-Dieter Domke Profile

Dr. Wolf-Dieter Domke

at Qimonda Dresden GmbH & Co OHG

SPIE Involvement:

Author

Proceedings Article | 2 April 2007 Paper

Performance of chemically amplified resists at half-pitch of 45 nm and below

Yayi Wei, Markus Bender, Wolf-Dieter Domke, Antje Laessig, Michael Sebald, Sven Trogisch, David Back

Proceedings Volume 6519, 65190R (2007) https://doi.org/10.1117/12.706887

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Lithography, Image processing, Chemically amplified resists, EUV optics, 193nm lithography, Image resolution

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV mask architectures by process window analysis

Siegfried Schwarzl, Frank-Michael Kamm, Stefan Hirscher, Klaus Lowack, Wolf-Dieter Domke, Markus Bender, Stefan Wurm, Adam Pawloski, Bruno La Fontaine, Christian Holfeld, Uwe Dersch, Florian Letzkus, Joerg Butschke

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

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Proceedings Article | 4 May 2005 Paper

Comparison of resist outgassing at wavelengths from 193 nm to 13 nm

Wolf-Dieter Domke, Karl Kragler, Marion Kern, Klaus Lowack, Oliver Kirch, Michele Bertolo

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599543

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Spectroscopy, Synchrotrons, Ions, Chromatography, Diffusion, Molecules, 193nm lithography

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Proceedings Article | 6 December 2004 Paper

Comparative study of mask architectures for EUV lithography

Adam Pawloski, Bruno La Fontaine, Harry Levinson, Stefan Hirscher, Siegfried Schwarzl, Klaus Lowack, Frank-Michael Kamm, Markus Bender, Wolf-Dieter Domke, Christian Holfeld, Uwe Dersch, Patrick Naulleau, Florian Letzkus, Joerg Butschke

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

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Proceedings Article | 1 July 2002 Paper

EUV photoresist performance results from the VNL and the EUV LLC

Jonathan Cobb, Paul Dentinger, Luke Hunter, Donna O'Connell, Gregg Gallatin, William Hinsberg, Frances Houle, Martha Sanchez, Wolf-Dieter Domke, Stefan Wurm, Uzodinma Okoroanyanwu, Sang Hun Lee

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

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Proceedings Article | 23 June 2000 Paper

193-nm photoresists at 130-nm node: which lithographic performances for which chemical platform?

Gilles Amblard, Jeff Byers, Wolf-Dieter Domke, Georgia Rich, Victoria Graffenberg, Shashikant Patel, Daniel Miller, Gabriel Perez

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388323

KEYWORDS: Monochromatic aberrations, Chlorine, Etching, Photoresist materials, Lithography, Silicon, Polymers, Critical dimension metrology, Semiconducting wafers, Aluminum

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Proceedings Article | 23 June 2000 Paper

Pattern collapse in high-aspect-ratio DUV and 193-nm resists

Wolf-Dieter Domke, Victoria Graffenberg, Shashikant Patel, Georgia Rich, Heidi Cao, Paul Nealey

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388293

KEYWORDS: Deep ultraviolet, Photoresist materials, Capillaries, Photoresist processing, Aluminum, Thin films, Photoresist developing, Bismuth, Chlorine, Silicon

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Proceedings Article | 26 July 1999 Paper

Optical extension at the 193-nm wavelength

Peter Zandbergen, Martin McCallum, Gilles Amblard, Wolf-Dieter Domke, Bruce Smith, Lena Zavyalova, John Petersen

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354343

KEYWORDS: Fiber optic illuminators, Photomasks, 193nm lithography, Binary data, Lithography, Optical lithography, Phase shifts, Lithographic illumination, Photoresist processing, Optics manufacturing

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Proceedings Article | 28 April 1999 Paper

193-nm lithography: new challenges, new worries

Martin McCallum, Wolf-Dieter Domke, Jeff Byers, David Stark

Proceedings Volume 3741, (1999) https://doi.org/10.1117/12.346900

KEYWORDS: Etching, Oxides, Optical lithography, Lithography, Photoresist materials, 193nm lithography, Chemistry, Resistance, Manufacturing, Photomasks

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Proceedings Article | 29 June 1998 Paper

Dual-wavelength photoresist for sub-200-nm lithography

Stefan Hien, Guenther Czech, Wolf-Dieter Domke, Hans Raske, Michael Sebald, Iris Stiebert

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312403

KEYWORDS: Photoresist materials, Photoresist developing, Photoresist processing, Etching, Lithography, Polymers, Silicon, Plasma, Standards development, Industrial chemicals

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Showing 5 of 10 publications

Conference Committee Involvement (3)

Advances in Resist Technology and Processing XXII

28 February 2005 | San Jose, California, United States

Advances in Resist Technology and Processing XXI

23 February 2004 | Santa Clara, California, United States

Advances in Resist Technology and Processing XX

24 February 2003 | Santa Clara, California, United States

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