Mr. Masafumi Asano Profile

Masafumi Asano

Director at Tokyo Electron Ltd

SPIE Involvement:

Conference Program Committee | Author

Publications (40)

Proceedings Article | 28 March 2017 Paper

Application of advanced hybrid metrology method to nanoimprint lithography

Ilya Osherov, Limor Issacharoff, Oram Gedalia, Koichi Wakamoto, Matthew Sendelbach, Masafumi Asano

Proceedings Volume 10145, 101451X (2017) https://doi.org/10.1117/12.2266577

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Metrology, Scatterometry, Lithography, Scatter measurement, Critical dimension metrology, Semiconductors, Optical lithography, Quality measurement, Scanning electron microscopy, 3D modeling

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Proceedings Article | 28 March 2017 Presentation + Paper

Required metrology and inspection for nanoimprint lithography

Masafumi Asano, Hideaki Abe, Kazuto Matsuki, Ryoji Yoshikawa, Motofumi Komori, Takashi Hirano, Shinji Mikami, Yongho Kim, Eunhyuk Choi, Woo-Yung Jung

Proceedings Volume 10145, 101450J (2017) https://doi.org/10.1117/12.2258369

KEYWORDS: Inspection, Nanoimprint lithography, Metrology, Lithography, Process control, Scatterometry, Semiconducting wafers, Optical inspection, Scanning electron microscopy, Optical lithography

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Proceedings Article | 21 March 2017 Presentation + Paper

Study of nanoimprint lithography (NIL) for HVM of memory devices

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Masato Suzuki, Kazuya Fukuhara, Masafumi Asano, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10144, 1014406 (2017) https://doi.org/10.1117/12.2257951

KEYWORDS: Nanoimprint lithography, Overlay metrology, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Nanotechnology, Semiconducting wafers, Optical lithography, Particles, Distortion, Optical alignment, Inspection

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Proceedings Article | 8 March 2016 Paper

Scatterometry-based process control for nanoimprint lithography

Masafumi Asano, Hirotaka Tsuda, Motofumi Komori, Kazuto Matsuki, Hideaki Abe, Woo-Yung Jung

Proceedings Volume 9778, 977820 (2016) https://doi.org/10.1117/12.2218994

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Process control, Scatterometry, Etching, Manufacturing, Photoresist processing, Metrology, Image processing, Lithography, Semiconducting wafers, Optical lithography, Control systems, Photomasks

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SPIE Journal Paper | 19 December 2014

Effect of measurement error budgets and hybrid metrology on qualification metrology sampling

Matthew Sendelbach, Niv Sarig, Koichi Wakamoto, Hyang Kyun (Helen) Kim, Paul Isbester, Masafumi Asano, Kazuto Matsuki, Carmen Osorio, Chas Archie

JM3, Vol. 13, Issue 04, 041414, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041414

KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement

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Proceedings Article | 2 April 2014 Paper

Impact of shrinking measurement error budgets on qualification metrology sampling and cost

Matthew Sendelbach, Niv Sarig, Koichi Wakamoto, Hyang Kyun (Helen) Kim, Paul Isbester, Masafumi Asano, Kazuto Matsuki, Alok Vaid, Carmen Osorio, Chas Archie

Proceedings Volume 9050, 90501M (2014) https://doi.org/10.1117/12.2048933

KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Error analysis, Semiconducting wafers, Scatterometry, Semiconductors, Statistical modeling, Calibration, Measurement devices

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Proceedings Article | 10 April 2013 Paper

Application of optical CD metrology for alternative lithography

Masafumi Asano, Akiko Kawamoto, Kazuto Matsuki, Stephane Godny , Tingsheng Lin, Koichi Wakamoto

Proceedings Volume 8681, 86812C (2013) https://doi.org/10.1117/12.2010887

KEYWORDS: Nanoimprint lithography, Lithography, Metrology, Critical dimension metrology, Etching, 3D metrology, Coating, Process control, Transmission electron microscopy, Directed self assembly

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Proceedings Article | 10 April 2013 Paper

Hybrid approach to optical CD metrology of directed self-assembly lithography

Stephane Godny, Masafumi Asano, Akiko Kawamoto, Koichi Wakamoto, Kazuto Matsuki, Cornel Bozdog, Matthew Sendelbach, Igor Turovets, Ronen Urenski, Renan Milo

Proceedings Volume 8681, 86812D (2013) https://doi.org/10.1117/12.2012660

KEYWORDS: Metrology, Critical dimension metrology, Scanning transmission electron microscopy, Semiconducting wafers, Lithography, Polymers, Process control, Chemical elements, Geometrical optics, Directed self assembly

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SPIE Journal Paper | 1 January 2011

Effective exposure dose monitoring technique in extreme ultraviolet lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

JM3, Vol. 10, Issue 1, 013005, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533231

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

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Proceedings Article | 27 May 2010 Paper

Effective-exposure-dose monitoring technique in EUV lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

Proceedings Volume 7748, 774824 (2010) https://doi.org/10.1117/12.868924

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Manufacturing, Diffraction, Semiconducting wafers, Critical dimension metrology, Optical lithography, Lithographic illumination, Extreme ultraviolet

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Proceedings Article | 2 April 2010 Paper

Influence of error distribution shape on process capability analysis

Masafumi Asano, Takahiro Ikeda

Proceedings Volume 7638, 763827 (2010) https://doi.org/10.1117/12.846471

KEYWORDS: Statistical analysis, Critical dimension metrology, Error analysis, Semiconductor manufacturing, Data analysis, Shape analysis, Process control, Metrology, Monte Carlo methods, Tolerancing

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Proceedings Article | 2 April 2010 Paper

Overlay sampling optimization by operating characteristic curves empirically estimated

Kentaro Kasa, Masafumi Asano, Takahiro Ikeda, Manabu Takakuwa, Nobuhiro Komine, Kazutaka Ishigo

Proceedings Volume 7638, 76382G (2010) https://doi.org/10.1117/12.846344

KEYWORDS: Inspection, Semiconducting wafers, Error analysis, Overlay metrology, Visualization, Statistical analysis, Optimization (mathematics), Semiconductors, Lithography, Metrology

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Proceedings Article | 1 April 2009 Paper

Resist process control for 32-nm logic node and beyond with NA > 1.30 immersion exposure tool

Seiji Nagahara, Kazuhiro Takahata, Seiji Nakagawa, Takashi Murakami, Kazuhiro Takeda, Shinpei Nakamura, Makoto Ueki, Masaki Satake, Tatsuhiko Ema, Hiroharu Fujise, Hiroki Yonemitsu, Yuriko Seino, Shinichiro Nakagawa, Masafumi Asano, Yosuke Kitamura, Takayuki Uchiyama, Shoji Mimotogi, Makoto Tominaga

Proceedings Volume 7273, 72733A (2009) https://doi.org/10.1117/12.813498

KEYWORDS: Resolution enhancement technologies, Logic, Optical lithography, Line width roughness, Photoresist processing, Lithography, Photomasks, Copper, Diffusion, Logic devices

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Proceedings Article | 16 March 2009 Paper

Feasibility of ultra-low k1 lithography for 28nm CMOS node

Shoji Mimotogi, Kazuhiro Takahata, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Masaki Satake, Yosuke Kitamura, Tomoko Ojima, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Hiroki Yonemitsu, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Makoto Tominaga, Soichi Inoue

Proceedings Volume 7274, 72741F (2009) https://doi.org/10.1117/12.814040

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Binary data, Scanners, SRAF, Logic devices, Optical lithography, Metals, Semiconductors

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Proceedings Article | 16 March 2009 Paper

New process proximity correction using neural network in spacer patterning technology

Fumiharu Nakajima, Toshiya Kotani, Satoshi Tanaka, Masafumi Asano, Soichi Inoue

Proceedings Volume 7274, 72740J (2009) https://doi.org/10.1117/12.813614

KEYWORDS: Data modeling, Personal protective equipment, Neural networks, Optical lithography, Data acquisition, Aerospace engineering, Lithography, Photomasks, Cadmium sulfide, Etching

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Proceedings Article | 4 December 2008 Paper

Patterning performance of hyper NA immersion lithography for 32nm node logic process

Kazuhiro Takahata, Masanari Kajiwara, Yosuke Kitamura, Tomoko Ojima, Masaki Satake, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyo, Akiko Nomachi, Hideaki Harakawa, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 7140, 714017 (2008) https://doi.org/10.1117/12.804739

KEYWORDS: Resolution enhancement technologies, Optical lithography, Logic, Lithography, SRAF, Metals, Immersion lithography, Semiconductors, Optical proximity correction, Logic devices

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Proceedings Article | 19 May 2008 Paper

Impact of patterning strategy on mask fabrication beyond 32nm

Shoji Mimotogi, Tomotaka Higaki, Hideki Kanai, Satoshi Tanaka, Masaki Satake, Yosuke Kitamura, Katsuyoshi Kodera, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kazuhiro Takahata, Soichi Inoue

Proceedings Volume 7028, 702814 (2008) https://doi.org/10.1117/12.793045

KEYWORDS: Optical lithography, Photomasks, Double patterning technology, Critical dimension metrology, Lithography, Mask making, Logic devices, Optical alignment, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 16 April 2008 Paper

Impact of sampling on uncertainty: semiconductor dimensional metrology applications

Benjamin Bunday, Bart Rijpers, Bill Banke, Chas Archie, Ingrid Peterson, Vladimir Ukraintsev, Thomas Hingst, Masafumi Asano

Proceedings Volume 6922, 69220X (2008) https://doi.org/10.1117/12.772993

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Metrology, Process control, Statistical analysis, Calibration, Scatterometry, Multiphoton fluorescence microscopy, Scanning electron microscopy, Etching

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Proceedings Article | 1 April 2008 Paper

Patterning strategy and performance of 1.3NA tool for 32nm node lithography

Shoji Mimotogi, Masaki Satake, Yosuke Kitamura, Kazuhiro Takahata, Katsuyoshi Kodera, Hiroharu Fujise, Tatsuhiko Ema, Koutaro Sho, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kenji Yoshida, Hideki Kanai, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Katsura Miyashita, Soichi Inoue

Proceedings Volume 6924, 69240M (2008) https://doi.org/10.1117/12.772201

KEYWORDS: Lithography, Optical lithography, Scanners, SRAF, Semiconducting wafers, Lithographic illumination, Metals, Photomasks, Semiconductors, Logic devices

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Proceedings Article | 22 March 2008 Paper

Lot acceptance sampling inspection plan for non-normal CD distribution

Takahiro Ikeda, Masafumi Asano

Proceedings Volume 6922, 692214 (2008) https://doi.org/10.1117/12.771878

KEYWORDS: Inspection, Process control, Metrology, Optical lithography, Strontium, Fiber Bragg gratings, Lithography

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Proceedings Article | 5 April 2007 Paper

Statistical approach utilizing neural networks for CD error prediction

Masafumi Asano, Masaki Satake, Satoshi Tanaka, Shoji Mimotogi

Proceedings Volume 6518, 651812 (2007) https://doi.org/10.1117/12.712115

KEYWORDS: Neural networks, Critical dimension metrology, Lithography, Cadmium, Data modeling, Photomasks, Error analysis, Model-based design, Phase shifts, Semiconductor manufacturing

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Proceedings Article | 27 March 2007 Paper

Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2

Shoji Mimotogi, Fumikatsu Uesawa, Makoto Tominaga, Hiroharu Fujise, Koutaro Sho, Mikio Katsumata, Hiroki Hane, Atsushi Ikegami, Seiji Nagahara, Tatsuhiko Ema, Masafumi Asano, Hideki Kanai, Taiki Kimura, Masaaki Iwai

Proceedings Volume 6520, 652008 (2007) https://doi.org/10.1117/12.711049

KEYWORDS: Lithography, Immersion lithography, Photomasks, Critical dimension metrology, Phase shifting, Lithographic illumination, Phase shifts, Logic, Metals, Semiconductors

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SPIE Journal Paper | 1 October 2006

Evaluation of producer's and consumer's risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology

Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe

JM3, Vol. 5, Issue 04, 043006, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397034

KEYWORDS: Scanning electron microscopy, Scatterometry, Metrology, Critical dimension metrology, Monte Carlo methods, Inspection, Stereolithography, Manufacturing, Time metrology, Optical proximity correction

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SPIE Journal Paper | 1 July 2006

Sampling plan optimization for critical dimension metrology

Masafumi Asano, Takahiro Ikeda

JM3, Vol. 5, Issue 03, 033008, (July 2006) https://doi.org/10.1117/12.10.1117/1.2242815

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Proceedings Article | 24 March 2006 Paper

Inline CD metrology with combined use of scatterometry and CD-SEM

Masafumi Asano, Takahiro Ikeda, Toru Koike, Hideaki Abe

Proceedings Volume 6152, 61521V (2006) https://doi.org/10.1117/12.656326

KEYWORDS: Scatterometry, Critical dimension metrology, Metrology, Scanning electron microscopy, Monte Carlo methods, Inspection, Time metrology, Statistical analysis, Optics manufacturing, Line edge roughness

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Proceedings Article | 10 May 2005 Paper

Usage of profile information obtained with scatterometry

Toru Koike, Masafumi Asano, Toru Mikami, Yuichiro Yamazaki

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600325

KEYWORDS: Scatterometry, Photoresist materials, Critical dimension metrology, Metrology, Silicon, Atomic force microscopy, Data modeling, Process control, Scatter measurement, Semiconducting wafers

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Proceedings Article | 10 May 2005 Paper

Sampling plan optimization for CD control in low k1 lithography

Masafumi Asano, Toru Koike, Toru Mikami, Hideaki Abe, Takahiro Ikeda, Satoshi Tanaka, Shoji Mimotogi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600370

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Error analysis, Lithography, Neptunium, Metrology, Statistical analysis, Manufacturing, Reticles, Process control

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Proceedings Article | 28 May 2004 Paper

Approach for reducing resist footing over nonplanar wafer

Ayako Endo, Takashi Sato, Masafumi Asano, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536108

KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Binary data, Diffractive optical elements, Ions, Lithography, Photoresist processing, Chemical mechanical planarization, Optical lithography

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SPIE Journal Paper | 1 April 2004

Novel in-situ focus monitor technology in attenuated phase shift mask under actual illumination conditions

Kyoko Izuha, Masafumi Asano, Tadahito Fujisawa, Soichi Inoue

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669541

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Phase shifts, Optical testing, Data conversion, Phase shifting, Wafer-level optics, Reticles, Critical dimension metrology

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Proceedings Article | 26 June 2003 Paper

Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition

Kyoko Izuha, Masafumi Asano, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485364

KEYWORDS: Photomasks, Semiconducting wafers, Transmittance, Phase shifting, Reticles, Phase shifts, Critical dimension metrology, Calibration, Optical lithography, Illumination engineering

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Proceedings Article | 2 June 2003 Paper

Run-to-run CD error analysis and control with monitoring of effective dose and focus

Masafumi Asano, Tadahito Fujisawa, Kyoko Izuha, Soichi Inoue

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482807

KEYWORDS: Critical dimension metrology, Reticles, Error analysis, Semiconducting wafers, Error control coding, Monte Carlo methods, Control systems, Optical lithography, Metrology, Etching

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SPIE Journal Paper | 1 April 2003

Effective exposure-dose monitor technique for critical dimension control in optical lithography

Masafumi Asano, Kyoko Izuha, Tadahito Fujisawa, Soichi Inoue

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1564594

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Photoresist processing, Optical lithography, Lithography, Metrology, Error analysis, Control systems, Optical testing

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SPIE Journal Paper | 1 October 2002

Desirable reticle flatness from focus deviation standpoint in optical lithography

Soichi Inoue, Masamitsu Itoh, Masafumi Asano, Katsuya Okumura, Tsuneyuki Hagiwara, Jiro Moriya

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1503806

KEYWORDS: Reticles, Calibration, Artificial intelligence, Optical lithography, Shape analysis, Semiconducting wafers, Distortion, Monochromatic aberrations, Projection systems, Differential equations

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Proceedings Article | 30 July 2002 Paper

CD control with effective exposure dose monitor technique in photolithography

Masafumi Asano, Kyoko Izuha, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474577

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Photoresist processing, Optical lithography, Control systems, Scanners, Metrology, Lithography, Optical testing

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Proceedings Article | 30 July 2002 Paper

Desirable reticle flatness from focus deviation standpoint optical lithography

Soichi Inoue, Masamitsu Itoh, Masafumi Asano, Katsuya Okumura, Tsuneyuki Hagiwara, Jiro Moriya

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474600

KEYWORDS: Reticles, Artificial intelligence, Calibration, Optical lithography, Shape analysis, Distortion, Projection systems, Lithography, Interferometers, Differential equations

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Proceedings Article | 30 July 2002 Paper

Wafer flatness for CD control in photolithography

Tadahito Fujisawa, Masafumi Asano, T. Sutani, Soichi Inoue, Hiroaki Yamada, Junji Sugamoto, Katsuya Okumura, Tsuneyuki Hagiwara, Satoshi Oka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474630

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical lithography, Scanners, Adsorption, Lithography, Error analysis, Surface finishing, Semiconductors, Polishing

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Proceedings Article | 19 July 2000 Paper

Novel methodology for 130-nm DRAM cell mask size optimization

Hideyuki Kanemitsu, Kouichi Nagai, Masafumi Asano, T. Sutani

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392052

KEYWORDS: Photomasks, Electroluminescence, Lithography, Scanners, Critical dimension metrology, Phase shifts, Resolution enhancement technologies, Photoresist processing, Error analysis, Transmittance

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Proceedings Article | 29 June 1998 Paper

Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography

Masafumi Asano, Yumiko Maruyama, Toru Koike, Kenji Chiba, Eishi Shiobara, Takahiro Ikeda

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312447

KEYWORDS: Photoresist processing, Image processing, Lithography, Critical dimension metrology, Etching, Excimer lasers, Scanning electron microscopy, Reactive ion etching, Lithographic illumination, Geometrical optics

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Proceedings Article | 14 June 1996 Paper

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

Yasunobu Onishi, Kazuo Sato, Kenzi Chiba, Masafumi Asano, Hirokazu Niki, Rumiko Hayase, Takao Hayashi

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241861

KEYWORDS: Polymers, Excimer lasers, Photoresist processing, Halftones, Lithography, Photomasks, Phase shifting, Excimers, Deep ultraviolet, Scanning electron microscopy

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Proceedings Article | 3 July 1995 Paper

Lithographic performance of SiNx single-layer halftone mask

Kenji Kawano, Masafumi Asano, Satoshi Tanaka, Takayuki Iwamatsu, Hiroyuki Sato, Shinichi Ito

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212784

KEYWORDS: Transmittance, Halftones, Deep ultraviolet, Photomasks, Lithography, Phase shifts, Mercury, Lamps, Quartz, Silicon

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Showing 5 of 40 publications

Conference Committee Involvement (16)

Metrology, Inspection, and Process Control XXXIX

24 February 2025 | San Jose, California, United States

Metrology, Inspection, and Process Control XXXVIII

26 February 2024 | San Jose, California, United States

Metrology, Inspection, and Process Control XXXVII

27 February 2023 | San Jose, California, United States

Metrology, Inspection, and Process Control XXXVI

25 April 2022 | San Jose, California, United States

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

22 February 2021 | Online Only, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXIV

24 February 2020 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXIII

25 February 2019 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXII

26 February 2018 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXXI

27 February 2017 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXX

22 February 2016 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIX

23 February 2015 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVIII

24 February 2014 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVII

25 February 2013 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXVI

13 February 2012 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXV

28 February 2011 | San Jose, California, United States

Metrology, Inspection, and Process Control for Microlithography XXIV

22 February 2010 | San Jose, California, United States

Showing 5 of 16 Conference Committees

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