Dr. Takashi Sato Profile

Dr. Takashi Sato

SPIE Involvement:

Author

Publications (24)

SPIE Journal Paper | 1 January 2011

Effective exposure dose monitoring technique in extreme ultraviolet lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

JM3, Vol. 10, Issue 1, 013005, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533231

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

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Proceedings Article | 27 May 2010 Paper

Effective-exposure-dose monitoring technique in EUV lithography

Yumi Nakajima, Kentaro Kasa, Takashi Sato, Masafumi Asano, Suigen Kyoh, Hiroyuki Mizuno

Proceedings Volume 7748, 774824 (2010) https://doi.org/10.1117/12.868924

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Manufacturing, Diffraction, Semiconducting wafers, Critical dimension metrology, Optical lithography, Lithographic illumination, Extreme ultraviolet

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SPIE Journal Paper | 1 April 2010

Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

JM3, Vol. 9, Issue 02, 023009, (April 2010) https://doi.org/10.1117/12.10.1117/1.3421948

KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

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Proceedings Article | 11 May 2009 Paper

Mask-induced aberration in EUV lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7379, 73790P (2009) https://doi.org/10.1117/12.824266

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Diffraction, Extreme ultraviolet, Lithographic illumination, Polarization, Manufacturing, Tolerancing, Lithography, Critical dimension metrology

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Proceedings Article | 11 May 2009 Paper

Organized DFM

Takashi Sato, Michio Honma, Hiroyuki Itoh, Nobuyuki Iriki, Sachiko Kobayashi, Norihiko Miyazaki, Toshio Onodera, Hiroyuki Suzuki, Nobuyuki Yoshioka, Sumika Arima, Kazuya Kadota

Proceedings Volume 7379, 737934 (2009) https://doi.org/10.1117/12.824354

KEYWORDS: Design for manufacturing, Manufacturing, Standards development, Process modeling, Semiconductors, Information technology, Photomasks, Electronics, Semiconducting wafers, Data processing

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Proceedings Article | 19 May 2008 Paper

Dependence of mask topography effects on pattern variation under hyper-NA lithography

Akiko Mimotogi, Masamitsu Itoh, Shoji Mimotogi, Kazuya Sato, Takashi Sato, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 7028, 70283K (2008) https://doi.org/10.1117/12.793127

KEYWORDS: Photomasks, Diffraction, Waveguides, Lithography, Near field, Semiconducting wafers, Phase shifts, Transmittance, Data modeling, Thin films

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Proceedings Article | 20 March 2008 Paper

Aberration budget in extreme ultraviolet lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 69211A (2008) https://doi.org/10.1117/12.771602

KEYWORDS: Tolerancing, Diffraction, Extreme ultraviolet lithography, Error analysis, Lithography, Phase shifts, Polarization, Manufacturing, Photomasks, Extreme ultraviolet

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Proceedings Article | 12 March 2008 Paper

Influence of pellicle on hyper-NA imaging

Kazuya Sato, Satoshi Nagai, Nakagawa Shinichiro, Takashi Sato, Masamitsu Itoh

Proceedings Volume 6924, 692451 (2008) https://doi.org/10.1117/12.772612

KEYWORDS: Pellicles, Critical dimension metrology, Transmittance, Refractive index, Polarization, Wavefronts, Reflection, Apodization, Phase shifts, Lithography

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Proceedings Article | 7 March 2008 Paper

Prediction of imaging performance of immersion lithography using high refractive index fluid

Takashi Sato, Masamitsu Itoh, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

Proceedings Volume 6924, 69242F (2008) https://doi.org/10.1117/12.772283

KEYWORDS: Photomasks, Transmittance, Pellicles, Lithographic illumination, Lithography, Immersion lithography, Polarization, Diffraction, Refractive index, Projection systems

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Proceedings Article | 14 May 2007 Paper

Virtual lithography system to improve the productivity of high-mix low-volume production

Kenji Yoshida, Takashi Sato, Takuya Kono, Eiji Yamanaka, Mitsuyo Kariya, Arata Inoue, Shoji Mimotogi

Proceedings Volume 6607, 66071J (2007) https://doi.org/10.1117/12.728966

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Critical dimension metrology, Data modeling, Manufacturing, Calibration, Reliability, Optical lithography, Virtual reality

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Proceedings Article | 14 May 2007 Paper

Mask topography effects of hole patterns on hyper-NA lithography

Akiko Mimotogi, Masamitsu Itoh, Shoji Mimotogi, Kazuya Sato, Takashi Sato, Satoshi Tanaka

Proceedings Volume 6607, 66071F (2007) https://doi.org/10.1117/12.728963

KEYWORDS: Photomasks, Diffraction, Waveguides, Lithography, Factor analysis, Logic, Near field, Data modeling, Thin films, Focus stacking software

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Proceedings Article | 26 March 2007 Paper

Mask 3D effect on 45-nm imaging using attenuated PSM

Kazuya Sato, Masamitsu Itoh, Takashi Sato

Proceedings Volume 6520, 65201J (2007) https://doi.org/10.1117/12.710549

KEYWORDS: 3D modeling, Photomasks, 3D image processing, Transmittance, Critical dimension metrology, Nanoimprint lithography, Refractive index, Electroluminescence, Diffraction, Image transmission

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SPIE Journal Paper | 1 October 2006

Impact of polarization on an attenuated phase shift mask with ArF hyper-numerical aperture lithography

Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

JM3, Vol. 5, Issue 04, 043001, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397065

KEYWORDS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method

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Proceedings Article | 19 May 2006 Paper

Hp45 lithography in consideration of the mask 3D effect

Kazuya Sato, Masamitsu Itoh, Takashi Sato

Proceedings Volume 6283, 62831F (2006) https://doi.org/10.1117/12.681882

KEYWORDS: Photomasks, Transmittance, Critical dimension metrology, SRAF, Electroluminescence, Printing, Semiconducting wafers, Diffraction, Lithography, Nanoimprint lithography

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Proceedings Article | 12 May 2005 Paper

Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography

Takashi Sato, Ayako Endo, Akiko Mimotogi, Shoji Mimotogi, Kazuya Sato, Satoshi Tanaka

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598458

KEYWORDS: Polarization, Photomasks, Phase shifts, Chromium, Lithography, Lithographic illumination, Semiconducting wafers, Electroluminescence, Transmittance, Tolerancing

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SPIE Journal Paper | 1 April 2005

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka

JM3, Vol. 4, Issue 02, 023002, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898603

KEYWORDS: Signal processing, Semiconducting wafers, Optical alignment, TCAD, Photomasks, Metals, Computer aided design, Laser ablation, Chemical mechanical planarization, Inspection

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SPIE Journal Paper | 1 July 2004

Resist footing variation and compensation over nonplanar wafer

Takashi Sato, Ayako Endo, Koji Hashimoto, Soichi Inoue, Tsuyoshi Shibata, Yuuji Kobayashi

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759327

KEYWORDS: Semiconducting wafers, Ion implantation, Diffraction, Wafer-level optics, Lithography, Computer simulations, Finite-difference time-domain method, Light sources, Deep ultraviolet, Scanners

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Proceedings Article | 28 May 2004 Paper

Approach for reducing resist footing over nonplanar wafer

Ayako Endo, Takashi Sato, Masafumi Asano, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536108

KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Binary data, Diffractive optical elements, Ions, Lithography, Photoresist processing, Chemical mechanical planarization, Optical lithography

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Proceedings Article | 28 May 2004 Paper

Development of an accurate empirical model for ArF lithography

Shoji Mimotogi, Daisuke Kawamura, Takashi Sato, Soichi Inoue

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536279

KEYWORDS: Lithography, Photomasks, Semiconducting wafers, Error analysis, Critical dimension metrology, Image processing, Mask making, Photoresist processing, Chemical analysis, Process engineering

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Proceedings Article | 24 May 2004 Paper

Alignment mark signal simulation system for the optimum mark feature selection

Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.532808

KEYWORDS: Signal processing, Optical alignment, TCAD, Semiconducting wafers, Photomasks, Computer aided design, Metals, Optical simulations, Inspection, Chemical mechanical planarization

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Proceedings Article | 26 June 2003 Paper

Rigorous simulation of exposure over nonplanar wafers

Andreas Erdmann, Christian Kalus, Thomas Schmoeller, Yewgenija Klyonova, Takashi Sato, Ayako Endo, Tsuyoshi Shibata, Yuuji Kobayashi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485390

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Diffraction, Photoresist materials, Computer simulations, Finite-difference time-domain method, Electromagnetism, Silicon, Reflectivity

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Proceedings Article | 26 June 2003 Paper

Resist footing variation and compensation over nonplanar wafer

Takashi Sato, Ayako Endo, Kohji Hashimoto, Soichi Inoue, Tsuyoshi Shibata, Yuuji Kobayashi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485463

KEYWORDS: Semiconducting wafers, Ion implantation, Diffraction, Wafer-level optics, Lithography, Computer simulations, Deep ultraviolet, Light sources, Geometrical optics, Scanners

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Proceedings Article | 2 June 2003 Paper

Pattern shape comparison methods using SEM image

Takahiro Ikeda, Toshiya Kotani, Takashi Sato, Kusuo Ueno, Ryoichi Matsuoka

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482831

KEYWORDS: Computer aided design, Scanning electron microscopy, Semiconducting wafers, Photomasks, Data acquisition, Lithography, Image filtering, Inspection, Data modeling, Algorithm development

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Proceedings Article | 8 June 1998 Paper

Overlay error due to lens coma and asymmetric illumination dependence on pattern features

Hiroshi Nomura, Takashi Sato

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308728

KEYWORDS: Monochromatic aberrations, Inspection, Wavefronts, Overlay metrology, Zernike polynomials, Projection systems, Reticles, Error analysis, Illumination engineering, Process engineering

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Showing 5 of 24 publications

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