Dr. Tetsuro Nakasugi Profile

Dr. Tetsuro Nakasugi

at Toshiba Corp

SPIE Involvement:

Author

Publications (32)

Proceedings Article | 26 March 2019 Paper

Half-pitch 14nm direct patterning with nanoimprint lithography

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Hirokazu Kato, Kazuya Fukuhara, Tetsuro Nakasugi

Proceedings Volume 10958, 109580H (2019) https://doi.org/10.1117/12.2514685

KEYWORDS: Nanoimprint lithography, Optical lithography, Semiconducting wafers, Image processing, Distortion, Overlay metrology, Photoresist processing, Lithography, Particles, Photomasks

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Proceedings Article | 2 May 2018 Presentation + Paper

Improvement of nano-imprint lithography performance for device fabrication

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Hirokazu Kato, Masato Suzuki, Kazuya Fukuhara, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10584, 105840V (2018) https://doi.org/10.1117/12.2297294

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Overlay metrology, Distortion, Particles, Optical lithography, Photoresist processing, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2018 Paper

Process control technology for nanoimprint lithography

Hirotaka Tsuda, Hirokazu Washida, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi, Wooyung Jung

Proceedings Volume 10584, 105841D (2018) https://doi.org/10.1117/12.2297332

KEYWORDS: Nanoimprint lithography, Process control, Lithography, Photoresist processing, Nanotechnology, Manufacturing, Critical dimension metrology, Photomasks, Line edge roughness, Etching

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Proceedings Article | 21 March 2018 Paper

Material development for high-throughput nanoimprint lithography

Kei Kobayashi, Takayuki Nakamura, Hirokazu Kato, Masayuki Hatano, Hiroshi Tokue, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung, Takuya Kono

Proceedings Volume 10584, 105841F (2018) https://doi.org/10.1117/12.2297307

KEYWORDS: Nanoimprint lithography, Photoresist processing, Optical lithography, Image processing, Ultraviolet radiation, Diffusion, Interfaces, Lithography, Liquids, Etching

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Proceedings Article | 19 March 2018 Presentation + Paper

Design for nanoimprint lithography: hot spot modification through total NIL process simulation

Sachiko Kobayashi, Kyoji Yamashita, Hirotaka Tsuda, Kazuhiro Washida, Motofumi Komori, Ji-Young Im, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 10584, 105840R (2018) https://doi.org/10.1117/12.2297361

KEYWORDS: Nanoimprint lithography, Optical lithography, Lithography, Photoresist processing, Design for manufacturing, High volume manufacturing, Process modeling, Source mask optimization, Optical proximity correction

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Proceedings Article | 3 April 2017 Paper

Overlay control for nanoimprint lithography

Kazuya Fukuhara, Masato Suzuki, Masaki Mitsuyasu, Takuya Kono, Tetsuro Nakasugi, Yonghyun Lim, Wooyung Jung

Proceedings Volume 10144, 1014409 (2017) https://doi.org/10.1117/12.2256715

KEYWORDS: Nanoimprint lithography, Overlay metrology, Optical alignment, Lithography, Semiconducting wafers, Distortion, Process control, Error analysis, Silicon, Semiconductor manufacturing

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Proceedings Article | 21 March 2017 Presentation + Paper

Study of nanoimprint lithography (NIL) for HVM of memory devices

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Masato Suzuki, Kazuya Fukuhara, Masafumi Asano, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10144, 1014406 (2017) https://doi.org/10.1117/12.2257951

KEYWORDS: Nanoimprint lithography, Overlay metrology, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Nanotechnology, Semiconducting wafers, Optical lithography, Particles, Distortion, Optical alignment, Inspection

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Proceedings Article | 21 March 2017 Paper

The opportunity and challenge of spin coat based nanoimprint lithography

Wooyung Jung, Jungbin Cho, Eunhyuk Choi, Yonghyun Lim, Cheolkyu Bok, Masatoshi Tsuji, Kei Kobayashi, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 10144, 1014412 (2017) https://doi.org/10.1117/12.2257845

KEYWORDS: Particles, Semiconducting wafers, Nanoimprint lithography, Coating, Optical lithography, Logic, Manufacturing, Defect inspection, High volume manufacturing, Lithography, Ultraviolet radiation, Photoresist processing

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Proceedings Article | 22 March 2016 Paper

NIL defect performance toward high volume mass production

Masayuki Hatano, Kei Kobayashi, Hiroyuki Kashiwagi, Hiroshi Tokue, Takuya Kono, Nakasugi Tetsuro, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 9777, 97770B (2016) https://doi.org/10.1117/12.2218972

KEYWORDS: Defect detection, Process control, Nanoimprint lithography, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Silicon, Semiconducting wafers, Industrial chemicals, Contamination, Chemical analysis, Photoresist processing, Extreme ultraviolet lithography, Photomasks, Image processing

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Proceedings Article | 28 March 2014 Paper

Challenges for pattern formation with sub-100nm residual-layer thickness by roll-to-roll nanoimprint lithography

Ryoichi Inanami, Kazuto Matsuki, Tomoko Ojima, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 9049, 90490I (2014) https://doi.org/10.1117/12.2046248

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Positron emission tomography, Coating, Diffractive optical elements, Electrodes, Lithography, Semiconductors, Photography, Silicon films

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Proceedings Article | 21 March 2012 Paper

Sub-100 nm pattern formation by roll-to-roll nanoimprint

Ryoichi Inanami, Tomoko Ojima, Kazuto Matsuki, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 8323, 83231J (2012) https://doi.org/10.1117/12.916584

KEYWORDS: Optical lithography, Nickel, Silicon, Semiconducting wafers, Positron emission tomography, Atomic force microscopy, Scanning electron microscopy, Ultraviolet radiation, Nanoimprint lithography, Lithography

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SPIE Journal Paper | 1 October 2011

Nanoimprint lithography and future patterning for semiconductor devices

Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda

JM3, Vol. 10, Issue 04, 043008, (October 2011) https://doi.org/10.1117/12.10.1117/1.3658024

KEYWORDS: Nanoimprint lithography, Photomasks, Semiconductors, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Electron beams

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Proceedings Article | 17 March 2011 Open Access

Nanoimprint lithography for semiconductor devices and future patterning innovation

Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda

Proceedings Volume 7970, 797003 (2011) https://doi.org/10.1117/12.882940

KEYWORDS: Nanoimprint lithography, Lithography, Semiconducting wafers, Optical lithography, Semiconductors, Extreme ultraviolet lithography, Photomasks, Ultraviolet radiation, Defect inspection, Critical dimension metrology

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SPIE Journal Paper | 1 April 2010

Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

JM3, Vol. 9, Issue 02, 023009, (April 2010) https://doi.org/10.1117/12.10.1117/1.3421948

KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

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Proceedings Article | 26 March 2010 Paper

High resolution positive-working molecular resist attached with alicyclic acid-leaving group

Arisa Yamada, Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi

Proceedings Volume 7639, 76390S (2010) https://doi.org/10.1117/12.851392

KEYWORDS: Etching, Lithography, Molecules, Resistance, Scanning electron microscopy, Line width roughness, Oxygen, Quantum efficiency, Photoresist processing, Polymers

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Proceedings Article | 11 May 2009 Paper

Mask-induced aberration in EUV lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7379, 73790P (2009) https://doi.org/10.1117/12.824266

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Diffraction, Extreme ultraviolet, Lithographic illumination, Polarization, Manufacturing, Tolerancing, Lithography, Critical dimension metrology

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Proceedings Article | 23 March 2009 Paper

Polar Correction: new overlay control method for higher-order intra-field error dependent on the wafer coordinates

Manabu Takakuwa, Keigo Toriumi, Nobuhiro Komine, Kazutaka Ishigo, Takuya Kono, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7272, 72720J (2009) https://doi.org/10.1117/12.813490

KEYWORDS: Semiconducting wafers, Overlay metrology, Data corrections, Immersion lithography, Process control, Control systems, Source mask optimization, Distortion, Osmium, Radon

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Proceedings Article | 18 March 2009 Paper

A study of filling process for UV nanoimprint lithography using a fluid simulation

Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami, Hiroshi Tokue, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Koji Hashimoto, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7271, 72712A (2009) https://doi.org/10.1117/12.813654

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photoresist processing, Capillaries, Lithography, Diffusion, Nitrogen, Semiconductors, Line edge roughness, Ranging

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Proceedings Article | 1 December 2008 Paper

What is the strongest candidate in lithography for 2x nm HP and beyond?　

Kohji Hashimoto, Ikuo Yoneda, Takeshi Koshiba, Shinji Mikami, Takumi Ota, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7140, 71400A (2008) https://doi.org/10.1117/12.810264

KEYWORDS: Lithography, Nanoimprint lithography, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Double patterning technology, Photomasks, Manufacturing, Signal processing, Optical lithography

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Proceedings Article | 26 March 2008 Paper

Novel molecular resist based on an amorphous truxene derivative

Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi

Proceedings Volume 6923, 69230J (2008) https://doi.org/10.1117/12.770944

KEYWORDS: Molecules, Scanning electron microscopy, Silicon, Lithography, Electron beams, Line edge roughness, Thin films, Microscopes, Solids, Crystals

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Proceedings Article | 20 March 2008 Paper

Aberration budget in extreme ultraviolet lithography

Yumi Nakajima, Takashi Sato, Ryoichi Inanami, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 69211A (2008) https://doi.org/10.1117/12.771602

KEYWORDS: Tolerancing, Diffraction, Extreme ultraviolet lithography, Error analysis, Lithography, Phase shifts, Polarization, Manufacturing, Photomasks, Extreme ultraviolet

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Proceedings Article | 14 March 2008 Paper

Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Ikuo Yoneda, Shinji Mikami, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 692104 (2008) https://doi.org/10.1117/12.771149

KEYWORDS: Nanoimprint lithography, Optical alignment, Multilayers, Line edge roughness, Lithography, CMOS devices, Metals, Inspection, Overlay metrology, Semiconducting wafers

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Proceedings Article | 16 March 2007 Paper

Recent progress of a character projection-type low-energy electron-beam direct writing system

Kouhei Noguchi, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Fumihiko Nakamura, Norihiro Yamaguchi, Kazuhiko Kushitani, Tetsuro Nakasugi, Takeshi Koshiba, Takumi Oota

Proceedings Volume 6517, 65172I (2007) https://doi.org/10.1117/12.712118

KEYWORDS: Amplifiers, Semiconducting wafers, Data conversion, Distortion, Electron beam direct write lithography, Optical alignment, Control systems, Electrons, Data processing, Process control

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Proceedings Article | 15 March 2007 Paper

A study of voltage contrast image using Monte Carlo simulation

T. Ota, T. Koshiba, T. Nakasugi

Proceedings Volume 6517, 651712 (2007) https://doi.org/10.1117/12.711405

KEYWORDS: Monte Carlo methods, Virtual colonoscopy, Silicon, Scattering, Polymethylmethacrylate, Electron beams, Computing systems, Scanning electron microscopy, Lithography, 3D image processing

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Proceedings Article | 15 March 2007 Paper

Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image

Takeshi Koshiba, Takumi Ota, Tetsuro Nakasugi, Fumihiko Nakamura, Katsuhide Watanabe, Kazuyoshi Sugihara

Proceedings Volume 6517, 651713 (2007) https://doi.org/10.1117/12.711368

KEYWORDS: Virtual colonoscopy, Optical alignment, Signal detection, Silicon, Metals, Image analysis, Overlay metrology, Lithography, Distortion, Back end of line

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Proceedings Article | 24 March 2006 Paper

A character projection low energy electron beam direct writing system for device of small production lot with a variety of design

Fumihiko Nakamura, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Kouhei Noguchi, Norihiro Yamaguchi, Hisashi Isokawa, Kazuhiko Kushitani, Takayuki Satoh, Takeshi Koshiba, Takumi Oota, Tetsuro Nakasugi, Hiroyuki Mizuno

Proceedings Volume 6151, 61512A (2006) https://doi.org/10.1117/12.655963

KEYWORDS: Semiconducting wafers, Electron beam direct write lithography, Control systems, Electron beams, Vestigial sideband modulation, Data conversion, Beam shaping, Photomasks, Optical alignment, Amplifiers

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Proceedings Article | 16 June 2003 Paper

Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture, and recent progress

Tetsuro Nakasugi, Atsushi Ando, Ryoichi Inanami, Noriaki Sasaki, Takumi Ota, Osamu Nagano, Yuuichiro Yamazaki, Kazuyoshi Sugihara, Ichiro Mori, Motosuke Miyoshi, Katsuya Okumura, Akira Miura

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483607

KEYWORDS: Scanning electron microscopy, Virtual colonoscopy, System on a chip, Logic devices, Maskless lithography, Lenses, Semiconducting wafers, Inspection, Electron beam direct write lithography, Lithography

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Proceedings Article | 16 June 2003 Paper

Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system

Ryoichi Inanami, Shunko Magoshi, Shouhei Kousai, Atsushi Ando, Tetsuro Nakasugi, Ichiro Mori, Kazuyoshi Sugihara, Akira Miura

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483702

KEYWORDS: Back end of line, Vestigial sideband modulation, Logic devices, Metals, Data processing, Photomasks, Electron beams, Electron beam direct write lithography, Computer aided design, Beam shaping

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Proceedings Article | 20 August 2001 Paper

New registration technique using voltage-contrast images for low-energy electron-beam lithography

Tetsuro Nakasugi, Atsushi Ando, Kazuyoshi Sugihara, Motosuke Miyoshi, Katsuya Okumura

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436671

KEYWORDS: Virtual colonoscopy, Image registration, Sensors, Lithography, Electron beam lithography, Scanning electron microscopy, Semiconducting wafers, Silicon, Surface finishing, Chemical mechanical planarization

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Proceedings Article | 21 July 2000 Paper

Beam-monitoring system using microapertures for electron-beam lithography

Jun Takamatsu, Naoharu Shimomura, Hitoshi Sunaoshi, Kiyoshi Hattori, Munehiro Ogasawara, Tetsuro Nakasugi

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390105

KEYWORDS: Silicon, Electrons, Sensors, Beam shaping, Photomasks, Monte Carlo methods, Lithography, Etching, Electron beams, Scanning electron microscopy

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Proceedings Article | 28 July 1997 Paper

Proximity effect correction for reticle fabrication

Takashi Kamikubo, Takayuki Abe, Susumu Oogi, Hirohito Anze, Mitsuko Shimizu, Masamitsu Itoh, Tetsuro Nakasugi, Tomohiro Iijima, Yoshiaki Hattori

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277291

KEYWORDS: Reticles, Electron beams, Semiconductors, Error analysis, Analytical research, Process engineering, Microelectronics, Electron beam melting, Manufacturing, Semiconductor manufacturing

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Proceedings Article | 7 July 1997 Paper

Effect of base additive on process latitude in chemically amplified electron-beam resists

Satoshi Saito, Naoko Kihara, Takuya Naito, Makoto Nakase, Tetsuro Nakasugi, Yoshimitsu Kato

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275868

KEYWORDS: Resistance, Quartz, Semiconducting wafers, Polymers, Lithography, Chemically amplified resists, Ultraviolet radiation, Photoresist processing, Scanning electron microscopy, Electron beams

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Showing 5 of 32 publications

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