Dr. Munehiro Ogasawara Profile

Dr. Munehiro Ogasawara

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 25 October 2016 Paper

Paper

Electron beam mask writer EBM-9500 for logic 7nm node generation

Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi, Haruyuki Nomura, Noriaki Nakayamada, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Victor Katsap, Kenichi Saito, Ryoei Kobayashi, Nobuo Miyamoto, Munehiro Ogasawara

Proceedings Volume 9985, 998508 (2016) https://doi.org/10.1117/12.2242987

KEYWORDS: Photomasks, Lithography, Electron beams, Logic, Electron beam melting, Line edge roughness, Electron beam lithography, Extreme ultraviolet, Optical lithography, LCDs

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Proceedings Article | 10 May 2016 Paper

Paper

Multi-beam mask writer MBM-1000 and its application field

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Hirofumi Morita, Satoru Hirose, Munehiro Ogasawara, Hirokazu Yamada, Kiyoshi Hattori

Proceedings Volume 9984, 998405 (2016) https://doi.org/10.1117/12.2245177

KEYWORDS: Vestigial sideband modulation, Photomasks, Electron beam melting, Data storage, Beam shaping, Lenses, Data conversion, Printing, Optical proximity correction, Line edge roughness

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SPIE Journal Paper | 23 March 2016

Correction of resist heating effect on variable shaped beam mask writer

Noriaki Nakayamada, Mizuna Suganuma, Haruyuki Nomura, Yasuo Kato, Takashi Kamikubo, Munehiro Ogasawara, Harold Zable, Yukihiro Masuda, Aki Fujimura

JM3, Vol. 15, Issue 02, 021012, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021012

KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

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Proceedings Article | 9 July 2015 Paper

Paper

Study on modeling of resist heating effect correction in EB mask writer EBM-9000

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Noriaki Nakayamada, Hirohito Anze, Munehiro Ogasawara

Proceedings Volume 9658, 96580R (2015) https://doi.org/10.1117/12.2199615

KEYWORDS: Critical dimension metrology, Modulation, Temperature metrology, Computer simulations, Photomasks, Quartz, Thermal modeling, Diffusion, Roentgenium, Electron beam lithography

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Proceedings Article | 17 October 2014 Paper

Paper

Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation

Takashi Kamikubo, Hidekazu Takekoshi, Munehiro Ogasawara, Hirokazu Yamada, Kiyoshi Hattori

Proceedings Volume 9231, 923107 (2014) https://doi.org/10.1117/12.2065544

KEYWORDS: Photomasks, Optical lithography, Optical proximity correction, Nanoimprint lithography, Lithography, Electron beams, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, EUV optics

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Proceedings Article | 28 July 2014 Paper

Paper

Characterization of decay component of resist surface charging on EBM-8000

Noriaki Nakayamada, Takashi Kamikubo, Hirohito Anze, Muheniro Ogasawara

Proceedings Volume 9256, 925609 (2014) https://doi.org/10.1117/12.2070827

KEYWORDS: Photomasks, Metrology, Electron beams, Electron beam lithography, Numerical modeling, Current controlled current source, Time metrology, Scattering

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Proceedings Article | 28 June 2013 Paper

Paper

Modeling of resist surface charging effect on EBM-8000 and its comparison with EBM-6000

Noriaki Nakayamada, Takashi Kamikubo, Hirohito Anze, Munehiro Ogasawara

Proceedings Volume 8701, 870102 (2013) https://doi.org/10.1117/12.2030095

KEYWORDS: Photomasks, Electron beam melting, Electron beams, Electron beam lithography, Numerical modeling, Current controlled current source, Metrology, Overlay metrology, Neon

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Proceedings Article | 14 October 2011 Paper

Paper

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 8166, 81661D (2011) https://doi.org/10.1117/12.898850

KEYWORDS: Photomasks, Lithography, Amplifiers, Data storage servers, Mask making, Immersion lithography, Data conversion, Extreme ultraviolet lithography, Data processing, Data corrections

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Proceedings Article | 17 October 2008 Paper

Paper

New electron optics for mask writer EBM-7000 to challenge hp 32nm generation

Takashi Kamikubo, Steven Golladay, Rodney Kendall, Victor Katsap, Kenji Ohtoshi, Munehiro Ogasawara, Shinsuke Nishimura, Rieko Nishimura, Osamu Iizuka, Takahito Nakayama, Shunji Shinkawa, Tetsurou Nishiyama, Shuichi Tamamushi

Proceedings Volume 7122, 71220J (2008) https://doi.org/10.1117/12.801725

KEYWORDS: Photomasks, Photoresist processing, Objectives, Beam shaping, Optical testing, Chemically amplified resists, Signal detection, Electron beam melting, In situ metrology, Electron beams

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Proceedings Article | 2 May 2008 Paper

Paper

Desired IP control methodology for EUV mask in current mask process

S. Yoshitake, H. Sunaoshi, S. Tamamushi, M. Ogasawara

Proceedings Volume 6792, 67920T (2008) https://doi.org/10.1117/12.798933

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, EUV optics, Lithography, Reflection, Polishing

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Proceedings Article | 30 October 2007 Paper

Paper

Correction technique of EBM-6000 prepared for EUV mask writing

Shusuke Yoshitake, Hitoshi Sunaoshi, Jun Yashima, Shuichi Tamamushi, Munehiro Ogasawara

Proceedings Volume 6730, 673030 (2007) https://doi.org/10.1117/12.747748

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Error analysis, Reflectivity, Semiconducting wafers, EUV optics, Mirrors, Inspection

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Proceedings Article | 14 May 2007 Paper

Paper

Study of heating effect on CAR in electron-beam mask writing

Takashi Kamikubo, Makoto Hiramoto, Jun Yashima, Masazumi Takahashi, Rieko Nishimura, Takehiko Katsumata, Hirohito Anze, Hitoshi Sunaoshi, Shuichi Tamamushi, Munehiro Ogasawara

Proceedings Volume 6607, 660723 (2007) https://doi.org/10.1117/12.728986

KEYWORDS: Critical dimension metrology, Electron beams, Photomasks, Temperature metrology, Cadmium, Denoising, Resolution enhancement technologies, Computer simulations, Polymers, Optical lithography

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Proceedings Article | 11 March 2002 Paper

Paper

Stage tracking of a mask-scan EB mask writer test stand

Shinsuke Nishimura, Soichiro Mitsui, Munehiro Ogasawara, Kiminobu Akeno, Mitsuko Shimizu, Hideo Kusakabe, Hirotsugu Wada, Kiyoshi Hattori, Shusuke Yoshitake, Naoharu Shimomura, Jun Takamatsu, Hitoshi Sunaoshi, Yuuji Fukudome, Toru Tojo, Seiichi Tsuchiya

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458327

KEYWORDS: Photomasks, Optical amplifiers, Vestigial sideband modulation, Amplifiers, Electron beams, Interferometers, Electro optics, Objectives, Electro optical systems, Photography

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Proceedings Article | 20 August 2001 Paper

Paper

Improvement of beam-adjustment accuracy by beam-intensity distribution measurement on a second shaping aperture in electron-beam writing systems

Shinsuke Nishimura, Munehiro Ogasawara, Toru Tojo

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436691

KEYWORDS: Ultraviolet radiation, Lithography, Atomic force microscopy

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Proceedings Article | 22 January 2001 Paper

Paper

Eddy current evaluation for a high-resolution EB system

Naoharu Shimomura, Munehiro Ogasawara, Kiyoshi Hattori, Jun Takamatsu, Hitoshi Sunaoshi, Shusuke Yoshitake, Yuuji Fukudome, Kiminobu Akeno

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410723

KEYWORDS: Magnetism, Chromium, Electron beams, Objectives, Information operations, Quartz, Reticles, Magnetic semiconductors, Semiconductors, Optical simulations

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Proceedings Article | 21 July 2000 Paper

Paper

Beam-monitoring system using microapertures for electron-beam lithography

Jun Takamatsu, Naoharu Shimomura, Hitoshi Sunaoshi, Kiyoshi Hattori, Munehiro Ogasawara, Tetsuro Nakasugi

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390105

KEYWORDS: Silicon, Electrons, Sensors, Beam shaping, Photomasks, Monte Carlo methods, Lithography, Etching, Electron beams, Scanning electron microscopy

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Proceedings Article | 19 July 2000 Paper

Paper

Optical column of the mask-scan EB mask writer test stand

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu, Hitoshi Sunaoshi, Kiyoshi Hattori, Shusuke Yoshitake, Yuuji Fukudome, Kiminobu Akeno

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392076

KEYWORDS: Photomasks, Electron beams, Monochromatic aberrations, Objectives, Vestigial sideband modulation, Silicon, Electrodes, Optical proximity correction, Optical design, Tungsten

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Proceedings Article | 15 November 1999 Paper

Paper

In-situ beam position monitoring system for electron-beam lithography

Hitoshi Sunaoshi, Munehiro Ogasawara, Jun Takamatsu, Naoharu Shimomura

Proceedings Volume 3777, (1999) https://doi.org/10.1117/12.370133

KEYWORDS: Microchannel plates, Sensors, CCD cameras, Electron beam lithography, Optical testing, Electron beams, Beam controllers, Image processing, CCD image sensors, Charge-coupled devices

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Proceedings Article | 25 August 1999 Paper

Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360219

KEYWORDS: Photomasks, Data conversion, Mask making, Lithography, Distortion, Electron beams, Manufacturing, Critical dimension metrology, Vibration control, Sensors

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Proceedings Article | 25 August 1999 Paper

Paper

Reduction of fogging effect caused by scattered electrons in an electron beam system

Naoharu Shimomura, Munehiro Ogasawara, Jun Takamatsu, Shusuke Yoshitake, Kenji Ooki, Noriaki Nakayamada, Fumiyuki Okabe, Toru Tojo

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360242

KEYWORDS: Electrons, Electron beams, Calibration, Objectives, Critical dimension metrology, Photomasks, Electron beam lithography, Control systems, X-ray technology, Electronics

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Proceedings Article | 1 September 1998 Paper

Paper

Development of a fast beam-blanking system

Munehiro Ogasawara, Hitoshi Sunaoshi, Ryoji Yoshikawa

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328808

KEYWORDS: Reflectivity, Control systems, Logic, Electrodes, Beam controllers, Distortion, Electron beam lithography, Amplifiers, Signal generators, Photomasks

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Proceedings Article | 28 July 1997 Paper

Paper

Development of an in-situ cleaning system for an e-beam reticle writer

Kenji Ohtoshi, Satoshi Yamasaki, Shuichi Tamamushi, Toru Tojo, Ryoichi Hirano, Yuuji Fukudome, Naoharu Shimomura, Shinsuke Nishimura, Shusuke Yoshitake, Munehiro Ogasawara

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277287

KEYWORDS: Contamination, Reticles, Electron beams, Gold, Optical testing, Microwave radiation, Etching, Diffusion, Electronics, Molecules

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Proceedings Article | 27 May 1996 Paper

Paper

Silicon oxide deposition using a gallium-focused ion beam

Haruki Komano, Hiroko Nakamura, Mitsuyo Kariya, Munehiro Ogasawara

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240495

KEYWORDS: Silicon, Oxides, Ion beams, Oxygen, Silicon films, Tungsten, Gold, Electrodes, Ultrasound-modulated optical tomography, Gallium

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Showing 5 of 23 publications

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