Mr. Fumiharu Nakajima Profile

Fumiharu Nakajima

at Toshiba Corp

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 20 March 2018 Presentation + Paper

Hotspot detection based on surrounding optical feature

Yayori Abe, Fumiharu Nakajima, Yuki Watanabe, Masanari Kajiwara, Shigeki Nojima, Toshiya Kotani

Proceedings Volume 10588, 105880I (2018) https://doi.org/10.1117/12.2297189

KEYWORDS: Semiconducting wafers, Optical proximity correction, Wafer-level optics, Lithography, Feature extraction, Computer simulations, Photomasks, Calibration

Read Abstract +

Proceedings Article | 26 March 2015 Paper

Self-aligned quadruple patterning-compliant placement

Fumiharu Nakajima, Chikaaki Kodama, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani

Proceedings Volume 9427, 942708 (2015) https://doi.org/10.1117/12.2085705

KEYWORDS: Photomasks, Optical lithography, Lithography, Image processing, Double patterning technology, Semiconducting wafers, Metals, Standards development, Semiconductors, Manufacturing

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Self-aligned quadruple patterning-aware routing

Fumiharu Nakajima, Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani

Proceedings Volume 9053, 90530C (2014) https://doi.org/10.1117/12.2046241

KEYWORDS: Photomasks, Double patterning technology, Optical lithography, Lithography, Metals, Semiconducting wafers, Logic, Manufacturing, Semiconductors, Microelectronics

Read Abstract +

Proceedings Article | 29 March 2013 Paper

Detailed routing with advanced flexibility and in compliance with self-aligned double patterning constraints

Fumiharu Nakajima, Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani, Shoji Mimotogi, Shinji Miyamoto

Proceedings Volume 8684, 86840A (2013) https://doi.org/10.1117/12.2010644

KEYWORDS: Image processing, Semiconducting wafers, Lithography, Photomasks, Double patterning technology, Optical lithography, Manufacturing, Overlay metrology, Metals, Optical resolution

Read Abstract +

Proceedings Article | 26 May 2010 Paper

Development of computational spacer patterning technology

Hiromitsu Mashita, Takafumi Taguchi, Fumiharu Nakajima, Katsumi Iyanagi, Toshiya Kotani, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 7748, 77480S (2010) https://doi.org/10.1117/12.868940

KEYWORDS: Optical lithography, Photomasks, Lithography, Etching, Critical dimension metrology, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Design for manufacturability, Deposition processes

Read Abstract +

Proceedings Article | 16 March 2009 Paper

New process proximity correction using neural network in spacer patterning technology

Fumiharu Nakajima, Toshiya Kotani, Satoshi Tanaka, Masafumi Asano, Soichi Inoue

Proceedings Volume 7274, 72740J (2009) https://doi.org/10.1117/12.813614

KEYWORDS: Data modeling, Personal protective equipment, Neural networks, Optical lithography, Data acquisition, Aerospace engineering, Lithography, Photomasks, Cadmium sulfide, Etching

Read Abstract +

Proceedings Article | 20 May 2008 Paper

Tool-induced hotspot fixing flow for high volume products

Hiromitsu Mashita, Toshiya Kotani, Fumiharu Nakajima, Hidefumi Mukai, Kazuya Sato, Satoshi Tanaka, Kohji Hashimoto, Soichi Inoue

Proceedings Volume 7028, 70283I (2008) https://doi.org/10.1117/12.793125

KEYWORDS: Optics manufacturing, Optical proximity correction, Astronomical imaging, Critical dimension metrology, Diffractive optical elements, Wafer-level optics, Lithography, Semiconducting wafers, Apodization, Design for manufacturing

Read Abstract +

Proceedings Article | 17 March 2008 Paper

Robust PPC and DFM methodology for exposure tool variations

Toshiya Kotani, Fumiharu Nakajima, Hiromitsu Mashita, Kazuya Sato, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 6924, 69241F (2008) https://doi.org/10.1117/12.771387

KEYWORDS: Optical proximity correction, Optics manufacturing, Design for manufacturing, Wafer-level optics, Astronomical imaging, Optical design, Critical dimension metrology, Lithography, Design for manufacturability, Optical testing

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years