Fumikatsu Uesawa
at Sony Atsugi Technology Ctr
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 27 March 2007 Paper
Shoji Mimotogi, Fumikatsu Uesawa, Makoto Tominaga, Hiroharu Fujise, Koutaro Sho, Mikio Katsumata, Hiroki Hane, Atsushi Ikegami, Seiji Nagahara, Tatsuhiko Ema, Masafumi Asano, Hideki Kanai, Taiki Kimura, Masaaki Iwai
Proceedings Volume 6520, 652008 (2007) https://doi.org/10.1117/12.711049
KEYWORDS: Lithography, Immersion lithography, Photomasks, Critical dimension metrology, Phase shifting, Lithographic illumination, Phase shifts, Logic, Metals, Semiconductors

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634951 (2006) https://doi.org/10.1117/12.685360
KEYWORDS: Birefringence, Photomasks, Polarization, Cadmium sulfide, Tolerancing, Electroluminescence, Lithography, Critical dimension metrology, Lawrencium, Wave plates

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 628337 (2006) https://doi.org/10.1117/12.681826
KEYWORDS: Photomasks, Tolerancing, Polarization, Immersion lithography, Electroluminescence, Lithography, Error analysis, Lithographic illumination, Birefringence, Fiber optic illuminators

Proceedings Article | 10 March 2006 Paper
Proceedings Volume 6155, 615504 (2006) https://doi.org/10.1117/12.657043
KEYWORDS: Etching, Optical proximity correction, Model-based design, Silica, Silicon, Data analysis, Data modeling, Edge detection, Instrument modeling, Process modeling

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59920Y (2005) https://doi.org/10.1117/12.632021
KEYWORDS: Photomasks, Tolerancing, Immersion lithography, Error analysis, Lithography, Electroluminescence, Lithographic illumination, Critical dimension metrology, Scanners, Refractive index

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617455
KEYWORDS: Chromium, Photomasks, Lithography, Distortion, Critical dimension metrology, Optical proximity correction, Phase shifts, Error analysis, Cadmium, Polarization

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600175
KEYWORDS: Lithography, Metals, Photomasks, SRAF, Optical proximity correction, Signal to noise ratio, Error analysis, Critical dimension metrology, Integrated circuits, Semiconducting wafers

Proceedings Article | 12 May 2005 Paper
Shoji Mimotogi, Fumikatsu Uesawa, Suigen Kyoh, Hiroharu Fujise, Eishi Shiobara, Mikio Katsumata, Hiroki Hane, Tomohiro Sugiyama, Koutaro Sho, Maki Miyazaki, Kazuhiro Takahata, Hideki Kanai, Kazuya Sato, Kohji Hashimoto
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600948
KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Lens design, Photoresist processing, CMOS technology, Optical lithography, Metals, Logic, Semiconductors

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535104
KEYWORDS: Lithography, Photomasks, Semiconducting wafers, Charged-particle lithography, Lithographic illumination, Phase shifts, Optical lithography, Electroluminescence, Photoresist processing, Critical dimension metrology

Proceedings Article | 29 June 1998 Paper
Atsushi Sekiguchi, Fumikatsu Uesawa, Koichi Takeuchi, Tatsuji Oda
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310764
KEYWORDS: Reflectivity, Manufacturing, Critical dimension metrology, Lithography, Reflection, Silicon, Optical proximity correction, Photomasks, Optics manufacturing, Chemically amplified resists

Proceedings Article | 26 May 1995 Paper
Tohru Ogawa, Masaya Uematsu, Fumikatsu Uesawa, Mitsumori Kimura, Hideo Shimizu, Tatsuji Oda
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209302
KEYWORDS: Lithographic illumination, Photomasks, Excimer lasers, Lithography, Phase shifting, Light sources, Photoresist materials, Eye, Image filtering, Distortion

Proceedings Article | 17 May 1994 Paper
Minoru Sugawara, Hiroichi Kawahira, Keisuke Tsudaka, Akihiro Ogura, Satoru Nozawa, Fumikatsu Uesawa, Hideo Shimizu
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175416
KEYWORDS: Photomasks, Transmittance, Mask making, Semiconducting wafers, Etching, Phase shifting, Error analysis, Chromium, Quartz, Phase shifts

Showing 5 of 12 publications
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