Dr. Yu-Po Tang Profile

Dr. Yu-Po Tang

at Synopsys Taiwan Co Ltd

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Author

Publications (7)

Proceedings Article | 12 November 2024 Presentation + Paper

Manhattan and curvilinear mask error correction

Yung-Yu Chen, Chien-Yun Yang, Wen-Li Cheng, Jing-Wei Shih, Yu-Po Tang, John Valadez, Linghui Wu, Guangming Xiao

Proceedings Volume 13216, 132161M (2024) https://doi.org/10.1117/12.3034652

KEYWORDS: Contour modeling, Optical proximity correction, Distance measurement, Shape analysis, Error analysis, Target recognition, Mask making, Smoothing

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Proceedings Article | 12 November 2024 Presentation + Paper

Assessing need and methodology for mask constraints in ILT applications

Mohamed Ramadan, Chris Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Ming-Feng Shen, Kai-Hsiang Chang, Kyle Braam, Alex Zepka, Yu-Po Tang, Szu Ping Chen, Eric Huang, Gloria Yeh, Nicole Wu, Chun-Cheng Liao

Proceedings Volume 13216, 132161Q (2024) https://doi.org/10.1117/12.3042434

KEYWORDS: Semiconducting wafers, Printing, Vestigial sideband modulation, Photoresist processing, Simulations, Design rules, Chip manufacturing, SRAF, Optical proximity correction, Lithography

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Proceedings Article | 10 April 2024 Presentation

Advancing the curvilinear ILT and OPC ecosystem for low-k1 DUV and EUV lithography

Guangming Xiao, Kevin Hooker, Yunqiang Zhang, Ji Li, Thuc Dam, Yu-Po Tang, Linghui Wu, WooJoo Sim, Kevin Lucas

Proceedings Volume 12954, 1295413 (2024) https://doi.org/10.1117/12.3014637

KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

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SPIE Journal Paper | 20 December 2023

Enhancing mask synthesis for curvilinear masks in full-chip extreme ultraviolet lithography

Kevin Hooker, Guangming Xiao, Yu-Po Tang, Yunqiang Zhang, Moongyu Jeong, John Valadez, Kevin Lucas

JM3, Vol. 22, Issue 04, 041606, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041606

KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Lithography, Optical lithography, Machine learning, Extreme ultraviolet, Semiconducting wafers, Education and training, Industry, Source mask optimization

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SPIE Journal Paper | 24 November 2023

Curvilinear mask handling in OPC flow

Yung-Yu Chen, Kai-Hsiang Chang, Wen-Li Cheng, Yu-Po Tang

JM3, Vol. 23, Issue 01, 011203, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011203

KEYWORDS: Optical proximity correction, Shrinkage, Shape analysis, Visualization, Optical lithography, Nonlinear control, Manufacturing, Lithography, Industry, Histograms

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Proceedings Article | 28 April 2023 Presentation + Paper

Curvilinear mask handling in OPC flow

Yung-Yu Chen, Kai-Hsiang Chang, Wen-Li Cheng, Yu-Po Tang

Proceedings Volume 12495, 1249505 (2023) https://doi.org/10.1117/12.2663274

KEYWORDS: Optical proximity correction, Shrinkage, Nonlinear control, Histograms, Shape analysis, Model-based design, Lithography, Industry

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Proceedings Article | 16 September 2022 Paper

An optimized data prep flow for curvilinear masks

John Valadez, Yu-Po Tang, Mikhayil Mkrtchyan

Proceedings Volume 12325, 1232509 (2022) https://doi.org/10.1117/12.2640638

KEYWORDS: Photomasks, Databases, Control systems, Tolerancing, Optical proximity correction, Extreme ultraviolet, Manufacturing, Lithography, Data modeling

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Showing 5 of 7 publications

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