Manhattan and curvilinear mask error correction

Yung-Yu Chen; Chien-Yun Yang; Wen-Li Cheng; Jing-Wei Shih; Yu-Po Tang; John Valadez; Linghui Wu; Guangming Xiao

doi:10.1117/12.3034652

12 November 2024 Manhattan and curvilinear mask error correction

Yung-Yu Chen, Chien-Yun Yang, Wen-Li Cheng, Jing-Wei Shih, Yu-Po Tang, John Valadez, Linghui Wu, Guangming Xiao

Proceedings Volume 13216, Photomask Technology 2024; 132161M (2024) https://doi.org/10.1117/12.3034652
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

This paper presents a system for performing mask error correction on both Manhattan and curvilinear shapes. On the Manhattan shapes, the correction may move segments (dissected edges), and on the curvilinear shapes, the correction may move vertices. The segment movement preserves the Manhattan style of the original shapes. Optionally, the vertex movement may be applied on the Manhattan shapes and the corrected results change to be in the curvilinear style. The results of mask error correction on the post-OPC mask of a logic layout will be reported. Dissection and target-point placement work differently between Manhattan and curvilinear shapes. We will analyze the quality and demonstrate optimization of the mask error correction strategies for input mask data consisting of both Manhattan and curvilinear shapes.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Yung-Yu Chen, Chien-Yun Yang, Wen-Li Cheng, Jing-Wei Shih, Yu-Po Tang, John Valadez, Linghui Wu, and Guangming Xiao "Manhattan and curvilinear mask error correction", Proc. SPIE 13216, Photomask Technology 2024, 132161M (12 November 2024); https://doi.org/10.1117/12.3034652

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