Mr. Takao Tamura Profile

Takao Tamura

Director at NuFlare Technology Inc

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Publications (25)

Proceedings Article | 21 November 2023 Presentation + Paper

Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12751, 127510X (2023) https://doi.org/10.1117/12.2687415

KEYWORDS: Extreme ultraviolet, Electron beam lithography, Projection lithography, Resolution enhancement technologies, Distortion, Mask making

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Proceedings Article | 1 May 2023 Presentation + Paper

Current performance and future plans on electron multi-beam mask writers toward high-NA EUV era

Hiroshi Matsumoto, Haruyuki Nomura, Hayato Kimura, Keisuke Yamaguchi, Yoshinori Kojima, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12497, 1249708 (2023) https://doi.org/10.1117/12.2657994

KEYWORDS: Manufacturing, Extreme ultraviolet, Data conversion, Control systems, Microelectromechanical systems, Photomasks, Electron beam lithography

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Proceedings Article | 22 February 2021 Poster + Presentation

Effect of resist film thickness on line-and-space resist patterns on chromium nitride in electron beam lithography

Akihiro Konda, Kazumasa Okamoto, Takahiro Kozawa, Takao Tamura

Proceedings Volume 11612, 116120Y (2021) https://doi.org/10.1117/12.2584016

KEYWORDS: Chromium, Electron beam lithography, Photomasks, Silicon, Semiconducting wafers, Line width roughness, Glasses, Electron beams, Quartz, Lithography

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Proceedings Article | 20 September 2020 Presentation

Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography

Naoki Maeda, Akihiro Konda, Kazumasa Okamoto, Takahiro Kozawa, Takao Tamura

Proceedings Volume 11518, 115180D (2020) https://doi.org/10.1117/12.2574963

KEYWORDS: Line width roughness, Electron beam lithography, Chemically amplified resists, Photomasks, Electron beams, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Electronic components

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Proceedings Article | 23 March 2020 Presentation + Paper

Mechanism of resist heating effect in chemically amplified resist

Y. Ikari, K. Okamoto, N. Maeda, A. Konda, T. Kozawa, T. Tamura

Proceedings Volume 11326, 113260G (2020) https://doi.org/10.1117/12.2551825

KEYWORDS: Polymers, Monte Carlo methods, Absorption, Chemically amplified resists, Photomasks, Temperature metrology, Ions, Lithography, Image processing, Semiconductors

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The photo-mask in lithographic process of semiconductor device has an important role to transfer the downsized target image to the wafer. Due to the development of information society, demand for semiconductor devices has been growing. In order to increase photo-mask manufacturing throughput, the current density of electron beam (EB) has been getting higher. EB exposure increases the resist temperature on mask substrate inhomogeneous depending on its current density, shot size, writing order and etc. It is known that the resist sensitivity increases with irradiated resist temperature (heating effect). So, inhomogeneous temperature increase of resist on mask substrate disturbs precise pattern formation. However, the physical or chemical mechanism of heating effect has been still unknown. Here, we examined temperature dependence of acid generation process in chemically amplified resists (CARs). Poly(4- hydroxystyrene) (PHS) and poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-4-hydroxystyrene) (PTBSHS) were used as CAR resin. Monte Carlo simulation moving thermalized electron under the electric field between polymer radical cations were performed with changing the temperature. From the simulation, it was revealed that the energy increase of thermalized electron contributes to the acid yield by 0.038 %/K. Quantification of the acid yields in resist films upon exposed to EB were performed with changing the temperature by titration method using Coumarin 6 (C6) as an acid sensitive dye. The acid yield increased by 0.14 %/K in PHS film and 0.21 %/K in PTBSHS film, respectively. Both values were higher than the simulation value (0.038 %/K). Pulse radiolysis experiment was also performed to observe deprotonation of polymer radical cations at 298 and 343 K. The decay of dimer radical cation of PTBSHS became 1.6 times faster at 343 K than that at 298 K. From the results, it is suggested that the heating effect mainly caused by the temperature dependence of deprotonation rate from the radical cations of PTBSHS.

Proceedings Article | 23 March 2020 Paper

Electron beam mask writer EBM-8000P for high throughput mask production

Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu, Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami, Takao Tamura, Kenji Ohtoshi, Hirokazu Yamada

Proceedings Volume 11324, 113241B (2020) https://doi.org/10.1117/12.2552447

KEYWORDS: Photomasks, Electron beams, Critical dimension metrology, Beam shaping

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Proceedings Article | 26 March 2019 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hayato Kimura, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10958, 109580J (2019) https://doi.org/10.1117/12.2515200

KEYWORDS: Photomasks, Extreme ultraviolet, Photoresist processing, Electron beam lithography, Electron beams

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SPIE Journal Paper | 24 September 2018

Multibeam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

JM3, Vol. 17, Issue 03, 031205, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.031205

KEYWORDS: Modulation, Photomasks, Optical lithography, Critical dimension metrology, Image resolution, Line edge roughness, Photoresist processing, Electron beam lithography, Vestigial sideband modulation, Convolution

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Proceedings Article | 12 June 2018 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10807, 1080707 (2018) https://doi.org/10.1117/12.2502599

KEYWORDS: Photomasks, Optical lithography, Photoresist processing, Electron beam lithography, Electron beams

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Proceedings Article | 5 April 2018 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10584, 105840H (2018) https://doi.org/10.1117/12.2299885

KEYWORDS: Modulation, Photomasks, Photoresist processing, Electron beam lithography, Optical lithography, Image resolution, Electron beams, Beam shaping, Vestigial sideband modulation, Convolution

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Proceedings Article | 28 September 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10446, 1044607 (2017) https://doi.org/10.1117/12.2280453

KEYWORDS: Data processing, Photomasks, Data storage, Vestigial sideband modulation, Relays, Interfaces, Data conversion, Modulation, Photoresist processing, Image processing

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Proceedings Article | 13 July 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hiroshi Yamashita, Takao Tamura, Kenji Ohtoshi

Proceedings Volume 10454, 104540E (2017) https://doi.org/10.1117/12.2283033

KEYWORDS: Photomasks, Data storage, Relays, Vestigial sideband modulation, Modulation, Data processing, Extreme ultraviolet lithography, Semiconductors, High volume manufacturing, Optical design

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Proceedings Article | 12 April 2013 Paper

Flare management for 40-nm logic devices

Yuusuke Tanaka, Takao Tamura, Masashi Fujimoto, Kyoichi Tsubata, Naka Onoda, Kiyoshi Fujii

Proceedings Volume 8683, 86832E (2013) https://doi.org/10.1117/12.2010082

KEYWORDS: Logic devices, Point spread functions, Critical dimension metrology, Error analysis, Cadmium, Photomasks, Semiconductors, Scanners, Scattering, Electronics

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Proceedings Article | 14 March 2011 Paper

Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator

Gregory McIntyre, Daniel Corliss, Remco Groenendijk, Rene Carpaij, Ton van Niftrik, Guillaume Landie, Takao Tamura, Thomas Pepin, James Waddell, Jerry Woods, Chris Robinson, Kehan Tian, Richard Johnson, Scott Halle, Ryoung-Han Kim, Erin Mclellan, Hirokazu Kato, Anthony Scaduto, Carl Maier, Matt Colburn

Proceedings Volume 7973, 797306 (2011) https://doi.org/10.1117/12.879483

KEYWORDS: Mirrors, Diffractive optical elements, Fiber optic illuminators, Scanners, Optical proximity correction, Lithography, Nanotechnology, Manufacturing, Glasses, Environmental monitoring

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Proceedings Article | 16 March 2009 Paper

Defectivity improvement by modified wafer edge treatment in immersion lithography

Masafumi Fujita, Takao Tamura, Naka Onoda, Takayuki Uchiyama

Proceedings Volume 7274, 72741G (2009) https://doi.org/10.1117/12.813385

KEYWORDS: Semiconducting wafers, Particles, Inspection, Immersion lithography, Coating, Defect inspection, Silicon, Thin film coatings, Lithography, Wafer inspection

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Proceedings Article | 16 March 2009 Paper

32nm node device laser-bandwidth OPE sensitivity and process matching

Kazuyuki Yoshimochi, Takao Tamura, Takaaki Kuribayashi, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, James Bonafede

Proceedings Volume 7274, 72742Q (2009) https://doi.org/10.1117/12.813987

KEYWORDS: SRAF, Logic devices, Critical dimension metrology, Optical simulations, Laser stabilization, Light sources, Combined lens-mirror systems, Computer simulations, Laser cutting, Tolerancing

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Proceedings Article | 11 April 2008 Paper

45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

Kazuyuki Yoshimochi, Takao Tamura, Seiji Nagahara, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, James Bonafede

Proceedings Volume 6924, 69242K (2008) https://doi.org/10.1117/12.771628

KEYWORDS: Critical dimension metrology, Laser stabilization, Optical simulations, Nanoimprint lithography, Logic devices, Beam controllers, Chromatic aberrations, Lens design, Laser cutting, Light sources

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Proceedings Article | 12 March 2008 Paper

Focus, dynamics, and defectivity performance at wafer edge in immersion lithography

Takao Tamura, Naka Onoda, Masafumi Fujita, Takayuki Uchiyama

Proceedings Volume 6924, 692419 (2008) https://doi.org/10.1117/12.771598

KEYWORDS: Semiconducting wafers, Scanners, Immersion lithography, Particles, Coating, Inspection, Wafer inspection, Reticles, Thin film coatings, Silicon

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Proceedings Article | 5 April 2007 Paper

The application of SMASH alignment system for 65-55-nm logic devices

M. Miyasaka, H. Saito, T. Tamura, T. Uchiyama, Paul Hinnen, Hyun-Woo Lee, Marc van Kemenade, Mir Shahrjerdy, Robert van Leeuwen

Proceedings Volume 6518, 65180H (2007) https://doi.org/10.1117/12.711059

KEYWORDS: Optical alignment, Diffraction, Overlay metrology, Sensors, Signal processing, Semiconducting wafers, Optical design, Signal detection, Diffraction gratings, Manufacturing

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Proceedings Article | 26 March 2007 Paper

Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node

Kazuyuki Yoshimochi, Takayuki Uchiyama, Takao Tamura, Thomas Theeuwes, Rudy Peeters, Hans van der Laan, Hans Bakker, Kenji Morisaki, Toshihiro Oga

Proceedings Volume 6520, 652011 (2007) https://doi.org/10.1117/12.711052

KEYWORDS: Critical dimension metrology, Light sources, Optical simulations, Laser stabilization, Optical proximity correction, Logic devices, Optics manufacturing, Laser applications, Composites, Electronics

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Proceedings Article | 26 March 2007 Paper

Benefit of ArF immersion lithography in 55 nm logic device manufacturing

Takayuki Uchiyama, Takao Tamura, Kazuyuki Yoshimochi, Paul Graupner, Hans Bakker, Eelco van Setten, Kenji Morisaki

Proceedings Volume 6520, 652009 (2007) https://doi.org/10.1117/12.711054

KEYWORDS: Immersion lithography, Logic devices, Semiconducting wafers, Lithography, Overlay metrology, Monochromatic aberrations, Lithographic illumination, Scanners, Manufacturing, Electronics

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Proceedings Article | 20 August 2001 Paper

Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)

Takao Tamura, Takahiro Ema, Hiroshi Nozue, Tamoya Sugahara, Akio Sugano, Jun Nitta

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436693

KEYWORDS: Vestigial sideband modulation, Scanning electron microscopy, Projection lithography, Computer programming, Electron beams, Photomasks, Lithography, Electron beam lithography, Holons, Beam shaping

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Proceedings Article | 20 August 2001 Paper

Development of data conversion system for electron-beam projection lithography (EPL) mask

Yasuhisa Yamada, Hideo Kobinata, Takao Tamura, Mami Miyasaka, Tatsuya Sakamoto, Yuzo Ogawa, Kenichi Takada, Hiroshi Yamashita, Hiroshi Nozue

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436678

KEYWORDS: Data conversion, Photomasks, Electron beams, Projection lithography, Electron beam lithography, Lithography, Semiconducting wafers, Astatine, Genetic algorithms, Wafer-level optics

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Proceedings Article | 7 July 1997 Paper

0.15-um pattern formation using cell projection electron-beam direct writing with variable shot size

Takao Tamura, Hiroshi Yamashita, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275779

KEYWORDS: Vestigial sideband modulation, Monte Carlo methods, Electron beams, Lithium, Critical dimension metrology, Electron beam lithography, Lithography, Manufacturing, Beam shaping, Interfaces

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Proceedings Article | 7 July 1997 Paper

One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing

Yasuhisa Yamada, Takao Tamura, Ken Nakajima, Hiroshi Nozue

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275792

KEYWORDS: Electroluminescence, Data conversion, Electron beams, Scattering, Critical dimension metrology, Optical resolution, Optical lithography, Electron beam lithography, Lithography, Photoresist processing

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Showing 5 of 25 publications

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