Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator

Gregory McIntyre; Daniel Corliss; Remco Groenendijk; Rene Carpaij; Ton van Niftrik; Guillaume Landie; Takao Tamura; Thomas Pepin; James Waddell; Jerry Woods; Chris Robinson; Kehan Tian; Richard Johnson; Scott Halle; Ryoung-Han Kim; Erin Mclellan; Hirokazu Kato; Anthony Scaduto; Carl Maier; Matt Colburn

doi:10.1117/12.879483

14 March 2011 Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator

Gregory McIntyre, Daniel Corliss, Remco Groenendijk, Rene Carpaij, Ton van Niftrik, Guillaume Landie, Takao Tamura, Thomas Pepin, James Waddell, Jerry Woods, Chris Robinson, Kehan Tian, Richard Johnson, Scott Halle, Ryoung-Han Kim, Erin Mclellan, Hirokazu Kato, Anthony Scaduto, Carl Maier, Matt Colburn

Author Affiliations +

Proceedings Volume 7973, Optical Microlithography XXIV; 797306 (2011) https://doi.org/10.1117/12.879483
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

This paper will describe the development, qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator for optical lithography. FlexRay ^TM, a programmable illuminator based on a MEMs multi-mirror array that was developed for TWINSCAN XT:19x0i and TWINSCAN NXT series ASML immersion scanners, was first installed in January 2010 at Albany Nanotech, with subsequent tools installed in IBM's East Fishkill Manufacturing facility. After a brief overview of the concept and benefits of FlexRay, this paper will provide a comprehensive assessment of its reliability and imaging performance. A CD-based pupil qualification (CDPQ) procedure will be introduced and shown to be an efficient and effective way to monitor pupil performance. Various CDPQ and in-resist measurement results will be described, offering convincing evidence that FlexRay reliably generates high-quality pupils and is well suited for high volume manufacturing at lithography's leading edge.

Citation Download Citation

Gregory McIntyre, Daniel Corliss, Remco Groenendijk, Rene Carpaij, Ton van Niftrik, Guillaume Landie, Takao Tamura, Thomas Pepin, James Waddell, Jerry Woods, Chris Robinson, Kehan Tian, Richard Johnson, Scott Halle, Ryoung-Han Kim, Erin Mclellan, Hirokazu Kato, Anthony Scaduto, Carl Maier, and Matt Colburn "Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator", Proc. SPIE 7973, Optical Microlithography XXIV, 797306 (14 March 2011); https://doi.org/10.1117/12.879483

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