Mr. Martin E. Mastovich Profile

Martin E. Mastovich

at Onto Innovation Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 28 May 2004 Paper

Advances in vortex via fabrication

Marc Levenson, Takeaki Ebihara, Michael Reilly, George Barclay, Vaishali Vorha, Carolyne Stafford, Martin Mastovich, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535652

KEYWORDS: Photomasks, Cadmium sulfide, Semiconducting wafers, Spiral phase plates, Critical dimension metrology, Optical vortices, Distortion, Optical lithography, Phase shifts, Scanning electron microscopy

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Proceedings Article | 2 June 2003 Paper

193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process

John Ferri, Marco Vieira, Mario Reybrouck, Martin Mastovich, Scott Bowdoin, Robert Brandom, Paul Knutrud

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487597

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Metrology, Lithography, Electron beams, Chemical analysis, 193nm lithography, Temperature metrology

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Proceedings Article | 2 June 2003 Paper

Electron beam metrology of 193-nm resists at ultralow voltage

Neal Sullivan, Ron Dixson, Benjamin Bunday, Martin Mastovich, Paul Knutrud, Pascal Fabre, Robert Brandom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487598

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Atomic force microscopy, Metrology, Electron beams, Data modeling, Contamination, Semiconducting wafers, Systems modeling, Process control

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Proceedings Article | 2 June 2003 Paper

Web-based metrology performance diagnostics

Ganesh Sundaram, Martin Mastovich, Roye Avidor, Jason Remillard, Robert Brandom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487603

KEYWORDS: Metrology, Databases, Data communications, Diagnostics, Process control, Computer security, Image quality, Scanning electron microscopy, Pattern recognition, Internet

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Proceedings Article | 2 June 2003 Paper

CD-SEM image acquisition effects on 193-nm resist line slimming

Neal Sullivan, Martin Mastovich, Scott Bowdoin, Robert Brandom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487604

KEYWORDS: Line edge roughness, Electron beams, Metrology, Critical dimension metrology, Diffractive optical elements, Image acquisition, Transistors, Process control, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 16 July 2002 Paper

Low-voltage CD-SEM applications in MEMS devices

Susan Redmond, Roger McKay, Mary Mellard, Catherine Norris, Jerry Wonnacott, Martin Mastovich

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473501

KEYWORDS: Resistors, Scanning electron microscopy, Semiconducting wafers, Oxides, Etching, Aluminum, Metals, Plasma, Microelectromechanical systems, Metrology

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Proceedings Article | 22 August 2001 Paper

Secondary-electron image profiles using bias voltage technique in deep contact hole

Yeong-Uk Ko, David Joy, Neal Sullivan, Martin Mastovich

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436786

KEYWORDS: Selenium, Monte Carlo methods, Oxides, Semiconducting wafers, Image enhancement, Electron beams, Autoregressive models, Image processing, Semiconductors, Fabrication

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Proceedings Article | 22 August 2001 Paper

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Michael Fritze, Brian Tyrrell, David Astolfi, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, David Chan, Peter Rhyins, Martin Mastovich, Neal Sullivan, Robert Brandom, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436759

KEYWORDS: Lithography, Semiconducting wafers, Optical lithography, Photomasks, Critical dimension metrology, Reticles, Cadmium, Resolution enhancement technologies, Metrology, Phase shifts

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Proceedings Article | 5 July 2000 Paper

Application of attenuated phase-shift masks to sub-0.18-um logic patterns

Michael Fritze, Peter Wyatt, David Astolfi, Paul Davis, Andrew Curtis, Douglas Preble, Susan Cann, Sandy Denault, David Chan, Joe Shaw, Neal Sullivan, Robert Brandom, Martin Mastovich

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388955

KEYWORDS: Photomasks, Logic, Lithographic illumination, Image processing, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Scanning electron microscopy, Semiconductors

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Proceedings Article | 5 July 2000 Paper

Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Michael Fritze, James Burns, Peter Wyatt, David Astolfi, T. Forte, Donna Yost, Paul Davis, Andrew Curtis, Douglas Preble, Susan Cann, Sandy Denault, Hua-Yu Liu, Joe Shaw, Neal Sullivan, Robert Brandom, Martin Mastovich

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389028

KEYWORDS: Photomasks, Transistors, Etching, Lithography, Plasma etching, Scanning electron microscopy, Deep ultraviolet, Mask making, Resolution enhancement technologies, Plasma

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Proceedings Article | 14 June 1999 Paper

Algorithm implementation and techniques for providing more-reliable overlay measurements and better tracking of the shallow-trench isolation (STI) process

Doug Schramm, Dale Bowles, Martin Mastovich, Paul Knutrud, Anastasia Tyurina

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350798

KEYWORDS: Detection and tracking algorithms, Semiconducting wafers, Chemical mechanical planarization, Oxides, Overlay metrology, Silicon, Wafer-level optics, Image registration, Edge detection, Opacity

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Showing 5 of 11 publications

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