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Dr. Mark I. Wagner
Senior Research Scientist at Micell Technologies Inc
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 23 March 2007 Paper
Photoresist dissolution into a CO2 compatible salt and CO2 solution: Investigation of Processing Conditions
Amy Zweber, Mark Wagner, Ruben Carbonell
Proceedings Volume 6519, 651948 (2007) https://doi.org/10.1117/12.712093
KEYWORDS: Photoresist materials, Head-mounted displays, Photoresist developing, Coating, Semiconducting wafers, Atomic force microscopy, Adhesives, Crystals, Carbon dioxide, Standards development
Proceedings Article | 11 April 2006 Paper
Development of EUV resists in supercritical CO2 solutions using CO2 compatible salts (CCS): Results from a two-level full factorial design of experiments (DOE)
Mark Wagner, James DeYoung, Chris Harbinson, Merrick Miles
Proceedings Volume 6153, 615346 (2006) https://doi.org/10.1117/12.656272
KEYWORDS: Standards development, Diffractive optical elements, Line width roughness, Extreme ultraviolet, Photoresist developing, Statistical analysis, Photoresist materials, Line edge roughness, Temperature metrology, Carbon dioxide
Proceedings Article | 11 April 2006 Paper
Line-width roughness analysis of EUV resists after development in homogenous CO2 solutions using CO2 compatible salts (CCS) by a three-parameter model
Vassilios Constantoudis, Evangelos Gogolides, George Patsis, Mark Wagner, James DeYoung, Chris Harbinson
Proceedings Volume 6153, 61533W (2006) https://doi.org/10.1117/12.656579
KEYWORDS: Line width roughness, Semiconducting wafers, Standards development, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Image processing, Image analysis, Software development, Scanning electron microscopy
Proceedings Article | 11 April 2006 Paper
Development of EUV resists in supercritical CO2 solutions using CO2 compatible salts (CCS)
Mark Wagner, James De Young, Chris Harbinson
Proceedings Volume 6153, 61531I (2006) https://doi.org/10.1117/12.655880
KEYWORDS: Standards development, Semiconducting wafers, Extreme ultraviolet, Chemistry, Photoresist developing, Line width roughness, Photoresist processing, Extreme ultraviolet lithography, Image processing, Photoresist materials
Proceedings Article | 11 April 2006 Paper
Development of EUV resists in homogenous CO2 solutions using CO2 compatible salts (CCS): a kinetic view of dissolution of conventional resists in supercritical CO2
James DeYoung, Mark Wagner, Chris Harbinson, Merrick Miles, Amy Zweber, Ruben Carbonell
Proceedings Volume 6153, 615345 (2006) https://doi.org/10.1117/12.655881
KEYWORDS: Photoresist materials, Photoresist developing, Standards development, Semiconducting wafers, Polymers, Crystals, Quartz, Extreme ultraviolet, Photoresist processing, Extreme ultraviolet lithography
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