Dr. Jun Kim
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 December 2023 Presentation + Paper
Christopher Leavitt, Michael Hunsweck, Florence Eschbach, Yang Liu, Kyle Vogt, Jun Kim, Andrew Sowers, Frank Abboud, Mikael Wahlsten, Robert Eklund, Mats Rosling, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park
Proceedings Volume PC12751, PC127510T (2023) https://doi.org/10.1117/12.2688097
KEYWORDS: EUV optics, Laser applications, Extreme ultraviolet, Laser development, Critical dimension metrology, Sustainability, Solid state lasers, Solid state electronics, Printing, Power consumption

Proceedings Article | 21 November 2023 Presentation + Paper
Christopher Wieland, Kristy Kormondy, Annelise Beck, Britain Smith, Firoz Ghadiali, Jun Kim, Frank Abboud, Tetsuya Sendoda, Naonari Kondo, Tomohiro Imahoko, Jeoung Kim, Chikato Kaga, Arosha Goonesekera, Wonil Cho, Sankaranarayanan Paninjath, Saikiran Madhusudhan, Prakash Deep, Shivam Nln, Sasidhara Reddy, Ranganadh Peesapati
Proceedings Volume 12751, 1275105 (2023) https://doi.org/10.1117/12.2688267
KEYWORDS: Inspection, Defect inspection, Photomasks, Optical inspection, Semiconducting wafers, Printing, Image processing, Detection and tracking algorithms, Defect detection

Proceedings Article | 30 September 2009 Paper
Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas Shah, Mark Wagner, Shmoolik Mangan
Proceedings Volume 7488, 748808 (2009) https://doi.org/10.1117/12.829637
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Defect detection, Data modeling, Wafer-level optics, Airborne remote sensing, Transform theory, Detection and tracking algorithms, Scanners

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70281H (2008) https://doi.org/10.1117/12.793058
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Defect inspection, Wafer inspection, Defect detection, Lithography, Critical dimension metrology, Contamination

Proceedings Article | 7 March 2008 Paper
Wen-Hao Cheng, Jeff Farnsworth, Wai Kwok, Andrew Jamieson, Nathan Wilcox, Matt Vernon, Karmen Yung, Yi-Ping Liu, Jun Kim, Eric Frendberg, Scott Chegwidden, Richard Schenker, Yan Borodovsky
Proceedings Volume 6924, 69241G (2008) https://doi.org/10.1117/12.772955
KEYWORDS: Photomasks, Optical lithography, Glasses, Image resolution, Chromium, Etching, 3D modeling, Electron beam lithography, Defect inspection, Semiconducting wafers

Showing 5 of 6 publications
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