CONFERENCE PROCEEDINGS
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Wei-Guo J. Lei
Staff Process Engineer at Intel Corp
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Publications (2)
Proceedings Article | 30 September 2009 Paper
Aerial image based die-to-model inspections of advanced technology masks
Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas Shah, Mark Wagner, Shmoolik Mangan
Proceedings Volume 7488, 748808 (2009) https://doi.org/10.1117/12.829637
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Defect detection, Data modeling, Wafer-level optics, Airborne remote sensing, Transform theory, Detection and tracking algorithms, Scanners
Proceedings Article | 23 September 2009 Paper
Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks
Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, Amanda Bowhill, Emile Sahouria, Minyoung Park, Neil DeBella, Pradiptya Ghosh, Steffen Schulze
Proceedings Volume 7488, 748823 (2009) https://doi.org/10.1117/12.833443
KEYWORDS: Inspection, Photomasks, Metrology, Vestigial sideband modulation, Data conversion, Data processing, Manufacturing, Standards development, Semiconducting wafers, Computer simulations
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