The high throughput time that can be achieved with laser-based lithography tools provide a tangible benefit for exposure of large areas with loose CD requirements. In this paper we present a recently developed DUV laser-based photolithography tool, supplied by Mycronic, that has been installed and qualified for optical and EUV lithography process at Intel Mask Operations. The tool utilizes a solid-state laser system for low power consumption and sustainable operation, modern electronics providing extensive logging capabilities, and an offline datapath that enables write times independent of pattern complexity. It also features multi-pass printing options that can be selected based on CD and REG requirements and throughput time, altogether providing flexibility and low cost of ownership. Tool specifications for critical dimensions and registration results will be presented in addition to tool matching and qualification data.
Mycronic assessed the market for Laser Mask Writers and concluded that there was an opportunity if the product was reliable, had high uptime, was cost-efficient to compete with fully depreciated writers and was sustainable including having a small carbon footprint. To achieve this, the platform needed to be modern allowing to support flexibility in a rapidly changing environment and enable the possibility to develop new functionalities to meet future customer demands to last long, while keeping the development cost down.
This paper describes the process and the decisions behind the SLX writer and how it has been received by the market. The future of the SLX will also be discussed and how key parameters like resolution and registration will be improved for future products.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.