Die-to-database inspections of optical patterned masks

Christopher F. Wieland; Kristy J. Kormondy; Annelise R. Beck; Britain J. Smith; Firoz Ghadiali; Jun Kim; Frank E. Abboud; Tetsuya Sendoda; Naonari Kondo; Tomohiro Imahoko; Jeoung S. Kim; Chikato Kaga; Arosha Goonesekera; Wonil Cho; Sankaranarayanan Paninjath; Saikiran Madhusudhan; Prakash Deep; Shivam Nln; Sasidhara R. Reddy; Ranganadh Peesapati

doi:10.1117/12.2688267

21 November 2023 Die-to-database inspections of optical patterned masks

Christopher F. Wieland, Kristy J. Kormondy, Annelise R. Beck, Britain J. Smith, Firoz Ghadiali, Jun Kim, Frank E. Abboud, Tetsuya Sendoda, Naonari Kondo, Tomohiro Imahoko, Jeoung S. Kim, Chikato Kaga, Arosha Goonesekera, Wonil Cho, Sankaranarayanan Paninjath, Saikiran Madhusudhan, Prakash Deep, Shivam Nln, Sasidhara R. Reddy, Ranganadh Peesapati

Author Affiliations +

Proceedings Volume 12751, Photomask Technology 2023; 1275105 (2023) https://doi.org/10.1117/12.2688267
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Die-to-database inspection of optical patterned masks enables defect detection and subsequent repair for creation of defect-free masks regardless of single- or multi-die layout. The components required for optical die-to-database inspection include (1) optical photomask inspection tool with sufficient resolution to resolve the patterns of interest, (2) computational resources for (a) preparation of mask pattern data + (b) algorithms for detection and noise reduction to distinguish real defects from background variation, and (3) network and storage infrastructure to tie it all together. In this paper, we will present the first implementation of the die-to-database inspection flow on the MATRICS tool. To maximize tool utility, the system architecture decouples tool and compute resources, such that non-die-to-database inspections can proceed while die-to-database inspection also remains underway. Details of the mask pattern data preparation will be presented alongside real examples of detection capability from an Intel mask shop.

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Christopher F. Wieland, Kristy J. Kormondy, Annelise R. Beck, Britain J. Smith, Firoz Ghadiali, Jun Kim, Frank E. Abboud, Tetsuya Sendoda, Naonari Kondo, Tomohiro Imahoko, Jeoung S. Kim, Chikato Kaga, Arosha Goonesekera, Wonil Cho, Sankaranarayanan Paninjath, Saikiran Madhusudhan, Prakash Deep, Shivam Nln, Sasidhara R. Reddy, and Ranganadh Peesapati "Die-to-database inspections of optical patterned masks", Proc. SPIE 12751, Photomask Technology 2023, 1275105 (21 November 2023); https://doi.org/10.1117/12.2688267

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