Dr. Jea-Hee Kim Profile

Dr. Jea-Hee Kim

Senior Manager at Dongbu HiTek Co Ltd

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 17 October 2008 Paper

Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-k1 lithography

Jong-doo Kim, Jae-young Choi, Jea-hee Kim, Jae-won Han

Proceedings Volume 7122, 71220X (2008) https://doi.org/10.1117/12.801557

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Chromium, Optical proximity correction, Optical simulations, Resolution enhancement technologies, Binary data, Electrons, Optical lithography

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Proceedings Article | 4 April 2008 Paper

Impact of surface treatment on resist reflow process

Young-Je Yun, Jin-Ho Park, Hakyu Choi, Seung Ryong Park, Kwangseon Choi, Jea-Hee Kim, Jae-Won Han

Proceedings Volume 6923, 69233K (2008) https://doi.org/10.1117/12.772534

KEYWORDS: Critical dimension metrology, Photoresist processing, Head-mounted displays, Glasses, Cadmium, Lithography, Semiconducting wafers, Inspection, Resolution enhancement technologies, Lenses

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Proceedings Article | 1 April 2008 Paper

Full chip compensation for local-flare-induced CD error using OPC/DRC method

Jae-Young Choi, Yeon-Ah Shim, Kyung-Hee Yun, Jong-Doo Kim, Jae-Hee Kim, Jae-Won Han

Proceedings Volume 6924, 69243L (2008) https://doi.org/10.1117/12.773092

KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Semiconducting wafers, Photomasks, Error analysis, Lithography, Scattering, Glasses, Metals

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Proceedings Article | 1 April 2008 Paper

Improvement on OPC completeness through pre-OPC hot spot detection and fix

Yeonah Shim, Jaeyoung Choi, Jeahee Kim, Bo Su, Ping Zhang, Keun-Young Kim

Proceedings Volume 6925, 692513 (2008) https://doi.org/10.1117/12.772409

KEYWORDS: Optical proximity correction, Design for manufacturing, Lithography, Semiconducting wafers, Data processing, Semiconductors, Failure analysis, Integrated circuit design, Design for manufacturability, Manufacturing

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Proceedings Article | 1 April 2008 Paper

Resolution enhancement techniques in 65 nm node nested-hole patterning

Hyesung Lee, Jaeyoung Choi, Jeahee Kim, Jaewon Han, Keun-Young Kim

Proceedings Volume 6924, 69244B (2008) https://doi.org/10.1117/12.773017

KEYWORDS: Nanoimprint lithography, Resolution enhancement technologies, Optical lithography, Photomasks, Critical dimension metrology, Diffractive optical elements, SRAF, Photoresist processing, Lithography, Optical proximity correction

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Proceedings Article | 24 March 2008 Paper

Impact of assistance feature to pattern profile for isolated feature in sub-65 nm node

Myungsoo Kim, Young-Je Yun, Eunsoo Jeong, Kwangseon Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6922, 69221K (2008) https://doi.org/10.1117/12.773109

KEYWORDS: SRAF, Line edge roughness, Artificial intelligence, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Semiconducting wafers, Inspection, Wafer-level optics, Metrology

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Proceedings Article | 21 March 2008 Paper

Diffraction feature of microlens array with a small aperture size

Seungryong Park, Jinho Park, Hakyu Choi, Young-Je Yun, Kwangseon Choi, Jeahee Kim

Proceedings Volume 6921, 69212O (2008) https://doi.org/10.1117/12.772480

KEYWORDS: Diffraction, Ray tracing, Copper indium disulfide, Diodes, Finite-difference time-domain method, CMOS sensors, Optical fiber cables, Microlens array, Image processing, Cell phones

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