CONFERENCE PROCEEDINGS
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Myungsoo Kim
at Dongbu HiTek Co Ltd
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Publications (2)
Proceedings Article | 24 March 2008 Paper
Impact of assistance feature to pattern profile for isolated feature in sub-65 nm node
Myungsoo Kim, Young-Je Yun, Eunsoo Jeong, Kwangseon Choi, Jeahee Kim, Jaewon Han
Proceedings Volume 6922, 69221K (2008) https://doi.org/10.1117/12.773109
KEYWORDS: SRAF, Line edge roughness, Artificial intelligence, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Semiconducting wafers, Inspection, Wafer-level optics, Metrology
Proceedings Article | 7 March 2008 Paper
Double patterning in lithography for 65nm node with oxidation process
Eunsoo Jeong, Jeahee Kim, Kwangsun Choi, Minkon Lee, Doosung Lee, Myungsoo Kim, Chansik Park
Proceedings Volume 6924, 692424 (2008) https://doi.org/10.1117/12.772544
KEYWORDS: Silicon, Oxides, Double patterning technology, Etching, Optical lithography, Photomasks, Lithography, Photoresist processing, Thermal oxidation, Oxidation
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