Dr. Azat M. Latypov Profile

Dr. Azat M. Latypov

Principal Member of Technical Staff at Siemens EDA

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Publications (28)

Proceedings Article | 10 April 2024 Poster + Paper

Towards efficient and accurate cost functions for EUVL stochastic-aware OPC correction and verification: via failure probability versus image and process variation band metrics

Shuling Wang, Azat Latypov, Shumay Shang, Germain Fenger, Chih-I Wei, Xima Zhang

Proceedings Volume 12953, 1295319 (2024) https://doi.org/10.1117/12.3010912

KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Optical proximity correction, Extreme ultraviolet lithography, Image processing, Photovoltaics, Photon transport, Light absorption, Industry

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Proceedings Article | 9 April 2024 Presentation + Paper

Principal components and optimal feature vectors of EUVL stochastic variability: applications of Karhunen-Loève expansion to efficient estimation of stochastic failure probabilities and stochastic metrics

Azat Latypov, Chih-I Wei, Shumay Shang, Germain Fenger

Proceedings Volume 12957, 129571D (2024) https://doi.org/10.1117/12.3011090

KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Covariance, Failure analysis, Monte Carlo methods, Statistical analysis, Principal component analysis, Photoresist processing, 3D modeling, Extreme ultraviolet

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SPIE Journal Paper | 19 October 2023

Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling

Chih-I Wei, Seulki Kang, Sayantan Das, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Germain Fenger, Azat Latypov, Ir Kusnadi, Gurdaman Khaira, Yuichiro Yamazaki, Werner Gillijns, Sandip Halder, Gian Lorusso

JM3, Vol. 22, Issue 04, 041603, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041603

KEYWORDS: Modeling, Data modeling, Semiconducting wafers, Optical proximity correction, Contour modeling, Metrology, Calibration, Stochastic processes, Scanning electron microscopy, Performance modeling

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Proceedings Article | 28 April 2023 Poster + Paper

Importance sampling in Gaussian random field EUV stochastic model for quantification of stochastic variability of EUV vias

Zexin Pan, Azat Latypov, Chih-I Wei, Peter De Bisschop, Germain Fenger, John Sturtevant

Proceedings Volume 12494, 1249419 (2023) https://doi.org/10.1117/12.2658651

KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Extreme ultraviolet lithography, Extreme ultraviolet, Statistical analysis, Optical proximity correction, Error analysis

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Proceedings Article | 28 April 2023 Poster + Paper

EUV SRAFs printing modeling and verification in 2D hole array

Ling Ee Tan, Chih-I Wei, Lianghoon Yin, Azat Latypov, Shuling Wang, Satya Sriram, Prakash Deep, Farruh Shahidi, Shumay Shang, Germain Fenger, Le Hong, Werner Gillijns

Proceedings Volume 12494, 1249417 (2023) https://doi.org/10.1117/12.2658320

KEYWORDS: SRAF, Printing, Stochastic processes, Modeling, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet, Design and modelling, Data modeling, Photomasks

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Proceedings Article | 28 April 2023 Presentation + Paper

Compact modeling of stochastics and application in OPC

Werner Gillijns, Jae-uk Lee, Ryan Ryoung han Kim, Chih-I Wei, Xima Zhang, Azat Latypov, Germain Fenger, John Sturtevant

Proceedings Volume 12494, 124940J (2023) https://doi.org/10.1117/12.2658260

KEYWORDS: Optical proximity correction, Stochastic processes, Semiconducting wafers, Modeling, Simulations, Design and modelling, Extreme ultraviolet lithography, Calibration, Logic, Lithography

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Proceedings Article | 16 September 2022 Paper

EUV SRAFs printing modeling with bright field mask

Chih-I Wei, Azat Latypov, Shuling Wang, Satya Sriram, Prakash Deep, Yunfei Deng, Ethan Maguire, Shumay Shang, Germain Fenger, Werner Gillijns

Proceedings Volume 12325, 1232506 (2022) https://doi.org/10.1117/12.2640532

KEYWORDS: SRAF, Semiconducting wafers, Stochastic processes, Data modeling, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Calibration, Line width roughness

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Proceedings Article | 26 May 2022 Presentation + Paper

Calibration of Gaussian random field stochastic EUV models

Azat Latypov, Chih-I Wei, Peter De Bisschop, Gurdaman Khaira, Germain Fenger

Proceedings Volume 12051, 1205105 (2022) https://doi.org/10.1117/12.2614142

KEYWORDS: Stochastic processes, Line edge roughness, Calibration, Line width roughness, Extreme ultraviolet, Statistical analysis, Diffusion, Photoresist processing, Monte Carlo methods, Extreme ultraviolet lithography

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Proceedings Article | 22 February 2021 Presentation + Paper

Gaussian random field EUV stochastic models, their generalizations and lithographically meaningful stochastic metrics

Azat Latypov, Gurdaman Khaira, Germain Fenger, Shuling Wang, Marko Chew, Shumay Shang

Proceedings Volume 11609, 1160917 (2021) https://doi.org/10.1117/12.2583792

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Proceedings Article | 23 March 2020 Presentation + Paper

Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula

Azat Latypov, Gurdaman Khaira, Germain Fenger, John Sturtevant, Chih-I Wei, Peter De Bisschop

Proceedings Volume 11323, 113230L (2020) https://doi.org/10.1117/12.2551965

KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Photons, Photoresist processing, Failure analysis, Extreme ultraviolet, Calibration, Statistical analysis, Data modeling, Semiconducting wafers

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Proceedings Article | 19 March 2018 Presentation + Paper

Systematic assessment of the contributors of line edge roughness in EUV lithography using simulations

Anindarupa Chunder, Azat Latypov, John Biafore, Harry Levinson, Todd Bailey

Proceedings Volume 10583, 105831N (2018) https://doi.org/10.1117/12.2297492

KEYWORDS: Line edge roughness, Stochastic processes, Calibration, Edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Metals, Photoresist materials, Absorption, Monte Carlo methods

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Proceedings Article | 27 March 2017 Presentation + Paper

Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations

Anindarupa Chunder, Azat Latypov, Yulu Chen, John Biafore, Harry Levinson, Todd Bailey

Proceedings Volume 10146, 101460B (2017) https://doi.org/10.1117/12.2258693

KEYWORDS: Monte Carlo methods, Stochastic processes, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, EUV optics, Lithography, Chemically amplified resists, Calibration, Edge roughness, Photoresist processing

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Proceedings Article | 27 March 2017 Presentation + Paper

Estimation of effects of thermal fluctuations in graphoepitaxy DSA of cylinder-forming block copolymers

Alec Bowen, Azat Latypov, Todd Bailey

Proceedings Volume 10146, 1014610 (2017) https://doi.org/10.1117/12.2258709

KEYWORDS: Thermal effects, Lithography, Molecules, Molecular self-assembly, Annealing, Integrated circuits, Applied physics, Directed self assembly, Fluctuations and noise, Polymers

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Proceedings Article | 24 March 2017 Paper

Optimization of stochastic EUV resist models parameters to mitigate line edge roughness

John Biafore, Azat Latypov, Anindarupa Chunder, Andy Brendler, Todd Bailey, Harry Levinson

Proceedings Volume 10143, 101432B (2017) https://doi.org/10.1117/12.2258707

KEYWORDS: Line edge roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Optimization (mathematics), Stochastic processes, Photoresist materials, Edge roughness, Photoresist processing, Critical dimension metrology, Diffusion, Diffractive optical elements, Tolerancing

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SPIE Journal Paper | 12 August 2015

Improving the lithographic process window using directed self-assembly-aware printing assist features

Azat Latypov, Tamer H. Coskun

JM3, Vol. 14, Issue 03, 031213, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031213

KEYWORDS: Atrial fibrillation, Optical proximity correction, Lithography, Deep ultraviolet, SRAF, Linear filtering, Etching, Printing, Semiconducting wafers, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

DSA-aware assist features

Azat Latypov, Tamer Coskun

Proceedings Volume 9423, 94231G (2015) https://doi.org/10.1117/12.2085954

KEYWORDS: Etching, Atrial fibrillation, Optical proximity correction, SRAF, Lithography, Deep ultraviolet, Linear filtering, Semiconducting wafers, Optical lithography, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends

Azat Latypov, Tamer Coskun, Grant Garner, Moshe Preil, Gerard Schmid, Ji Xu, Yi Zou

Proceedings Volume 9049, 904908 (2014) https://doi.org/10.1117/12.2046082

KEYWORDS: Monte Carlo methods, Atrial fibrillation, Etching, Optical lithography, Polymers, Molecules, Polymethylmethacrylate, Roentgenium, Computer simulations, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Towards the fast DSA: improvement of computational performance of the DSA model

Azat Latypov

Proceedings Volume 9049, 904923 (2014) https://doi.org/10.1117/12.2046048

KEYWORDS: Calibration, Performance modeling, Picosecond phenomena, Polymers, Spatial frequencies, Profiling, Roentgenium, Diffusion, Optical proximity correction, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

A full-chip DSA correction framework

Wei-Long Wang, Azat Latypov, Yi Zou, Tamer Coskun

Proceedings Volume 9049, 90491J (2014) https://doi.org/10.1117/12.2045982

KEYWORDS: Optical proximity correction, Etching, Computer simulations, Monte Carlo methods, Printing, Lithography, Detection and tracking algorithms, Optimization (mathematics), Deep ultraviolet, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Exploration of the directed self-assembly based nano-fabrication design space using computational simulations

Azat Latypov, Moshe Preil, Gerard Schmid, Ji Xu, He Yi, Kenji Yoshimoto, Yi Zou

Proceedings Volume 8680, 868013 (2013) https://doi.org/10.1117/12.2011238

KEYWORDS: Monte Carlo methods, Optical proximity correction, Computer simulations, Polymers, Annealing, Polymethylmethacrylate, Deep ultraviolet, Integrated circuits, Nanofabrication, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Computational solution of inverse directed self-assembly problem

Azat Latypov

Proceedings Volume 8680, 86800Z (2013) https://doi.org/10.1117/12.2011575

KEYWORDS: Solids, Detection and tracking algorithms, Optimization (mathematics), Algorithm development, Roentgenium, Optical proximity correction, Etching, Inverse problems, Manufacturing, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Computational simulation of block copolymer directed self-assembly in small topographical guiding templates

He Yi, Azat Latypov, H.-S. Philip Wong

Proceedings Volume 8680, 86801L (2013) https://doi.org/10.1117/12.2011264

KEYWORDS: Polymers, Polymer thin films, Computer simulations, Optical lithography, Lithography, Polymethylmethacrylate, Roentgenium, 3D modeling, Coating, Directed self assembly

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Proceedings Article | 30 June 2012 Paper

Systematic study of source mask optimization and verification flows

Yu Ben, Azat Latypov, Gek Soon Chua, Yi Zou

Proceedings Volume 8441, 84410U (2012) https://doi.org/10.1117/12.965565

KEYWORDS: Source mask optimization, Molybdenum, Optical proximity correction, Electroluminescence, Resolution enhancement technologies, Tolerancing, Critical dimension metrology, Semiconducting wafers, Data modeling, Calibration

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Proceedings Article | 23 March 2012 Paper

EUV OPC for the 20-nm node and beyond

Chris Clifford, Yi Zou, Azat Latypov, Oleg Kritsun, Thomas Wallow, Harry Levinson, Fan Jiang, Deniz Civay, Keith Standiford, Ralph Schlief, Lei Sun, Obert Wood, Sudhar Raghunathan, Pawitter Mangat, Hui Peng Koh, Craig Higgins, Jeffrey Schefske, Mandeep Singh

Proceedings Volume 8322, 83221M (2012) https://doi.org/10.1117/12.916171

KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Deep ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Critical dimension metrology, Printing, Monte Carlo methods

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Proceedings Article | 20 October 2006 Paper

Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulators

Azat Latypov

Proceedings Volume 6349, 63490R (2006) https://doi.org/10.1117/12.686518

KEYWORDS: Photomasks, Spatial light modulators, Mirrors, Reflectivity, Modulation, Micromirrors, Diffraction, Transmittance, Semiconducting wafers, Optical lithography

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Proceedings Article | 24 March 2006 Paper

Achieving mask-based imaging with optical maskless lithography

Elizabeth Stone, Jason Hintersteiner, Wenceslao Cebuhar, Ronald Albright, Nicholas Eib, Azat Latypov, Nabila Baba-Ali, Sherman Poultney, Ebo Croffie

Proceedings Volume 6151, 61512E (2006) https://doi.org/10.1117/12.658690

KEYWORDS: Spatial light modulators, Mirrors, Photomasks, Optical proximity correction, Transistors, Maskless lithography, Calibration, Optimization (mathematics), Semiconducting wafers, Diffraction

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Proceedings Article | 6 May 2005 Paper

Optical rasterization algorithms for contrast devices utilizing different physical modulation principles in optical maskless lithography

Azat Latypov, Ronald Albright, Nabila BabaAli, Wenceslao Cebuhar, Jason Hintersteiner, Elizabeth Stone

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600241

KEYWORDS: Mirrors, Spatial light modulators, Modulation, Photomasks, Diffraction, Maskless lithography, Nanoimprint lithography, Transmittance, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 17 December 2003 Paper

Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node

Ebo Croffie, Nick Eib, Neal Callan, Nabila Baba-Ali, Azat Latypov, Jason Hintersteiner, Torbjorn Sandstrom, Arno Bleeker, Kevin Cummings

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518747

KEYWORDS: Mirrors, Spatial light modulators, Diffraction, Light scattering, Maskless lithography, Near field, Electromagnetism, Photomasks, Imaging systems, Electromagnetic scattering

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Showing 5 of 28 publications

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