Paper
26 March 2013 Computational simulation of block copolymer directed self-assembly in small topographical guiding templates
He Yi, Azat Latypov, H.-S. Philip Wong
Author Affiliations +
Abstract
Directed self-assembly (DSA) of block copolymers (BCP) has attracted significant interest due to its promising potential as the next generation lithography candidate. In this paper we used Self-Consistent-Field-Theory (SCFT) to computationally simulate the equilibrium behavior of self-assembly inside a confinement well, which is also known as graphoepitaxy. More specifically, we studied the DSA of cylinder-forming block copolymers for contact hole/via patterning, mainly focusing on 1-hole DSA pattern inside confinement well. The SCFT simulation results of parametric studies for confinement well sizes ranging from 50nm to 90nm, different polymer film thicknesses and a range of the wall/substrate affinity parameter values, are presented, as well as verified by experiments.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
He Yi, Azat Latypov, and H.-S. Philip Wong "Computational simulation of block copolymer directed self-assembly in small topographical guiding templates", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801L (26 March 2013); https://doi.org/10.1117/12.2011264
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CITATIONS
Cited by 21 scholarly publications and 3 patents.
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KEYWORDS
Directed self assembly

Polymers

Polymer thin films

Computer simulations

Optical lithography

Lithography

Polymethylmethacrylate

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