Ms. Taehee Park Profile

Taehee Park

at Inha Univ.

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Publications (1)

Proceedings Article | 1 December 2022 Presentation + Paper

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647

KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition

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