Dr. Ashwanth Subramanian Profile

Dr. Ashwanth Subramanian

at Stony Brook Univ

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Author

Publications (8)

Proceedings Article | 30 April 2023 Presentation

Atomic layer deposition derived organic-inorganic hybrid EUV photoresists

Ashwanth Subramanian, Dan Le, Su Min Hwang, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing

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Proceedings Article | 30 April 2023 Presentation

Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning

Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 124981A (2023) https://doi.org/10.1117/12.2658659

KEYWORDS: Optical lithography, Oxides, Metals, Polymer thin films, Nanolithography, Nanocomposites, Materials processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 1 December 2022 Presentation + Paper

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647

KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition

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Proceedings Article | 11 November 2022 Presentation

Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition

Won-Il Lee, Ashwanth Subramanian, Nikhil Tiwale, Dan Le, Su Min Hwang, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920K (2022) https://doi.org/10.1117/12.2641794

KEYWORDS: Extreme ultraviolet lithography, Reactive ion etching, Photoresist materials, Atomic layer deposition, Electron beam lithography, Thin films, Photoresist developing, Etching, Semiconductors, Photons

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Proceedings Article | 11 November 2022 Presentation

EUVL characteristics of indium-oxide-infiltrated PMMA hybrid photoresist synthesized by vapor-phase infiltration

Ashwanth Subramanian, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920L (2022) https://doi.org/10.1117/12.2643226

KEYWORDS: Extreme ultraviolet lithography, Polymethylmethacrylate, Photoresist materials, Silicon, Resistance, Indium oxide, Etching, Electron beam lithography, Dry etching, Plasma

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Proceedings Article | 13 June 2022 Presentation

Infiltration synthesis: paving way for uniquely functional hybrids and direct-writing optoelectronic nanostructures

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Aaron Stein, Chang-Yong Nam

Proceedings Volume PC12054, PC120540G (2022) https://doi.org/10.1117/12.2618064

KEYWORDS: Nanostructures, Optoelectronics, Thin films, Thin film devices, Polymers, Polymer thin films, Photoresist materials, Oxides, Optoelectronic devices, Microelectromechanical systems

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Proceedings Article | 22 February 2021 Presentation + Paper

Hybrid resist synthesis by ex-situ vapor-phase infiltration of metal oxides into conventional organic resists

Nikhil Tiwale, Ashwanth Subramanian, Guillaume Freychet, Eliot Gann, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 11612, 116120A (2021) https://doi.org/10.1117/12.2583908

KEYWORDS: Etching, Oxides, Metals, Extreme ultraviolet, Resistance, Optical lithography, Silicon, Scanning transmission electron microscopy, Plasma etching, Nanolithography

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Proceedings Article | 23 March 2020 Presentation + Paper

Infiltration synthesis of hybrid nanocomposite resists for advanced nanolithography

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Jiyoung Kim, Aaron Stein, Chang-Yong Nam

Proceedings Volume 11326, 113260J (2020) https://doi.org/10.1117/12.2552164

KEYWORDS: Etching, Electron beam lithography, Extreme ultraviolet lithography, Polymethylmethacrylate, Atomic layer deposition

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Showing 5 of 8 publications

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