Solar-blind (<280nm) deep-ultraviolet (DUV) avalanche photodetectors (APDs) are of importance in various applications such as quantum communication, biomedical, defense, and non-line-of-sight (NLOS) communication. This makes the detectors from AlxGa1-xN materials attractive for such applications owing to their wide direct-bandgap characteristics. In this work, top-illuminated DUV Al0.6Ga0.4N p-i-n APD structures were designed, grown by metalorganic chemical vapor deposition on bulk AlN substrates, and fabricated. The devices showed distinctive avalanche breakdown behavior, with breakdown voltages of -150V, and low-leakage current density of <10-8A/cm2. The peak spectral response is 141mA/W at the wavelength of 245nm under 0V.
III-Nitride laser diodes (LDs) emitting in the near ultraviolet spectral region can enable various important applications such as high-precision chip-scale atomic clocks. However, III-N LDs emitting near 369nm suffer from material and heterostructure design challenges including stress-induced layer cracking and p-type doping limitations. We will present a detailed study on the influence of the Al mole fraction and thickness on the occurrence of surface cracks of heterostructures using nonplanar growth by metalorganic chemical vapor deposition on macro-patterned GaN/sapphire templates and bulk GaN substrates. Data on the nonplanar growth of full III-N UV LD structures will be presented.
Front-illuminated p-i-n GaN-based ultraviolet (UV) avalanche photodiodes (APDs) were grown by metalorganic chemical vapor deposition (MOCVD) on 25 mm dia. bulk Ammono® n-GaN substrate having a low etch pit density (EPD) less than 5 × 104 [cm-2] and processed into 6×6 APD arrays. The devices employed N-ion implantation to achieve sidewall passivation. Evaluation of these 6×6 arrays will help to confirm the uniformity of the epitaxial materials and device processing. The maximum avalanche gain reached ~ 3×105 at the breakdown (current limited). The dark current density was 10-9 A/cm2 at reverse bias up to -20 V and the APDs exhibited a reverse breakdown voltage of 81 ± 1 V for all 36 devices without any leaky devices, confirming a high uniformity of the growth and fabrication processes.
Detection of ultraviolet (UV) bands offers increased spatial resolution, small pixel sizes, and large format arrays, thus benefitting a variety of NASA, defense, and commercial applications. AlxGa1-xN semiconductor alloys, which have attracted much interest for detection in the UV spectral region, have been shown to enable high optical gains, high sensitivities with the potential for single-photon detection, and low dark current performance in ultraviolet avalanche photodiodes (UV-APDs). We are developing GaN/AlGaN UV-APDs with large pixel sizes that demonstrate consistent and uniform device performance and operation. These UV-APDs are fabricated through high quality metal organic chemical vapor deposition (MOCVD) growth on lattice-matched, low dislocation density GaN substrates with optimized material growth and doping parameters. The use of these low defect density substrates is a critical element to realizing highly sensitive UV-APDs and arrays with suppressed dark current and jitter under high electric fields. Optical gains of 5×106 and greater with enhanced quantum efficiencies over the 320-400 nm spectral range have been demonstrated, enabled by a strong avalanche multiplication process. We are additionally using device technology developed for high voltage GaN p-i-n rectifier devices to enable advanced Geiger-mode UVAPDs with single-photon counting capability. This technology provides extremely low leakage currents in the reverse bias range near avalanche breakdown, a necessary requirement for stable Geiger-mode operation. The variable-area GaN/AlGaN UV-APD detectors and arrays being developed enable advanced sensing performance over UV bands of interest with high resolution detection for NASA Earth Science applications.
Detection of ultraviolet (UV) bands offers increased spatial resolution, small pixel sizes, and large format arrays, thus benefitting a variety of NASA, defense, and commercial applications. AlxGa1-xN semiconductor alloys, which have attracted much interest for detection in the UV spectral region, have been shown to enable high optical gains, high sensitivities with the potential for single-photon detection, and low dark current performance in ultraviolet avalanche photodiodes (UV-APDs). We are developing GaN/AlGaN UV-APDs with large pixel sizes that demonstrate consistent and uniform device performance and operation. These UV-APDs are fabricated through high quality metal organic chemical vapor deposition (MOCVD) growth on lattice-matched, low dislocation density GaN substrates with optimized material growth and doping parameters. The use of these low defect density substrates is a critical element to realizing highly sensitive UV-APDs and arrays with suppressed dark current and jitter under high electric fields. Optical gains of 5×106 and greater with enhanced quantum efficiencies over the 320-400 nm spectral range have been demonstrated, enabled by a strong avalanche multiplication process. We are additionally using device technology developed for high voltage GaN p-i-n rectifier devices to enable advanced Geiger-mode UVAPDs with single-photon counting capability. This technology provides extremely low leakage currents in the reverse bias range near avalanche breakdown, a necessary requirement for stable Geiger-mode operation. The variable-area GaN/AlGaN UV-APD detectors and arrays being developed enable advanced sensing performance over UV bands of interest with high resolution detection for NASA Earth Science applications.
Ultraviolet (UV) and infrared (IR) detector and array technologies have proven to be at the heart of many remote sensing instruments for various NASA missions. These exciting AlGaN ultraviolet avalanche photodiode (UV-APD) and HgCdTe-graphene photodetector and focal plane array (FPA) technologies are being developed for high performance UV and IR sensing to support and further advance a variety of NASA Earth Science applications. This paper will present our recent results on GaN/AlGaN UV-APDs grown by metal-organic chemical vapor deposition (MOCVD) on GaN substrates with avalanche gains greater than 5×106, and high responsivities. We are also developing room temperature operating graphene-enhanced HgCdTe mid-wave infrared (MWIR) detectors and focal plane arrays (FPAs). These compact and low-cost MWIR sensors can benefit various NASA remote sensing applications. For MWIR detection it is very desirable to develop IR detector technologies that operate at or near room temperature to minimize cooling requirements. The 2-5 μm MWIR spectral band is useful for measuring sea surface temperatures, cloud properties, volcanic activities, and forest fires, among other applications. Using low size, weight, power, and cost MWIR sensors on smaller platforms in low orbit can enable improved measurements of thermal dynamics with high spatial resolution. We will discuss modelling and experimental results for these devices.
The shorter wavelengths of the ultraviolet (UV) band enable detectors to operate with increased spatial resolution, variable pixel sizes, and large format arrays, benefitting a variety of NASA, defense, and commercial applications. AlxGa1-xN semiconductor alloys, which have attracted much interest for detection in the UV spectral region, have been shown to enable high optical gains, high sensitivities with the potential for single photon detection, and low dark current performance in ultraviolet avalanche photodiodes (UV-APDs). We are developing GaN/AlGaN UV-APDs with large pixel sizes that demonstrate consistent and uniform device performance and operation. These UV-APDs are fabricated through high quality metal organic chemical vapor deposition (MOCVD) growth on lattice-matched, low dislocation density GaN substrates with optimized material growth and doping parameters. The use of these low defect density substrates is a critical element to realizing highly sensitive UV-APDs and arrays with suppressed dark current under high electric fields. Optical gains greater than 5×106 with enhanced quantum efficiencies over the 350-400 nm spectral range have been demonstrated, enabled by a strong avalanche multiplication process. Furthermore, we are developing 6×6 arrays of devices to test high gain UV-APD array performance at ~355 nm. These variable-area GaN/AlGaN UV-APD detectors and arrays enable advanced sensing performance over UV bands of interest with high resolution detection for NASA Earth Science applications.
We report the current progress of our development of near-ultraviolet (NUV) III-nitride vertical-cavity LED emitters and avalanche photodetectors grown by metalorganic chemical vapor deposition (MOCVD). The III-N emitters are designed to be UV vertical-cavity surface-emitting lasers operating at 369.5nm. We describe the development of the growth and processing of an air-gap/AlGaN distributed Bragg reflector (DBR) consisting of five-pairs of quarter-wavelength layers of Al0.12Ga0.88N and air-gap regions created by selective chemical etching. A 4-6λ cavity was employed in the laser structure. We also report on the electrical and optical emission characteristics of these microcavity emitters. The photodetectors are GaN- and AlGaN-based p-i-n avalanche photodiodes (APDs) designed for front-side illumination. We report on the electrical and optical detection characteristics of these photodetectors.
Detection of ultraviolet (UV) bands provides distinct advantages for NASA, defense, and commercial applications, including increased spatial resolution, small pixel sizes, and large format arrays. AlxGa1-xN semiconductor alloys have attracted great interest for detection in the UV spectral region because of their potential for high optical gain, high sensitivity, and low dark current performance in ultraviolet avalanche photodiodes (UV-APDs). We are developing GaN/AlGaN UV-APDs that demonstrate consistent and reliable UV-APD performance and operation. For these UV detectors we have measured gains of above 5×106 and high quantum efficiencies at ~350 nm enabled by a strong avalanche multiplication process. These UV-APDs are fabricated through high quality metal organic chemical vapor deposition (MOCVD) growth on lattice-matched, low dislocation density GaN substrates with optimized GaN/AlGaN UV-APD material growth and doping parameters. The high performance, variable-area GaN/AlGaN UV-APD detectors and arrays can be customized to a wide variety of sizes including large-area formats to enable sensing and high-resolution detection over UV bands of interest.
Front-illuminated GaN p-i-p-i-n separate-absorption and multiplication avalanche photodiode (SAM-APD) epitaxial structures were grown by metalorganic chemical vapor deposition (MOCVD) on n-type bulk GaN substrates and fabricated into 4×4 arrays with a large detection area of 100×100 μm2. The SAM-APD array showed a uniform distribution of dark current density of JDark<(5.1±0.8)×10-8 A/cm2 at reverse bias (VR) of 44 V except for two of them. In addition, the average onset points of breakdown voltages (VBR) of the SAM-APD array was 73.1±0.21 V, and no microplasmas were visually observed after multiple times I-V scans.
Optically pumped VCSELs with a 1λ thick optical cavity lasing at 375 nm have been demonstrated using a pulsed 248 nm KrF excimer laser source. To realize a high-reflectivity mirror on the bottom of the cavity, five-period airgap/ Al0.05Ga0.95N DBRs with a large refractive index contrast have been employed while the top mirror was formed by dielectric DBRs consisting of twelve pairs HfO2/SiO2. The lowest threshold incident power density measured at room temperature was estimated to be ~270 kW/cm2. The achieved optically pumped VCSEL demonstrates the possibility that the airgap/AlxGa1-xN DBRs can be used as a mirror for injection laser devices.
We report III-N surface-emitting resonant-cavity light-emitting diodes (RCLEDs) at λ = 375 nm using a novel hybridmirror approach. The hybrid mirrors consist of 5 pairs of air-gap/AlGaN distributed Bragg reflector (DBR) at the bottom side of the vertical cavity and HfO2/SiO2 dielectric DBR (DDBR) on the top to facilitate the formation of a resonant cavity for nitride-based surface light emitting diodes. The air-gap/AlGaN DBR replaces the conventional thick stack of semiconductor DBR to achieve high reflectivity. Hybrid-mirror III-N RCLEDs with airgap/AlGaN DBR mirror were fabricated and the results showed that the III-N RCLEDs achieved high current density operation up to 40 kA/cm2 with a peak emission wavelength atλ = 375 nm and a full-width-half-maximum (FWHM) of 9.3 nm at room temperature.
Two different structures of AlGaN/InGaN ultraviolet (UV) multiple quantum wells (MQWs) were grown in a metalorganic chemical vapor deposition (MOCVD) system, and their performance under optically pumped stimulated emission were experimentally investigated. During the MOCVD epitaxial growth of the AlGaN/InGaN MQWs, the growth rate of the AlGaN quantum barriers (QBs) was intentionally reduced to improve the surface morphology. Atomic-force microscopy (AFM) images show that the AlGaN QBs have a smooth surface with clear step flow patterns. The surface morphology of InGaN QWs was improved by thermal annealing effect when the growth temperature rose to the one of the AlGaN QBs. With optical confinement layers on both the n- and p-sides, the threshold pumping power density of optical stimulated emission for AlGaN/InGaN MQWs was determined to be 168 kW/cm2. In order to reduce the negative effect of the interface between AlGaN QBs and InGaN QWs, another MQW structure with a larger quantum well thickness was designed and epitaxial grown. The optical investigation of sample B showed a threshold pumping power density of 124 kW/cm2, which is 26% lower than sample A.
Electro-optical detection in ultraviolet (UV) and near-infrared (NIR) bands has distinct advantages for various applications. UV/NIR wavelengths are desired for a variety of NASA, defense and commercial applications. While UV and NIR detection technologies are governed by similar physical principles, a major differentiating factor lies in the choice of detector materials. Using the GaN/AlGaN material system, we are developing avalanche photodiodes (APDs) as discrete devices with high gains and responsivities. These devices, based on high crystalline quality metal organic chemical vapor deposition (MOCVD) growth on lattice-matched GaN substrates, demonstrate uniform and reliable distribution of breakdown voltage and leakage currents with gains of above 106. For NIR detection we have employed epitaxial layer deposition of germanium on silicon for room temperature operation. This development is focused on demonstrating very low noise performance as a result of low dislocation densities and dark currents. Both these material/device technologies can be adapted to create arrays of detectors for a variety of applications. The primary objective in developing these sensing and imaging technologies is to advance the state-of-the-art to benefit diverse UV/NIR applications for NASA, defense, and commercial applications.
Vertical-cavity surface-emitting lasers (VCSELs) are known to have advantages of lower threshold current operation, circular and low-divergence output beam, and lower temperature sensitivity compared to edge-emitting laser diodes. In conventional VCSELs, the formation of a current aperture plays a vital role in the device characteristics. Low laser thresholds and single-transverse-mode operation would not be possible without a well-defined current aperture to confine carriers to generate photons between the two distributed Bragg reflectors. Since the introduction of the controlled oxidation process for the AlxGa1-xAs material system by Dallesasse and Holonyak in 1989, most VCSELs have employed oxidation for current aperture formation as well as optical confinement and this technique has become one of the most commonly used fabrication techniques for traditional III-V compound semiconductor infrared VCSELs. However, for III-N emitters operating at wavelengths in the ultraviolet to green wavelength range, the formation of Al-based native oxide layers has not proven feasible. As a result, various current-confinement techniques have been studied such as, selective-area growth of buried AlN, oxidizing AlInN, and selective activation of acceptors.
In this work, we report an ion-implantation process which is effective for carrier confinement and defines a current aperture for our III-N ultraviolet microcavity light-emitting diodes (MCLEDs). The devices have peak emission wavelength of ~371.4 nm with the spectral linewidth of 5.1 nm at the highest pulsed current injection level of 15 kA/cm2. Further discussion on the material growth, material characterization, implantation parameters, as well as numerical simulation for structural design will be presented in the conference.
We report our current development progress of ultraviolet vertical-cavity surface-emitting lasers, which included the development of an electrically conducting n-DBR consisting of 40-pairs of Si-doped quarter-wavelength layers of Al0.12Ga0.88N and GaN. A peak reflectivity of 91.6% at 368 nm was measured and a series resistance of 17.7Ω was extracted near the maximum measured current of 100 mA. Furthermore, a micro-cavity light emitting diode was demonstrated by utilizing the established n-DBR. A 2λ cavity was subsequently grown on the 40-pair Al0.12Ga0.88N/GaN n-DBR and a peak wavelength of 371.4 nm was observed with spectral linewidth of 5.8 nm.
High-resolution imaging in ultraviolet (UV) bands has many applications in defense and commercial systems. The shortest wavelength is desired for increased spatial resolution, which allows for small pixels and large formats. The next frontier is to develop UV avalanche photodiode (UV-APD) arrays with high gain to demonstrate high-resolution imaging. We compare performance characteristics of front-illuminated Al0.05Ga0.95N UV-APDs grown on a free-standing (FS) GaN substrate and a GaN/sapphire template. UV-APDs grown on a FS-GaN substrate show lower dark current densities for all fabricated mesa sizes than similar UV-APDs grown on a GaN/sapphire template. In addition, stable avalanche gain higher than 5×105 and a significant increase in the responsivity of UV-APDs grown on a FS-GaN substrate are observed as a result of avalanche multiplication at high reverse bias. We believe that the high crystalline quality of Al0.05Ga0.95N UVAPDs grown on a FS-GaN substrate with low dislocation density is responsible for the observed improvement of low leakage currents, high performance photodetector characteristics, and reliability of the devices.
A 245.3 nm deep ultraviolet optically pumped AlGaN based multiple-quantum-well laser operating at room temperature is described. Epitaxial growth was performed by metalorganic chemical vapor deposition on a c-plane bulk AlN substrate at a growth temperature of ~ 1130 °C. The wafer was fabricated into cleaved bars with a cavity length of ~1.45 mm and the lasing threshold was determined to be 297 kW/cm2 under pulsed 193 nm ArF excimer laser excitation. A further ~20% reduction in threshold pumping power density was observed with six pairs of SiO2/HfO2 distributed Bragg reflector deposited at the rear side of facets.
High-resolution imaging in ultraviolet (UV) bands has many applications in defense and commercial systems. The shortest wavelength is desired for increased spatial resolution, which allows for small pixels and large formats. In past work, UV avalanche photodiodes (APDs) have been reported as discrete devices demonstrating gain. The next frontier is to develop UVAPD arrays with high gain to demonstrate highresolution imaging. We will discuss a model that can predict sensor performance in the UV band using APDs with various gain and other parameters for a desired UV band of interest. Signal-to-noise ratios (SNRs) can be modeled from illuminated targets at various distances with high resolution under standard atmospheric conditions in the UV band and the solar-blind region using detector arrays with unity gain and with high-gain APDs. We will present recent data on the GaN-based APDs for their gain, detector response, dark current noise, and 1/f noise. We will discuss various approaches and device designs that are being evaluated for developing APDs in wide-bandgap semiconductors. The paper will also discuss the state of the art in UVAPDs and the future directions for small unit cell size and gain in the APDs.
Data are presented for AlGaN-AlN multiple-quantum-well optically pumped lasers operating at 300K. The structures were grown by MOCVD on bulk AlN substrates and were fabricated into cleaved bars with a cavity length ~1mm. The epitaxial structures consist of ten 3 nm AlGaN quantum wells with 5 nm AlGaN barriers and an AlN buffer layer deposited on a (0001) AlN substrate at a growth temperature 1155 ºC. The bars were photopumped under pulsed conditions at 300K with a 193nm excimer laser. The threshold optical pump power is 455 kW/cm2 and laser emission is observed at 247 nm.
High resolution imaging in the UV band has a lot of applications in defense and commercial systems. The
shortest wavelength is desired for spatial resolution which allows for small pixels and large formats.
UVAPD's have been demonstrated as discrete devices demonstrating gain. The next frontier is to develop UV
APD arrays with high gain to demonstrate high resolution imaging.
We will discuss model that can predict sensor performance in the UV band using APD's with various gain
and other parameters for a desired UV band of interest. SNR's can be modeled from illuminated targets at
various distances with high resolution under standard atmospheres in the UV band and the solar-blind region
using detector arrays with unity gain and with high-gain APD's.
We will present recent data on the GaN based APD's for their gain, detector response, dark current noise and
the 1/f noise. We will discuss various approaches and device designs that are being evaluated for developing
APD's in wide band gap semiconductors. The paper will also discuss state-of-the-art in UV APDs and the
future directions for small unit cell size and gain in the APD's.
High resolution imaging in the UV band has a lot of applications in Defense and Commercial
Applications. The shortest wavelength is desired for spatial resolution which allows for small pixels and
large formats. UVAPD's have been demonstrated as discrete devices demonstrating gain. The next frontier is
to develop UV APD arrays with high gain to demonstrate high resolution imaging. We also disuses our recent
efforts on development of APD's using MOCVD of GaN/ AlGaN.
We present an analytical model that can predict sensor performance in the UV band using p-i-n or
APD detectors with and without gain and other detector and sensor parameters for a desired UV band of
interest. SNR's can be modeled from illuminated targets at various distances with high resolution under
standard MODTRAN atmospheres in the UV band using detector arrays with unity gain and with high gain
APD along with continuous or pulsed UV lasers.
High resolution imaging in the UV band has a lot of applications in Defense and Commercial
Applications. The shortest wavelength is desired for spatial resolution which allows for small pixels and
large formats. UVAPD's have been demonstrated as discrete devices demonstrating gain. The next frontier is
to develop UV APD arrays with high gain to demonstrate high resolution imaging. We also disuses our recent
efforts on development of APD's using MOCVD of GaN/ AlGaN.
We present an analytical model that can predict sensor performance in the UV band using p-i-n or
APD detectors with and without gain and other detector and sensor parameters for a desired UV band of
interest. SNR's can be modeled from illuminated targets at various distances with high resolution under
standard MODTRAN atmospheres in the UV band using detector arrays with unity gain and with high gain
APD along with continuous or pulsed UV lasers.
Blue laser diode (LD) structures with GaN waveguide layers and with In0.03Ga0.97N waveguide layers were grown. A
comparison study showed In0.03Ga0.97N waveguide layers significantly enhance the LD performance. The mechanism
behind this was investigated using reciprocal space mapping of X-ray diffraction and time-resolved
cathodoluminescence measurements. Room-temperature lasing of laser diodes at 454.6 nm was realized for LD structure
with In0.03Ga0.97N waveguide layers.
High-efficiency "true" green light-emitting diodes (LEDs) (λ~550nm) are one of the key elements in realizing high-brightness
RGB-based white-lighting systems. Because the InGaN multiple quantum wells (MQWs) in the active
regions of green LEDs contain a high indium alloy composition and a corresponding large lattice mismatch, the QW has
a reduced material quality and contains large piezoelectric fields induced by the large strain. The piezoelectric field
reduces the overlap of the electron-hole wave functions, and so results in reduced internal quantum efficiency in green
LEDs. In addition, other effects can strongly impact InGaN materials with high indium content, e.g., detrimental
annealing of the MQW active region during the subsequent growth of the p-type hole injection and contact layers. In
this study, the optical and structural characteristics of green LEDs employing p-InGaN and p-InGaN/p-GaN superlattices
(SLs) were examined. For the LEDs with a p-In0.04Ga0.96N:Mg layer grown at 840°C, only a slight decrease in PL
intensity was observed compared to similar structures grown without a p-layer. However, pits are observed for p-
In0.04Ga0.96N:Mg layers, which may cause increased reverse current leakage. In order to decrease the reverse leakage
current, p-InxGa1-xN/p-GaN SLs were developed. The hole concentration of the p-InxGa1-xN/p-GaN SLs is close to that
of p-In0.04Ga0.96N, and is much higher than that of p-GaN grown at an acceptably low temperature. In addition, pits
disappear in optimized p-InxGa1-xN/p-GaN SLs. In order to study the structural and optical characteristics of green LEDs
with p-In0.04Ga0.96N and p-InxGa1-xN/p-GaN SL layers, I-V characterization and electroluminescence measurements were
performed and the results will be described in detail.
Wide-bandgap GaN-based avalanche photodetectors (APDs) are important for photodetectors operating in UV spectral
region. For the growth of GaN-based heteroepitaxial layers on lattice-mismatched substrates such as sapphire and SiC, a
high density of defects is introduced, thereby causing device failure by premature microplasma breakdown before the
electric field reaches the level of the bulk avalanche breakdown field, which has hampered the development of III-nitride
based APDs. In this study, we investigate the growth and characterization of GaN and AlGaN-based APDs on bulk GaN
and AlN substrates. Epitaxial layers of GaN and AlxGa1-xN p-i-n ultraviolet avalanche photodiodes were grown by
metalorganic chemical vapor deposition (MOCVD). Improved crystalline and structural quality of epitaxial layers was
achieved by employing optimum growth parameters on low-dislocation-density bulk substrates in order to minimize the
defect density in epitaxially grown materials. GaN and AlGaN APDs were fabricated into 30μm- and 50μm-diameter
circular mesas and the electrical and optoelectronic characteristics were measured. APD epitaxial structure and device
design, material growth optimization, material characterizations, device fabrication, and device performance
characteristics are reported.
This paper surveys recent work in several photodetector areas including high-speed, low-noise avalanche photodiodes, high-power photodiodes, solar-blind ultra-violet PIN photodiodes, and quantum dot infrared photodetectors (QDIPs).
This paper surveys recent work in several photodetector areas including high-speed, low-noise avalanche photodiodes, solar-blind ultra-violet PIN photodiodes, and quantum dot infrared photodetectors (QDIPs).
In the past few years, the wide-bandgap III-N compound semiconductor materials have been the subject of intense research owing to their commercial importance for the production of high-brightness light-emitting diodes. Another potentially important application for the Column III nitrides is for detection of ultra-violet radiation for various sensing, monitoring, and control applications. There has been a growing interest in back-illuminated solar-blind AlxGa1-xN photodiodes for flip-chip mounting to silicon read-out circuits. These devices not only need to have high external quantum efficiencies, but these efficiencies must be achieved at, or less than, the operating voltage of the readout display. This paper describes AlxGa1-xN heteroepitaxial back-illuminated p-i-n photodiodes that have been developed for these applications.
We present an optically-detected time-of-flight technique with femtosecond resolution that monitors the change in the electroabsorption due to charge transport in a p-i-n diode, and show how it may be used to determine the electron transit time, velocity overshoot, and velocity-field characteristic in GaN at room temperature. In a GaN homojunction p-i-n diode, the transit time drops with increasing electric field E in the intermediate field regime (50 - 100 kV/cm), and the electron velocity possesses a weak, quasi-linear dependence on E attributed to polar optical phonon scattering. In the high field regime the transit time and the electron velocity gradually become independent of E. The peak electron velocity of 1.9 X 107 cm/s, corresponding to a transit time of approximately 2.5 ps across the 0.53 micrometers depletion region, is attained at approximately 225 kV/cm. The experimental results are in qualitative agreement with theoretical steady-state velocity-field characteristics found in the literature. A measurement of the high field (approximately 300 kV/cm) transient electron velocity overshoot was also performed using a semi-transparent p-contact AlGaN/GaN heterojunction p-i-n diode. The peak electron velocity of 6.25 X 107 cm/s attained within the first 200 fs decays within 1 ps to a steady-state velocity of 3.2 X 107 cm/s in this improved device.
The detection of light in the ultraviolet (UV) portion of the electromagnetic spectrum is critical to a number of commercial and military applications. Until very recently, the primary means of light detection in the UV was with either silicon photodiodes or photomultiplier tubes, both of which have serious drawbacks. With the advent of optoelectronic devices fabricated in the ternary alloy of AlGaN, the possibility exists to produce high- performance solid-state photodetector arrays that are sensitive to the visible-blind and solar-blind regions of the spectrum. In this paper, we discuss recent advances in the area of ultraviolet photodetectors fabricated on GaN and AlGaN.
The detection of light in the UV portion of the electromagnetic spectrum is critical to a number of applications. Until very recently, the primary means of light detection in the UV was with either silicon photodiodes or photomultiplier tubes, both of which have serious drawbacks. With the advent of optoelectronic devices fabricated in the ternary alloy of AlGaN, the possibility exists to produce high-performance solid-state photodetector arrays sensitive to the visible-blind and solar-blind regions of the spectrum. In this paper, we discuss recent advances in the area of UV photodetectors fabricated on GaN and AlGaN. Various device structures are presented, and their peculiar characteristics discussed in terms of responsivity, dark current, gain, temporal response, and frequency response. Models describing the current transport mechanisms and the quantum efficiencies of these photodiodes are discussed. Special emphasis is given to novel device structures that improve on the temporal, spectral, and electrical characteristics of AlGaN-based photodiodes. Specifically, results for a transparent recessed-window p-i- n device, and a semi-transparent electrode device structure are described. Finally, the results of a separate absorption, charge, and multiplication avalanche photodetector are presented. This device structure resulted in a stable gain of > 10 at a reverse bias of approximately 40 V.
We report on the improved quantum efficiency of both GaN homojunction and AlxGa1-xN/GaN heterojunction photodiodes using a recessed window device structure. A very high quantum efficiency of 77 percent at 357 nm and also a much improved quantum efficiency at the solar blind wavelengths were achieved. A spatial non-uniformity problem on the large area devices was observed with 2D raster scan photocurrent measurements. The spatial non-uniformity is attributed to an electric field crowding effect that is primarily caused by the high resistivity of the p-GaN layer with the aid of Medici simulations.
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