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Dr. Robert M. Bigwood
Intel Fellow - Patterning Tech and Rule Definition at Intel Corp
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Author
Publications (4)
Proceedings Article | 10 April 2024 Presentation
Advancing EUV patterning through pattern shaping at Intel 18A process technology node
Robert Browning, Shurong Liang, Peter Sun, Laxmy Menon, Nadjoua Moumen, Can Guven, Nathan Strutt, Mehmet Aykol, Robert Bigwood, Sarah Williams, Kevin Anglin, Amol Gupta, Steven Sherman, Kevin Fischer, Charles Wallace, Gang Shu, Bhavin Shah, Brad Taylor
Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3010982
KEYWORDS: Extreme ultraviolet, Advanced patterning, Optical lithography, Printing, Stochastic processes, Semiconducting wafers, Lithography, Design rules
Proceedings Article | 28 April 2023 Presentation + Paper
Direct print EUV patterning of tight pitch metal layers for Intel 18A process technology node
R. Venkatesan, C. Guven, D. Bhawe, A. Greenwood, Z. Zhang, P. Gupta, P. Saksena, R. Rodriguez, N. Moumen, B. Bains, P. Sun, M. Aykol, C. Wallace, R. Bigwood, K. Fischer
Proceedings Volume 12495, 124950D (2023) https://doi.org/10.1117/12.2657778
KEYWORDS: Optical proximity correction, Printing, Extreme ultraviolet, Etching, Design rules, Optical lithography, Lithography, Design and modelling, Photoresist materials, Metals
Proceedings Article | 1 December 2022 Presentation + Paper
Direct print EUV patterning of tight pitch metal layers for Intel 18A process technology node
R. Venkatesan, C. Guven, D. Bhawe, A. Greenwood, Z. Zhang, P. Gupta, P. Saksena, R. Rodriguez, N. Moumen, B. Bains, M. Aykol, C. Wallace, R. Bigwood, K. Fischer
Proceedings Volume 12292, 1229202 (2022) https://doi.org/10.1117/12.2641744
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Optical lithography, Lithography, Photoresist materials, Etching, Metals, Metrology, Extreme ultraviolet lithography
Proceedings Article | 1 August 2002 Paper
Lithography strategy for 65-nm node
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476916
KEYWORDS: Optical lithography, Photomasks, Optical proximity correction, Manufacturing, Inspection, Lithography, 193nm lithography, Phase shifts, Mask making, Semiconducting wafers
Conference Committee Involvement (1)
Photomask Technology
18 September 2007 | Monterey, California, United States
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