Osamu Inoue
at Hitachi High-Tech Corp
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11611, 116110A (2021) https://doi.org/10.1117/12.2585880
KEYWORDS: Overlay metrology, Scanning electron microscopy, Metrology, Manufacturing, Inspection, Algorithm development, Spatial resolution, Semiconductors, Semiconducting wafers, Optics manufacturing

SPIE Journal Paper | 13 June 2019 Open Access
JM3, Vol. 18, Issue 02, 021206, (June 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.021206
KEYWORDS: Overlay metrology, Scanning electron microscopy, Metrology, Semiconducting wafers, Etching, Selenium, Signal detection, Edge detection, Manufacturing, Scanners

Proceedings Article | 28 March 2017 Paper
Proceedings Volume 10145, 101451J (2017) https://doi.org/10.1117/12.2257848
KEYWORDS: Silica, Overlay metrology, Scanning electron microscopy, Semiconductors, Semiconductor manufacturing, Manufacturing, Photomasks, Semiconducting wafers, Lithography, Scanners, Optical lithography, Sensors

Proceedings Article | 28 March 2017 Paper
Takeyoshi Ohashi, Atsuko Yamaguchi, Kazuhisa Hasumi, Osamu Inoue, Masami Ikota, Gian Lorusso, Gabriele Luca Donadio, Farrukh Yasin, Siddharth Rao, Gouri Sankar Kar
Proceedings Volume 10145, 101450H (2017) https://doi.org/10.1117/12.2257908
KEYWORDS: Resistance, Etching, Semiconducting wafers, Calibration, Statistical analysis, Process control, Metrology, Magnetism, Reliability, Critical dimension metrology, Electron microscopes, Edge detection, Lawrencium

Proceedings Article | 28 March 2017 Presentation + Paper
Gian Francesco Lorusso, Takeyoshi Ohashi, Astuko Yamaguchi, Osamu Inoue, Takumichi Sutani, Naoto Horiguchi, Jürgen Bömmels, Christopher Wilson, Basoene Briggs, Chi Lim Tan, Tom Raymaekers, Romain Delhougne, Geert Van den Bosch, Luca Di Piazza, Gouri Sankar Kar, Arnaud Furnémont, Andrea Fantini, Gabriele Luca Donadio, Laurent Souriau, Davide Crotti, Farrukh Yasin, Raf Appeltans, Siddharth Rao, Danilo De Simone, Paulina Rincon Delgadillo, Philippe Leray, Anne-Laure Charley, Daisy Zhou, Anabela Veloso, Nadine Collaert, Kazuhisa Hasumi, Shunsuke Koshihara, Masami Ikota, Yutaka Okagawa, Toru Ishimoto
Proceedings Volume 10145, 1014512 (2017) https://doi.org/10.1117/12.2257468
KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, 3D metrology, Back end of line, Logic, Standards development, Germanium, Algorithm development, Process control, Resistance, Overlay metrology, Oxides, Etching, Statistical analysis

Proceedings Article | 27 April 2016 Paper
Proceedings Volume 9778, 97781D (2016) https://doi.org/10.1117/12.2221910
KEYWORDS: Tin, Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Etching, Metals, Wafer-level optics, Optics manufacturing, Scanners, Double patterning technology

Proceedings Article | 8 April 2016 Paper
Proceedings Volume 9778, 977824 (2016) https://doi.org/10.1117/12.2222777
KEYWORDS: Overlay metrology, Etching, Scanning electron microscopy, Semiconducting wafers, Tin, Wafer-level optics, Image segmentation, Optical lithography, Scanners, Back end of line

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9778, 97780V (2016) https://doi.org/10.1117/12.2218863
KEYWORDS: Line width roughness, Optical lithography, Line edge roughness, Transmission electron microscopy, Atomic force microscopy, Critical dimension metrology, Metrology, 3D metrology, Scanning electron microscopy, Process control, Etching, Signal to noise ratio, Image processing

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9424, 942408 (2015) https://doi.org/10.1117/12.2087116
KEYWORDS: Overlay metrology, Optical lithography, Etching, Scanning electron microscopy, Semiconducting wafers, Back end of line, Tin, Logic, Scanners, Diffraction

SPIE Journal Paper | 6 October 2014 Open Access
DongSub Choi, Tal Itzkovich, Inna Tarshish-Shapir, Eros Huang, Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, David Tien, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su
JM3, Vol. 13, Issue 04, 041404, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041404
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

Proceedings Article | 2 April 2014 Paper
Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Osamu Inoue, Hiroki Kawada, Vimal Kamineni, Abhijeet Paul, A. Bello
Proceedings Volume 9050, 90501K (2014) https://doi.org/10.1117/12.2046144
KEYWORDS: Scanning transmission electron microscopy, Transmission electron microscopy, Photoresist materials, Metrology, Carbon, Coating, Edge detection, Silicon, Edge roughness

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86812Z (2013) https://doi.org/10.1117/12.2013422
KEYWORDS: Line edge roughness, Metrology, Scanning transmission electron microscopy, Cadmium, Critical dimension metrology, Atomic force microscopy, 3D image processing, 3D metrology, Scanning electron microscopy, Electron microscopes

Proceedings Article | 18 April 2013 Paper
Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, Dongsub Choi, Tal Itzkovich, Inna Tarshish-Shapir, David Tien, Eros Huang, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su
Proceedings Volume 8681, 86812R (2013) https://doi.org/10.1117/12.2011363
KEYWORDS: Overlay metrology, Metrology, Calibration, Optical testing, Etching, Measurement devices, Scanning electron microscopy, Inspection, Lithography, Scanners

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86812Q (2013) https://doi.org/10.1117/12.2011046
KEYWORDS: Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Scanners, Inspection, Optical testing, Wafer-level optics, Optical alignment, Control systems, Silicon

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86812S (2013) https://doi.org/10.1117/12.2011035
KEYWORDS: Overlay metrology, Semiconducting wafers, Scanning electron microscopy, Silicon, Dysprosium, Lithography, Double patterning technology, Wafer testing, Control systems, Scanners

Proceedings Article | 10 April 2013 Paper
Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada
Proceedings Volume 8681, 868132 (2013) https://doi.org/10.1117/12.2011103
KEYWORDS: Scanning transmission electron microscopy, Metals, Coating, Photoresist materials, Metrology, Scanning electron microscopy, Carbon, Image transmission, Electron microscopes, Calibration

Proceedings Article | 3 April 2012 Paper
Proceedings Volume 8324, 832410 (2012) https://doi.org/10.1117/12.915770
KEYWORDS: Distortion, Metrology, Calibration, Scanning electron microscopy, Volume rendering, Image processing, Optical proximity correction, Semiconductors, Electron microscopes, Time metrology

Proceedings Article | 3 April 2012 Paper
Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada
Proceedings Volume 8324, 83240X (2012) https://doi.org/10.1117/12.916680
KEYWORDS: Scanning transmission electron microscopy, Silicon, Metals, Edge detection, Coating, Interfaces, Scanning electron microscopy, Silica, Calibration, Metrology

Proceedings Article | 28 April 2011 Paper
Proceedings Volume 7971, 79711Z (2011) https://doi.org/10.1117/12.879032
KEYWORDS: Distortion, Calibration, Scanning electron microscopy, Metrology, Time metrology, Semiconductors, Optical proximity correction, Volume rendering, Electron microscopes, Statistical analysis

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 797129 (2011) https://doi.org/10.1117/12.879347
KEYWORDS: Calibration, Diffraction gratings, Silicon, Surface finishing, Polishing, Multilayers, Lithography, Silica, Inspection, Diffraction

Proceedings Article | 20 April 2011 Paper
Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada
Proceedings Volume 7971, 797108 (2011) https://doi.org/10.1117/12.879036
KEYWORDS: Scanning transmission electron microscopy, Silicon, Metals, Coating, Edge detection, Interfaces, Silica, Calibration, Scanning electron microscopy, Oxides

Proceedings Article | 29 March 2011 Paper
A. Yamaguchi, H. Koyanagi, J. Tanaka, O. Inoue, H. Kawada
Proceedings Volume 7971, 79710A (2011) https://doi.org/10.1117/12.881194
KEYWORDS: Line edge roughness, Edge detection, 3D metrology, Atomic force microscopy, Line width roughness, Scanning electron microscopy, Silicon, Semiconducting wafers, Lithography, Interference (communication)

Showing 5 of 22 publications
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