Nobutaka Kikuiri
Fellow at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 29 September 2021 Presentation
Tadayuki Sugimori, Riki Ogawa, Hidekazu Takekoshi, John Hartley, David Pinkney, Atsushi Ando, Koichi Ishii, Chosaku Noda, Nobutaka Kikuiri
Proceedings Volume 11855, 118550C (2021) https://doi.org/10.1117/12.2600987
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Optical inspection, Optics manufacturing, EUV optics, Wafer-level optics, Image processing, Extreme ultraviolet lithography, Deep ultraviolet

Proceedings Article | 23 August 2021 Paper
Tadayuki Sugimori, Riki Ogawa, Hidekazu Takekoshi, John Hartley, David Pinckney, Atsushi Ando, Koichi Ishii, Chosaku Noda, Nobutaka Kikuiri
Proceedings Volume 11908, 119080J (2021) https://doi.org/10.1117/12.2598235

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Hidekazu Takekoshi, Riki Ogawa, John Hartley, David Pinckeny, Atsushi Ando, Koichi Ishii, Chosaku Noda, Tadayuki Sugimori, Nobutaka Kikuiri
Proceedings Volume 11611, 116112N (2021) https://doi.org/10.1117/12.2583613
KEYWORDS: Photomasks, Extreme ultraviolet, Optics manufacturing, Inspection, EUV optics, Defect inspection, Extreme ultraviolet lithography, Semiconductor manufacturing, Optical systems, Optical inspection

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96350R (2015) https://doi.org/10.1117/12.2197890
KEYWORDS: Inspection, Deep ultraviolet, Optical inspection, Photomasks, Nanoimprint lithography, Optical resolution, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection

Proceedings Article | 28 June 2013 Paper
Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara
Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363
KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Optical lithography, Extreme ultraviolet, Image sensors, Sensors, Image transmission, Double patterning technology, Lithography

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 782339 (2010) https://doi.org/10.1117/12.866673
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Defect detection, Extreme ultraviolet lithography, Image contrast enhancement, Image enhancement, Lithographic illumination, Image sensors, Light sources

Proceedings Article | 16 April 2010 Paper
Proceedings Volume 7638, 763833 (2010) https://doi.org/10.1117/12.846412
KEYWORDS: Inspection, Photomasks, Defect detection, Databases, Data conversion, Computer simulations, Semiconductors, Source mask optimization, Defect inspection, Optical proximity correction

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76382Z (2010) https://doi.org/10.1117/12.848679
KEYWORDS: Photomasks, Inspection, Defect detection, Image contrast enhancement, Signal detection, Extreme ultraviolet lithography, Extreme ultraviolet, Image enhancement, Lithography, Image sensors

Proceedings Article | 17 February 2010 Paper
Shinichi Imai, Kazuto Matsuki, Nobutaka Kikuiri, Katsuhiko Takayama, Osamu Iwase, Yoshiharu Urata, Tatsuya Shinozaki, Yoshio Wada, Satoshi Wada
Proceedings Volume 7580, 75800H (2010) https://doi.org/10.1117/12.840467
KEYWORDS: Light sources, Inspection, Fiber lasers, Fiber amplifiers, Photomasks, Optical amplifiers, Semiconductors, Pulsed laser operation, Oscillators

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74882O (2009) https://doi.org/10.1117/12.829747
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Image contrast enhancement, Laser sources, Optical inspection, Defect detection, Super resolution, Optical alignment

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74882I (2009) https://doi.org/10.1117/12.829748
KEYWORDS: Photomasks, Inspection, Opacity, Defect inspection, Defect detection, Extreme ultraviolet lithography, Semiconducting wafers, Reflectivity, Signal analysis, Scanning electron microscopy

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 74880B (2009) https://doi.org/10.1117/12.829739
KEYWORDS: Inspection, Photomasks, Lithography, Defect detection, Image transmission, Semiconducting wafers, SRAF, Optical inspection, Telecommunications, Sensors

Proceedings Article | 23 September 2009 Paper
George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji
Proceedings Volume 7488, 74880A (2009) https://doi.org/10.1117/12.831475
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792K (2009) https://doi.org/10.1117/12.824334
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect inspection, Reflectivity, Optical inspection, Defect detection, Signal detection, Opacity, Finite-difference time-domain method

Proceedings Article | 11 May 2009 Paper
George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji
Proceedings Volume 7379, 73791B (2009) https://doi.org/10.1117/12.824288
KEYWORDS: Photomasks, Inspection, Lithography, Semiconducting wafers, Scanners, Sensors, Defect detection, Optical inspection, Wafer-level optics, Image resolution

Proceedings Article | 24 March 2009 Paper
Proceedings Volume 7272, 72722A (2009) https://doi.org/10.1117/12.814466
KEYWORDS: Photomasks, Inspection, Super resolution, Lithography, Image transmission, Polarization, Optical inspection, 193nm lithography, Defect detection, Image contrast enhancement

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71222F (2008) https://doi.org/10.1117/12.801550
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Reflectivity, Defect inspection, Opacity, Scanning electron microscopy, Defect detection, Optical inspection, Finite-difference time-domain method

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 66073F (2007) https://doi.org/10.1117/12.729034
KEYWORDS: Inspection, Opacity, Photomasks, Extreme ultraviolet lithography, Optical inspection, Defect inspection, Reflectivity, Scanning electron microscopy, Deep ultraviolet, Defect detection

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181U (2007) https://doi.org/10.1117/12.712774
KEYWORDS: Inspection, Photomasks, Image transmission, Image acquisition, Defect detection, Sensors, Lithography, Defect inspection, Optical inspection, 193nm lithography

Proceedings Article | 20 October 2006 Paper
Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda
Proceedings Volume 6349, 63493M (2006) https://doi.org/10.1117/12.692811
KEYWORDS: Inspection, Image transmission, Computer aided design, Photomasks, Optical inspection, Image processing, Laser optics, Image enhancement, Image sensors, Point spread functions

Proceedings Article | 19 May 2006 Paper
Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, Yukio Tamura, Kenichi Matsumura, Kinya Usuda, Masao Otaki, Osamu Suga, Katsumi Ohira
Proceedings Volume 6283, 62830Y (2006) https://doi.org/10.1117/12.683579
KEYWORDS: Inspection, Photomasks, Image transmission, Laser optics, Optical inspection, Lithography, Defect detection, Sensors, Objectives, Image sensors

Proceedings Article | 28 June 1999 Paper
Y. Motegi, M. Nagasato, Yoriyuki Ishibashi, Hiroshi Someya, Nobutaka Kikuiri
Proceedings Volume 3864, 386407 (1999) https://doi.org/10.1117/12.997618
KEYWORDS: Servomechanisms, Actuators, Control systems, Objectives, Telecommunications, Sensors, Semiconductor lasers, Magnetism, Optical storage, Optical circuits

Showing 5 of 22 publications
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