Mr. Shingo Murakami Profile

Shingo Murakami

Manager at NEC Corp

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Publications (8)

Proceedings Article | 15 May 2007 Paper

Evaluation of defect inspection sensitivity using 199-nm inspection optics

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Hideaki Hashimoto, Shingo Murakami, Nobutaka Kikuiri

Proceedings Volume 6607, 66073F (2007) https://doi.org/10.1117/12.729034

KEYWORDS: Inspection, Opacity, Photomasks, Extreme ultraviolet lithography, Optical inspection, Defect inspection, Reflectivity, Scanning electron microscopy, Deep ultraviolet, Defect detection

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Proceedings Article | 5 April 2007 Paper

Development of advanced mask inspection optics with transmitted and reflected light image acquisition

Ryoichi Hirano, Riki Ogawa, Hitoshi Suzuki, Kenichi Takahara, Yoshitake Tsuji, Shingo Murakami, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 6518, 65181U (2007) https://doi.org/10.1117/12.712774

KEYWORDS: Inspection, Photomasks, Image transmission, Image acquisition, Defect detection, Sensors, Lithography, Defect inspection, Optical inspection, 193nm lithography

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Proceedings Article | 20 October 2006 Paper

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics

Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda

Proceedings Volume 6349, 63493M (2006) https://doi.org/10.1117/12.692811

KEYWORDS: Inspection, Image transmission, Computer aided design, Photomasks, Optical inspection, Image processing, Laser optics, Image enhancement, Image sensors, Point spread functions

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Proceedings Article | 19 May 2006 Paper

Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond

Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, Yukio Tamura, Kenichi Matsumura, Kinya Usuda, Masao Otaki, Osamu Suga, Katsumi Ohira

Proceedings Volume 6283, 62830Y (2006) https://doi.org/10.1117/12.683579

KEYWORDS: Inspection, Photomasks, Image transmission, Laser optics, Optical inspection, Lithography, Defect detection, Sensors, Objectives, Image sensors

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Proceedings Article | 17 December 2003 Paper

DUV inspection capability for 90-nm node mask in ArF lithography

Katsumi Ohira, Byung Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka, Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518293

KEYWORDS: Inspection, Photomasks, Lithography, Optical proximity correction, Deep ultraviolet, Semiconducting wafers, Binary data, Phase shifts, Chromium, Point spread functions

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Proceedings Article | 28 August 2003 Paper

Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography

Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki, Byung-Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504206

KEYWORDS: Inspection, Photomasks, Optical proximity correction, Lithography, Binary data, Deep ultraviolet, Reticles, Databases, Detection and tracking algorithms, Algorithm development

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Proceedings Article | 1 August 2002 Paper

Required performances of reticle inspection system for ArF lithography through analysis of defect printability study

Byung Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka, Naohisa Takayama, Keiichi Hatta, Shingo Murakami, Masao Otaki

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476960

KEYWORDS: Inspection, Reticles, Lithography, Semiconductors, Photomasks, 193nm lithography, Halftones

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Proceedings Article | 5 September 2001 Paper

LM5000 as a strong mask analyzing tool

Hisashi Shiba, Masayoshi Kimura, Y. Saito, Naohisa Takayama, K. Matsumura, Shingo Murakami, Keiichi Hatta

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438372

KEYWORDS: Inspection, Image processing, Algorithm development, Reticles, Photomasks, Human-machine interfaces, Defect detection, Standards development, Computer aided design, Data conversion

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Showing 5 of 8 publications

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