Mr. Kyoji Yamashita Profile

Kyoji Yamashita

Senior Scientist at Advanced Mask Inspection Technology Inc

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Author

Publications (8)

Proceedings Article | 11 May 2009 Paper

Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects

Kyoji Yamashita, Nobuyuki Harabe, Masatoshi Hirono, Yukio Tamura, Ikunao Isomura, Yoshitake Tsuji, Eiji Matsumoto

Proceedings Volume 7379, 737929 (2009) https://doi.org/10.1117/12.824323

KEYWORDS: SRAF, Inspection, Photomasks, Opacity, Defect detection, Lithography, Edge roughness, Defect inspection, Electron beam lithography, Optical proximity correction

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Proceedings Article | 20 October 2006 Paper

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics

Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda

Proceedings Volume 6349, 63493M (2006) https://doi.org/10.1117/12.692811

KEYWORDS: Inspection, Image transmission, Computer aided design, Photomasks, Optical inspection, Image processing, Laser optics, Image enhancement, Image sensors, Point spread functions

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Proceedings Article | 1 August 2002 Paper

High-performance DUV inspection system for 100-nm generation masks

Hideo Tsuchiya, Ikunao Isomura, Kazuhiro Nakashima, Kyoji Yamashita, Toshiyuki Watanabe, Takeshi Nishizaka, Hiroyuki Ikeda, Eiji Sawa, Masami Ikeda

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476961

KEYWORDS: Inspection, Photomasks, Sensors, Defect detection, Image sensors, Deep ultraviolet, Computer aided design, Data processing, Detection and tracking algorithms, Image processing

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Proceedings Article | 11 March 2002 Paper

Half-tone PSM inspection sensitivity of 257-nm light source MC-3000

Hideo Tsuchiya, Kyoji Yamashita, Shinji Sugihara, Takeshi Fujiwara, Ryoji Yoshikawa

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458360

KEYWORDS: Inspection, Phase shifts, Sensors, Photomasks, Chromium, Defect detection, Light sources, Manufacturing, Image sensors, Deep ultraviolet

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Proceedings Article | 18 December 1998 Paper

Detecting CD error or transmission error of photomask patterns

Kyoji Yamashita

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332819

KEYWORDS: Image sensors, Critical dimension metrology, Photomasks, Inspection, Sensors, Image transmission, Defect inspection, Algorithm development, Distortion, Optical proximity correction

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Proceedings Article | 1 September 1998 Paper

Gray map reference pattern generator of a die-to-database mask inspection system for 256-Mb and 1-Gb DRAMs

Hideo Tsuchiya, Ikunao Isomura, Tomohide Watanabe, Kyoji Yamashita

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328834

KEYWORDS: Inspection, Photomasks, Sensors, Defect detection, Binary data, Image sensors, Computer aided design, Optical design, CCD image sensors, Data processing

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Proceedings Article | 28 July 1997 Paper

New die-to-database mask inspection system with i-line optics for 256-Mbit and 1-Gbit DRAMs

Mitsuo Tabata, Kyoji Yamashita, Hideo Tsuchiya, Takehiko Nomura, Hiromu Inoue, Tomohide Watanabe, Toru Tojo, Hisakazu Yoshino

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277266

KEYWORDS: Inspection, Photomasks, Image sensors, Image processing, Sensors, Defect inspection, Data processing, Defect detection, Binary data, Image resolution

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Proceedings Article | 24 July 1996 Paper

Automatic photomask defect classification method

Kyoji Yamashita, Kazuto Matsuki, Kiminobu Akeno

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245246

KEYWORDS: Contamination, Image transmission, Photomasks, Inspection, Quartz, Opacity, Particles, Defect detection, Image classification, Inspection equipment

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Showing 5 of 8 publications

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