Dr. Michael J. May
at CEA-LETI
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12956, 1295606 (2024) https://doi.org/10.1117/12.3010477
KEYWORDS: Wafer bonding, Semiconducting wafers, Distortion, Scanners, Silicon, Optical alignment, Deformation, Adhesion, Etching, Metrology

SPIE Journal Paper | 12 June 2023
Fabien Laulagnet, Jacques-Alexandre Dallery, Laurent Pain, Michael May, Béatrice Hémard, Franck Garlet, Isabelle Servin, Chiara Sabbione
JM3, Vol. 22, Issue 04, 041404, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041404
KEYWORDS: Electron beam direct write lithography, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Optical alignment, Photoresist processing, Design and modelling, Overlay metrology, Silicon

Proceedings Article | 1 May 2023 Presentation + Paper
Fabien Laulagnet, Jacques-Alexandre Dallery, Laurent Pain, Michael May, Beatrice Hémard, Franck Garlet, Isabelle Servin, Chiara Sabbione
Proceedings Volume 12497, 1249706 (2023) https://doi.org/10.1117/12.2658273
KEYWORDS: Electron beam direct write lithography, Lithography, Semiconducting wafers, Electron beam lithography, Optical alignment, Overlay metrology, Optical lithography, Design and modelling, Photoresist processing, Deep ultraviolet

Proceedings Article | 27 April 2023 Poster + Paper
Proceedings Volume 12496, 124962C (2023) https://doi.org/10.1117/12.2657422
KEYWORDS: Wafer bonding, Semiconducting wafers, Scanners, Silicon, Distortion, Optical alignment, Transistors, Oxides, Crystals, Etching

Proceedings Article | 13 June 2022 Poster
Nathalie Frolet, Emma Porcheron, Karine Jullian, Michael May, Yuji Tanaka, Masahiko Harumoto, Raluca Tiron
Proceedings Volume PC12055, PC120550M (2022) https://doi.org/10.1117/12.2614242
KEYWORDS: Immersion lithography, Semiconducting wafers, Scanners, Plasma etching, Contamination, Scanning electron microscopy, Polymers, Polishing, Plasma, Inspection

Showing 5 of 13 publications
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