Mr. Masayuki Shiraishi Profile

Masayuki Shiraishi

Assistant Department Manager at Nikon Corp

SPIE Involvement:

Author

Profile Summary

Masayuki Shiraishi received a master's degree in materials science from the University of Tokyo in 1998, for the study of photochemical hole-burning of porphyrin-derivative metallocomplexes doped in fluorophosphate glasses.
He joined Nikon Corporation in 1998 and worked on the research and development of x-ray and EUV multilayer coatings, until 2004.
Since 2004, he worked on the system development of projection optics and the study of flare derivation for EUV lithography, until 2011.
Since 2009, he also worked on the study of contamination control and modeling for EUV lithography, until 2011 when the EUV project ended.
Since 2011, he worked on the study and the system development of contamination control, sensing technologies, and thermal stabilization control for ArF and KrF lithography, until 2014.
Since 2014, he has continued the system development of the NGL (new generation lithography) technologies, mainly DSA (directed self-assembly); partially working under the consortium of EIDEC (until 2019).
Since 2016, he also worked on the system development of new lithographic metrology tools, until 2017.
Since 2017, he has continued the system development of optical processing products; and since 2019, he belongs to Next Generation Project Division in Nikon Corporation.

Publications (21)

Proceedings Article | 19 March 2018 Presentation

Presentation

Defect dynamics in directed self-assembly of block copolymers (Conference Presentation)

Tsukasa Azuma, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsuyoshi Kodera, Ken Miyagi, Masayuki Shiraishi, Ryota Matsuki, Terumasa Kosaka, Toshiyuki Himi, Seiji Nagahara, Alvin Chandra, Ryuichi Nakatani, Teruaki Hayakawa, Kenji Yoshimoto, Takuya Omosu, Mikihito Takenaka

Proceedings Volume 10586, 105860S (2018) https://doi.org/10.1117/12.2297310

KEYWORDS: Directed self assembly, Image processing, Signal processing, Electron beam lithography, Lithography, Annealing, Thin films, Epitaxy, Data modeling, 3D modeling

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Proceedings Article | 13 March 2018 Presentation + Paper

Presentation + Paper

A simulation study on bridge defects in lamellae-forming diblock copolymers

Hironobu Sato, Katsuyoshi Kodera, Yuriko Seino, Yusuke Kasahara, Ken Miyagi, Masayuki Shiraishi, Tsukasa Azuma

Proceedings Volume 10586, 105860U (2018) https://doi.org/10.1117/12.2297287

KEYWORDS: Bridges, Polymethylmethacrylate, Picosecond phenomena, Etching, Molecular bridges, Reactive ion etching, Directed self assembly, Photomasks, Image processing, Chemical analysis

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Proceedings Article | 23 March 2012 Paper

Paper

Development of EUV lithography tool technologies at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Yoshio Kawabe, Takuro Ono, Noriaki Kandaka, Atsushi Yamazaki, Takashi Yamaguchi, Ryo Shibata, Masayuki Shiraishi

Proceedings Volume 8322, 832215 (2012) https://doi.org/10.1117/12.917676

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Contamination, Extreme ultraviolet, Multilayers, Reflectivity, Carbon, Silicon, Apodization, Oxidation

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Proceedings Article | 6 April 2011 Paper

Paper

A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source

M. Shiraishi, T. Yamaguchi, A. Yamazaki, N. Kandaka, T. Oshino, K. Murakami

Proceedings Volume 7969, 79690N (2011) https://doi.org/10.1117/12.879392

KEYWORDS: Contamination, Extreme ultraviolet, Oxygen, Photons, Carbon, Mirrors, Reflectivity, Protactinium, Molecules, Chemical species

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Proceedings Article | 23 March 2010 Paper

Paper

Flare modeling and calculation on EUV optics

M. Shiraishi, T. Oshino, K. Murakami, H. Chiba

Proceedings Volume 7636, 763629 (2010) https://doi.org/10.1117/12.846472

KEYWORDS: Point spread functions, Mirrors, Semiconducting wafers, Light scattering, Multilayers, Extreme ultraviolet, Surface roughness, Wafer-level optics, Spatial frequencies, Reflectivity

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Proceedings Article | 23 March 2010 Paper

Paper

Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)

K. Murakami, T. Yamaguchi, A. Yamazaki, N. Kandaka, M. Shiraishi, S. Matsunari, T. Aoki, S. Kawata

Proceedings Volume 7636, 76361U (2010) https://doi.org/10.1117/12.846676

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Mirrors, Carbon, Synchrotrons, Alternate lighting of surfaces, Protactinium, Light sources

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SPIE Journal Paper | 1 October 2009

Development progress of optics for extreme ultraviolet lithography at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa

JM3, Vol. 8, Issue 04, 041507, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238522

KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination

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Proceedings Article | 18 March 2009 Paper

Paper

Development progress of optics for EUVL at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa

Proceedings Volume 7271, 72711Z (2009) https://doi.org/10.1117/12.813638

KEYWORDS: Projection systems, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Eye, Resolution enhancement technologies, Reflectivity, Polishing, Aspheric optics

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Proceedings Article | 6 May 2005 Paper

Paper

Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)

H. Oizumi, Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, K. Murakami

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599435

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Projection systems, Mirrors, Lithographic illumination, Light sources, Printing, Extreme ultraviolet, Spherical lenses

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Proceedings Article | 18 October 2004 Paper

Paper

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

Tetsuya Oshino, Shin-ichi Takahashi, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559210

KEYWORDS: Mirrors, Wavefronts, Projection systems, Polishing, Semiconducting wafers, Extreme ultraviolet lithography, Spatial frequencies, Photomasks, Coating, Mirror mounts

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Proceedings Article | 20 May 2004 Paper

Paper

Low-stress and high-reflectivity molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography

Masayuki Shiraishi, Noriaki Kandaka, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536075

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Silicon, Extreme ultraviolet lithography, Surface roughness, Xenon, Microcrystalline materials

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Proceedings Article | 20 May 2004 Paper

Paper

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Tetsuya Oshino, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Isa Nishiyama, Shinji Okazaki

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.562365

KEYWORDS: Mirrors, Wavefronts, Projection systems, Spatial frequencies, Semiconducting wafers, Polishing, Extreme ultraviolet lithography, Photomasks, Mirror mounts, Reflectivity

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Proceedings Article | 13 January 2004 Paper

Paper

Development of Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography

Katsuhiko Murakami, Masayuki Shiraishi

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.508116

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Silicon, Extreme ultraviolet, Xenon, Interfaces, Extreme ultraviolet lithography, Argon

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Proceedings Article | 16 June 2003 Paper

Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Tetsuya Oshino, Masayuki Shiraishi, Noriaki Kandaka, Katsumi Sugisaki, Hiroyuki Kondo, Kazuya Ota, K. Mashima, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

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Proceedings Article | 16 June 2003 Paper

Paper

Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography

Masayuki Shiraishi, Noriaki Kandaka, Katsuhiko Murakami

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484436

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Xenon, Silicon, Argon, Extreme ultraviolet lithography, Ions

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Proceedings Article | 1 July 2002 Paper

Paper

Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography

Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472329

KEYWORDS: Molybdenum, Silicon, Argon, Chemical species, Sputter deposition, Ions, Oxides, Ion beams, Oxygen, Extreme ultraviolet lithography

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Proceedings Article | 20 December 2001 Paper

Paper

Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering

Katsuhiko Murakami, Masayuki Shiraishi

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450945

KEYWORDS: Molybdenum, Multilayers, Silicon, Ion beams, Sputter deposition, Polishing, Ions, Reflectivity, Ruthenium, Interfaces

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Proceedings Article | 20 August 2001 Paper

Paper

Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source

Noriaki Kandaka, Hiroyuki Kondo, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436714

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Carbon dioxide lasers, Reflectometry, Multilayers, Carbon dioxide, Interfaces, Plasma, Beryllium

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Proceedings Article | 20 August 2001 Paper

Paper

In-situ stress measurement of molybdenum/silicon multilayers and low-stress multilayers for extreme-ultraviolet lithography

Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436713

KEYWORDS: Molybdenum, Silicon, Capacitance, Capacitors, Multilayers, Electrodes, Sputter deposition, Extreme ultraviolet lithography, Ion beams, Semiconducting wafers

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Proceedings Article | 2 November 2000 Paper

Paper

Development of an EUV reflectometer using a laser plasma x-ray source

Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4144, (2000) https://doi.org/10.1117/12.405906

KEYWORDS: Reflectometry, Mirrors, Reflectivity, X-rays, X-ray sources, Plasma, Carbon dioxide, Multilayers, Extreme ultraviolet, Carbon dioxide lasers

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Proceedings Article | 21 July 2000 Paper

Paper

Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Masayuki Shiraishi, Wakana Ishiyama, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390102

KEYWORDS: Multilayers, Ion beams, Polishing, Interfaces, Sputter deposition, Reflectivity, Mirrors, Molybdenum, Argon, Extreme ultraviolet lithography

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Showing 5 of 21 publications

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