Mr. Masakatsu Ota Profile

Masakatsu Ota

at Canon Inc

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Author

Publications (2)

Proceedings Article | 19 May 2008 Paper

Extension of the 2D-TCC technique to optimize mask pattern layouts

Manabu Hakko, Kenji Yamazoe, Miyoko Kawashima, Yoshiyuki Sekine, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 7028, 70280Z (2008) https://doi.org/10.1117/12.793041

KEYWORDS: Photomasks, Calcium, Optical proximity correction, Curium, Printing, Semiconducting wafers, Resolution enhancement technologies, Model-based design, Scanning electron microscopy, Computer simulations

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Proceedings Article | 7 March 2008 Paper

Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement technique

Miyoko Kawashima, Kenji Yamazoe, Yoshiyuki Sekine, Manabu Hakko, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 6924, 69240F (2008) https://doi.org/10.1117/12.771943

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Source mask optimization, Photomasks, Fourier transforms, Critical dimension metrology, Scattering, Cadmium, Image enhancement, Image transmission

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