Dr. Manabu Hakko Profile

Dr. Manabu Hakko

at Canon Inc

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 20 November 2020

Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography

Manabu Hakko, Kanji Suzuki

JM3, Vol. 19, Issue 04, 043201, (November 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.4.043201

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Proceedings Article | 23 March 2020 Presentation + Paper

Divided spectrum illumination for high resolution flat panel display exposure tools

Manabu Hakko, Kanji Suzuki, Koichi Takasaki, Miwako Ando, Kouhei Nagano, Nozomu Izumi

Proceedings Volume 11327, 113270M (2020) https://doi.org/10.1117/12.2552330

KEYWORDS: Lithographic illumination, Nanoimprint lithography, Diffraction, Critical dimension metrology, Lithography, Resolution enhancement technologies, Flat panel displays, Optical resolution, Optical lithography, Photomasks

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Proceedings Article | 19 May 2008 Paper

Extension of the 2D-TCC technique to optimize mask pattern layouts

Manabu Hakko, Kenji Yamazoe, Miyoko Kawashima, Yoshiyuki Sekine, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 7028, 70280Z (2008) https://doi.org/10.1117/12.793041

KEYWORDS: Photomasks, Calcium, Optical proximity correction, Curium, Printing, Semiconducting wafers, Resolution enhancement technologies, Model-based design, Scanning electron microscopy, Computer simulations

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Proceedings Article | 7 March 2008 Paper

Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement technique

Miyoko Kawashima, Kenji Yamazoe, Yoshiyuki Sekine, Manabu Hakko, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 6924, 69240F (2008) https://doi.org/10.1117/12.771943

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Source mask optimization, Photomasks, Fourier transforms, Critical dimension metrology, Scattering, Cadmium, Image enhancement, Image transmission

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Proceedings Article | 30 October 2007 Paper

Resolution enhancement by aerial image approximation with 2D-TCC

Kenji Yamazoe, Yoshiyuki Sekine, Miyoko Kawashima, Manabu Hakko, Tomomi Ono, Tokuyuki Honda

Proceedings Volume 6730, 67302H (2007) https://doi.org/10.1117/12.746862

KEYWORDS: Reticles, SRAF, Image enhancement, Fourier transforms, Resolution enhancement technologies, Light sources, Image resolution, Polarization, Printing, Binary data

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