Mr. Manuel Jaramillo Profile

Manuel Jaramillo

Product Manager at Air Products and Chemicals Inc

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 15 April 2008 Paper

Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography

Bo Jou Lu, E. T. Liu, Anson Zeng, Aroma Tseng, Steven Wu, Bill Lin, Chun Chi Yu, Ling-Jen Meng, Manuel Jaramillo, Ming-Ching Liao

Proceedings Volume 6923, 69233G (2008) https://doi.org/10.1117/12.772494

KEYWORDS: Line width roughness, Semiconducting wafers, Lithography, Immersion lithography, Standards development, 193nm lithography, Critical dimension metrology, Line edge roughness, Image processing, Lutetium

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Proceedings Article | 23 March 2007 Paper

Formulated surface conditioners in 50-nm immersion lithography: simultaneously reducing pattern collapse and line-width roughness

Minoru Sugiyama, Masakazu Sanada, Suping Wang, Patrick Wong, Stephan Sinkwitz, Manuel Jaramillo, Gene Parris

Proceedings Volume 6519, 651927 (2007) https://doi.org/10.1117/12.712188

KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Immersion lithography, Finite element methods, Photoresist processing, Scanners, Scanning electron microscopy, Optical lithography

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Proceedings Article | 29 March 2006 Paper

Post-etch LER performance of novel surface conditioner solutions

P. Zhang, M. Jaramillo, S. Cassel, T. Wallow, A. Acheta, A. Pawloski, S. Bell, R. Kim

Proceedings Volume 6153, 61533Y (2006) https://doi.org/10.1117/12.656648

KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Line width roughness, Photoresist processing, Lithography, Plasma, Critical dimension metrology, Scanning electron microscopy, Plasma etching

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Proceedings Article | 29 March 2006 Paper

Formulated surface conditioners to enhance the non-collapse window and maintain defect control: a bi-functional approach for sub-100-nm lithography

Masakazu Sanada, Minoru Sugiyama, Manuel Jaramillo, Peng Zhang, Shawn Cassel

Proceedings Volume 6153, 615331 (2006) https://doi.org/10.1117/12.656661

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Lithography, Photoresist processing, Optical proximity correction, Manufacturing, Reticles, Wafer-level optics, Control systems

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Proceedings Article | 29 March 2006 Paper

Linewidth roughness reduction at the 55 nm node through combination of classical process optimization and application of surface conditioner solutions

Patrick Wong, Wendy Gehoel, Stephan Sinkwitz, Peng Zhang, Manuel Jaramillo, Madhukar Rao, Bridget Horvath, Brenda Ross, Shawn Cassel

Proceedings Volume 6153, 61533V (2006) https://doi.org/10.1117/12.657875

KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Image processing, Scanners, Platinum, Scanning electron microscopy, Critical dimension metrology, Image resolution, Resist chemistry

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Proceedings Article | 4 May 2005 Paper

Combined pattern collapse and LWR control at the 70 nm node through application of novel surface conditioner solutions

Peng Zhang, Manuel Jaramillo, Madhukar Rao, Brenda Ross, Bridget Horvath, Patrick Wong, Wendy Gehoel, Stephan Sinkwitz

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600039

KEYWORDS: Line width roughness, Semiconducting wafers, Lithography

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Proceedings Article | 4 May 2005 Paper

Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography

Peng Zhang, Madhukar Rao, Manuel Jaramillo, Bridget Horvath, Brenda Ross, Ted Paxton, Todd Davis, Pat Cook, David Witko

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600066

KEYWORDS: Line width roughness, Lithography, Critical dimension metrology, Photoresist materials, Water, Photoresist processing

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Proceedings Article | 14 May 2004 Paper

Surface conditioning solutions for pattern collapse reduction

Peng Zhang, Manuel Jaramillo, Danielle King, Madhukar Rao, Bridget O'Brien, Brenda Ross

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535283

KEYWORDS: Process control, Photoresist processing, Optical lithography, Semiconducting wafers, Control systems, Scanners, Capillaries, Liquids, Manufacturing, Standards development

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Proceedings Article | 14 May 2004 Paper

Surface conditioning solutions to reduce resist line roughness

Peng Zhang, Manuel Jaramillo, Madhukar Rao, Colin Yates, Danielle King, Brenda Ross, Bridget O'Brien

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535819

KEYWORDS: Line edge roughness, Image processing, Chemistry, Spatial frequencies, Lithography, Polymers, Photoresist processing, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 12 June 2003 Paper

Impact of surfactant in developer and rinse solution on 193-nm lithography performance

Peng Zhang, Manuel Jaramillo, Danielle King, Brenda Ross, David Witko, Ted Paxton, Todd Davis

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485170

KEYWORDS: Critical dimension metrology, Lithography, Semiconducting wafers, Photoresist processing, Interfaces, Capillaries, Photoresist materials, Photoresist developing, 193nm lithography, Reticles

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Proceedings Article | 12 June 2003 Paper

Impact of surfactant in developer on CD performance

Peng Zhang, Manuel Jaramillo, Danielle King, Thomas Markley, Zarka Zarkov, David Witko, Ted Paxton, Todd Davis

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485125

KEYWORDS: Critical dimension metrology, Polymers, Semiconducting wafers, Photoresist developing, Foam, Crystals, Deep ultraviolet, Photoresist materials, Polymer thin films, Scanners

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Showing 5 of 11 publications

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