Masakazu Sanada
at SCREEN Holdings
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 1 April 2009 Paper
Tomohiro Goto, Kazuhito Shigemori, Rik Vangheluwe, Daub Erich, Masakazu Sanada
Proceedings Volume 7273, 727329 (2009) https://doi.org/10.1117/12.814079
KEYWORDS: Semiconducting wafers, Immersion lithography, Particles, Thin film coatings, System integration, Coating, Chemical vapor deposition, Dielectrics, Carbon, Edge roughness

Proceedings Article | 16 April 2008 Paper
Proceedings Volume 6922, 692206 (2008) https://doi.org/10.1117/12.797082
KEYWORDS: Semiconducting wafers, Particles, Printing, Inspection, Immersion lithography, Coating, Scanners, Lithography, Contamination, Semiconductor manufacturing

Proceedings Article | 24 March 2008 Paper
Proceedings Volume 6922, 69222X (2008) https://doi.org/10.1117/12.772411
KEYWORDS: Semiconducting wafers, Particles, Lithography, Coating, Diffractive optical elements, Immersion lithography, Thin film coatings, Inspection, Silicon, Scanning electron microscopy

Proceedings Article | 23 March 2007 Paper
Minoru Sugiyama, Masakazu Sanada, Suping Wang, Patrick Wong, Stephan Sinkwitz, Manuel Jaramillo, Gene Parris
Proceedings Volume 6519, 651927 (2007) https://doi.org/10.1117/12.712188
KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Immersion lithography, Finite element methods, Photoresist processing, Scanners, Scanning electron microscopy, Optical lithography

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 61533P (2006) https://doi.org/10.1117/12.651999
KEYWORDS: Refractive index, Photoresist processing, Temperature metrology, Atomic force microscope, Atomic force microscopy, Ellipsometry, Semiconducting wafers, Scanning electron microscopy, Head-mounted displays, Semiconductor manufacturing

Showing 5 of 15 publications
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