Dr. Frances A. Houle Profile

Dr. Frances A. Houle

Research Staff Member at Lawrence Berkeley National Lab

SPIE Involvement:

Author

Publications (32)

Proceedings Article | 10 April 2024 Presentation

Modeling the kinetics of photon- and electron-induced reactions following EUV exposure

Jacob Milton, Frances Houle, Samuel Blau

Proceedings Volume 12957, 129571F (2024) https://doi.org/10.1117/12.3012420

KEYWORDS: Extreme ultraviolet lithography, Modeling, Photoresist materials, Stochastic processes, Photoresist developing, Ions, Ionization, Image acquisition, Copolymers, Chemically amplified resists

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Proceedings Article | 22 November 2023 Presentation

Modelling reactions in ESCAP polymers following EUV exposure via a chemical reaction network

Jacob Milton, Frances Houle, Samuel Blau

Proceedings Volume PC12750, PC1275009 (2023) https://doi.org/10.1117/12.2687731

KEYWORDS: Extreme ultraviolet lithography, Chemical reactions, Polymers, Modeling, Ionization, 3D modeling, Thermodynamics, Stochastic processes, Process modeling, Photoresist materials

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Proceedings Article | 30 April 2023 Presentation

A holistic approach to high precision patterning science

Ricardo Ruiz, Stacey Bent, Samuel Blau, Brett Helms, Frances Houle, Oleg Kostko, Patrick Naulleau, Paul Nealey, Christopher Ober, Dahyun Oh, Rachel Segalman, Cheng Wang

Proceedings Volume PC12497, PC124970J (2023) https://doi.org/10.1117/12.2662699

KEYWORDS: Optical lithography, Stochastic processes, Photoresist materials, Molecular self-assembly, Materials processing, Extreme ultraviolet lithography, Extreme ultraviolet, X-ray characterization, Semiconductors, Semiconductor manufacturing

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Proceedings Article | 1 April 2009 Paper

Quantitative measurement of resist outgassing during exposure

Nicolae Maxim, Frances Houle, Jeroen Huijbregtse, Vaughn Deline, Hoa Truong, Willem van Schaik

Proceedings Volume 7273, 72733Z (2009) https://doi.org/10.1117/12.813726

KEYWORDS: Silicon, Polymers, Nitrogen, Carbon, Semiconducting wafers, Calibration, Ultraviolet radiation, Sensors, Lithography, Photoresist materials

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Determination of both the identity and quantity of species desorbing from photoresists during exposure at any wavelength - 248nm, 193nm and EUV - has proved to be very challenging, adding considerable uncertainty to the evaluation of risks posed by specific photoresists to exposure tool optics. Measurements using a variety of techniques for gas detection and solid film analysis have been reported but analytical results have not in general been easy to compare or even in apparent agreement, in part due to difficulties in establishing absolute calibrations. In this work we describe two measurement methods that can be used for any exposure wavelength, and show that they provide self-consistent quantitative outgassing data for 2 all-organic and 2 Si-containing 193 nm resists. The first method, based upon gas collection, uses two primary chromatographic techniques. Organic products containing C, S and Si are determined by collection of vapors emitted during exposure in a cold trap and analysis by Gas Chromatography-Flame Ionization Detector-Pulsed Flame Photometric Detector-Mass Spectrometry (GC-FID-PFPD-MS). Inorganic products such as SO2 are identified by adsorbent bed with analysis by Gas Particle-Ion Chromatography (GP-IC). The calibration procedure used provides reasonable accuracy without exhaustive effort. The second method analyzes the elemental concentrations in resist films before and after exposure by secondary ion mass spectrometry technique (SIMS), which requires only knowledge of the resist compositions to be quantitative. The extent of outgassing of C and S determined by the two methods is in good agreement for all 4 resists, especially when taking their fundamentally different characters into account. Overall, the gas collection techniques yielded systematically lower outgassing numbers than did SIMS, and the origins of the spread in values, which likely bracket the true values, as well as detection limits will be discussed. The data for Si were found to differ significantly, however, and we show that the discrepancy is due to photo-induced reactions at the polymer surface with the gas atmosphere present above the resist during exposure. For example, photolytic oxidation of the C-Si bonds in air causes volatile Si-containing products to be formed from an otherwise stable polymer, showing it is important to take the gas environment during exposure into account when designing resist polymers for low Si outgassing.

Proceedings Article | 23 March 2009 Paper

Cr migration on 193nm binary photomasks

John Bruley, Geoffrey Burr, Robert Davis, Philip Flaitz, William Hinsberg, Frances Houle, Dolores Miller, Michael Pike, Jed Rankin, Alfred Wagner, Andrew Watts

Proceedings Volume 7272, 727215 (2009) https://doi.org/10.1117/12.813934

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Binary data, Manufacturing, Diffusion, Transmission electron microscopy, Roads, Photoresist materials, Oxidation

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Proceedings Article | 18 March 2009 Paper

Characterization of vinyl ether UV-cure nanoimprint resist

Taiichi Furukawa, Frances Houle, Deborah Casher, Dolores Miller

Proceedings Volume 7271, 727129 (2009) https://doi.org/10.1117/12.813065

KEYWORDS: Quartz, Metals, Adhesives, Silicon, Sputter deposition, Ultraviolet radiation, Humidity, Protactinium, Roads, Polymers

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Proceedings Article | 17 October 2008 Paper

Evaluation of 32nm advanced immersion lithography pellicles

N. Zhou, K. Racette, M. Hibbs, T. Mizoguchi, D. Hasselbeck, M. Barrett, R. Nolan, F. Houle, J. Ritter, A. Wagner, M. Caterer

Proceedings Volume 7122, 71220B (2008) https://doi.org/10.1117/12.801663

KEYWORDS: Pellicles, Photomasks, Adhesives, Data modeling, Inspection, Distortion, Transmittance, Immersion lithography, Lenses, Fermium

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Proceedings Article | 14 March 2008 Paper

Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions

Frances Houle, Ann Fornof, Dolores Miller, Simone Raoux, Hoa Truong, Eva Simonyi, Christopher Jahnes, Stephen Rossnagel

Proceedings Volume 6921, 69210B (2008) https://doi.org/10.1117/12.772591

KEYWORDS: Metals, Oxides, Interfaces, Photoresist processing, Adhesives, Silicon, Quartz, Atomic layer deposition, Ultraviolet radiation, Polymers

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Proceedings Article | 22 March 2007 Paper

Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography

Frances Houle, Ann Fornof, Ratnam Sooriyakumaran, Hoa Truong, Dolores Miller, Martha Sanchez, Blake Davis, Teddie Magbitang, Robert Allen, Mark Hart, Geraud Dubois

Proceedings Volume 6519, 65191C (2007) https://doi.org/10.1117/12.712298

KEYWORDS: Ultraviolet radiation, Fluorine, Polymers, Glasses, Silicon, Polymerization, Data conversion, Scanning electron microscopy, Dielectrics, Materials processing

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Proceedings Article | 29 March 2006 Paper

Vinyl ether resist system for UV-cured nanoimprint lithography

Hiroshi Ito, Frances Houle, Mark Hart, Rick DiPietro

Proceedings Volume 6153, 61531A (2006) https://doi.org/10.1117/12.656518

KEYWORDS: Polymerization, Ultraviolet radiation, Silicon, Nanoimprint lithography, Optical transfer functions, Etching, Reactive ion etching, Liquids, Semiconducting wafers, FT-IR spectroscopy

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Proceedings Article | 29 March 2006 Paper

Direct determination of photoresist composition changes during UV exposure

Frances Houle, Vaughn Deline, Hoa Truong, Ratnam Sooriyakumaran

Proceedings Volume 6153, 61530Z (2006) https://doi.org/10.1117/12.655687

KEYWORDS: Silicon, Ions, Polymers, Mass spectrometry, Photoresist materials, Spectroscopy, Semiconducting wafers, Ultraviolet radiation, Silicon carbide, Sputter deposition

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Proceedings Article | 29 March 2006 Paper

Numeric analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography

William Hinsberg, Frances Houle

Proceedings Volume 6153, 615303 (2006) https://doi.org/10.1117/12.656979

KEYWORDS: Lithography, Polymers, Oxygen, Photochemistry, Polymer thin films, Liquids, Photolysis, Hydrogen, Ultraviolet radiation, Oxidation

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Proceedings Article | 29 March 2006 Paper

Adhesion between template materials and UV-cured nanoimprint resists

Frances Houle, Eric Guyer, Dolores Miller, Reinhold Dauskardt, Emily Rice, Jeremy Hamilton

Proceedings Volume 6153, 61531B (2006) https://doi.org/10.1117/12.655698

KEYWORDS: Glasses, Silicon, Semiconducting wafers, Photoresist processing, Interfaces, Chemistry, Process control, Lithography, Nanoimprint lithography, Physics

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Proceedings Article | 4 May 2005 Paper

Evaluation of functional properties of imaging materials for water immersion lithography

William Hinsberg, J. Hoffnagle, G. Wallraff, C. Larson, F. Houle, Linda Sundberg, Hoa Truong, Blake Davis, Robert Allen

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600560

KEYWORDS: Lithography, Water, Polymers, Liquids, Contamination, Reflectivity, Interferometry, Immersion lithography, Semiconducting wafers, Chemical analysis

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Proceedings Article | 4 May 2005 Paper

Studies of acid diffusion in low Ea chemically amplified photoresists

G. Wallraff, D. Medeiros, C. Larson, M. Sanchez, Karen Petrillo, Wu-Song Huang, C. Rettner, B. Davis, Linda Sundberg, William Hinsberg, F. Houle, J. Hoffnagle, Dario Goldfarb, K. Temple, J. Bucchignano

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601759

KEYWORDS: Diffusion, Absorption, Photoresist materials, Polymers, Humidity, Lithography, Extreme ultraviolet lithography, Image resolution, Infrared imaging, Photoresist processing

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Proceedings Article | 28 May 2004 Paper

Fast calculation of images for high numerical aperture lithography

Alan Rosenbluth, Gregg Gallatin, Ronald Gordon, William Hinsberg, John Hoffnagle, Frances Houle, Kafai Lai, Alexey Lvov, Martha Sanchez, Nakgeuon Seong

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537716

KEYWORDS: Polarization, Photomasks, Diffraction, Birefringence, System on a chip, Lithography, Optical proximity correction, Image processing, Modulation transfer functions, Thin films

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Proceedings Article | 14 May 2004 Paper

Reactive dissolution kinetics of lithographic copolymers

William Hinsberg, Frances Houle, Hiroshi Ito

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535599

KEYWORDS: Polymers, Diffusion, Polymer thin films, Ionization, Lithography, Taxonomy, Crystals, Reflectivity, Quartz, Chemical analysis

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Proceedings Article | 14 May 2004 Paper

Liquid immersion lithography: evaluation of resist issues

William Hinsberg, Gregory Wallraff, Carl Larson, Blake Davis, Vaughn Deline, Simone Raoux, Dolores Miller, Frances Houle, John Hoffnagle, Martha Sanchez, Charles Rettner, Linda Sundberg, David Medeiros, Ralph Dammel, Willard Conley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536576

KEYWORDS: Liquids, Polymers, Diffusion, Lithography, Immersion lithography, Polymer thin films, Imaging systems, Neodymium, Semiconducting wafers, Absorption

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Proceedings Article | 16 June 2003 Paper

Estimated impact of shot noise in extreme-ultraviolet lithography

Jonathan Cobb, Frances Houle, Gregg Gallatin

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484730

KEYWORDS: Monte Carlo methods, Photon transport, Absorption, Line edge roughness, Edge roughness, Extreme ultraviolet lithography, Statistical analysis, Resist chemistry, Extreme ultraviolet, Lithography

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Proceedings Article | 12 June 2003 Paper

Using the critical ionization model for resist development to estimate contrast curves and roughening

Frances Houle, William Hinsberg, Martha Sanchez

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485131

KEYWORDS: Polymers, Ionization, Polymer thin films, Systems modeling, Line edge roughness, Photoresist processing, Photoresist materials, Chemically amplified resists, Statistical modeling, Computer simulations

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Proceedings Article | 12 June 2003 Paper

Extendibility of chemically amplified resists: another brick wall?

William Hinsberg, Frances Houle, Martha Sanchez, John Hoffnagle, Gregory Wallraff, David Medeiros, Gregg Gallatin, Jonathan Cobb

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487739

KEYWORDS: Lithography, Image resolution, Polymers, Diffusion, Semiconductors, Photoresist processing, Image processing, Chemically amplified resists, Line edge roughness, Molecules

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Proceedings Article | 2 June 2003 Paper

Characterization of photoresist spatial resolution by interferometric lithography

John Hoffnagle, William Hinsberg, Frances Houle, Martha Sanchez

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485015

KEYWORDS: Modulation transfer functions, Photoresist materials, Interferometry, Spatial resolution, Lithography, Modulation, Spatial frequencies, Deep ultraviolet, Photoresist developing, Optical lithography

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SPIE Journal Paper | 1 October 2002

High numerical aperture lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1507337

KEYWORDS: Lithography, Polarization, Photoresist processing, Image processing, Reflectivity, Interferometry, Reflection, Photoresist materials, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 30 July 2002 Paper

High-NA lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474473

KEYWORDS: Polarization, Lithography, Reflectivity, Photoresist processing, Reflection, Interferometry, Image processing, Photoresist materials, Optics manufacturing, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

High numerical aperture: imaging implications for chemically amplified photoresists

Martha Sanchez, Frances Houle, John Hoffnagle, Timothy Brunner, William Hinsberg

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474233

KEYWORDS: Polarization, Scanning electron microscopy, Lithography, Photoresist materials, Interferometry, Systems modeling, Imaging spectroscopy, Electron microscopes, Antireflective coatings, Image acquisition

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Proceedings Article | 1 July 2002 Paper

EUV photoresist performance results from the VNL and the EUV LLC

Jonathan Cobb, Paul Dentinger, Luke Hunter, Donna O'Connell, Gregg Gallatin, William Hinsberg, Frances Houle, Martha Sanchez, Wolf-Dieter Domke, Stefan Wurm, Uzodinma Okoroanyanwu, Sang Hun Lee

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472316

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Photoresist materials, Scanning electron microscopy, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Deep ultraviolet, Semiconductors, Photoresist developing

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Proceedings Article | 23 June 2000 Paper

Real-time analysis of volatiles formed during processing of a chemically amplified resist

Frances Houle, G. Poliskie, William Hinsberg, Dean Pearson, Martha Sanchez, Hiroshi Ito, John Hoffnagle

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388301

KEYWORDS: Ions, Polymers, Chemical analysis, Chemistry, Ionization, Spectroscopy, Molecules, Mass spectrometry, Nitrogen, Chemically amplified resists

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Proceedings Article | 23 June 2000 Paper

Effect of resist components on image spreading during postexposure bake of chemically amplified resists

William Hinsberg, Frances Houle, Martha Sanchez, Michael Morrison, Gregory Wallraff, Carl Larson, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388294

KEYWORDS: Diffusion, Polymers, Chemistry, Photoresist processing, Image processing, Chemically amplified resists, Temperature metrology, Polymer thin films, Chemical analysis, Lithography

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Proceedings Article | 11 June 1999 Paper

Experimental method for quantifying acid diffusion in chemically amplified resists

Gregory Wallraff, William Hinsberg, Frances Houle, Mons Morrison, Carl Larson, Martha Sanchez, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350196

KEYWORDS: Diffusion, Polymers, Polymer thin films, Image processing, Chemistry, Chemically amplified resists, Systems modeling, Quantum efficiency, Semiconducting wafers, 3D image processing

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Proceedings Article | 11 June 1999 Paper

Aerial image contrast using interferometric lithography: effect on line-edge roughness

Martha Sanchez, William Hinsberg, Frances Houle, John Hoffnagle, Hiroshi Ito, Cattien Nguyen

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350198

KEYWORDS: Line edge roughness, Lithography, Polymers, Interferometry, Photoresist materials, Scanning electron microscopy, Image analysis, Semiconducting wafers, Chemistry, Modulation

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Proceedings Article | 7 July 1997 Paper

Reactivity and kinetic parameters for UVIIHS

Gregory Wallraff, Juliann Opitz, William Hinsberg, Frances Houle, James Thackeray, Theodore Fedynyshyn, Doris Kang, Martha Rajaratnam

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275851

KEYWORDS: Systems modeling, Polymers, Chemistry, Stochastic processes, Deep ultraviolet, Catalysis, Contamination, Semiconducting wafers, Chemical analysis, Atmospheric modeling

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Proceedings Article | 9 June 1995 Paper

Kinetics of chemically amplified resists

Gregory Wallraff, William Hinsberg, Frances Houle, Juliann Opitz, Dale Hopper, John Hutchinson

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210391

KEYWORDS: Polymers, Photoresist processing, Diffusion, Systems modeling, Catalysis, Chemically amplified resists, Lithography, Ultraviolet radiation, Deep ultraviolet, Chemistry

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Showing 5 of 32 publications

Conference Committee Involvement (2)

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Advances in Resist Technology and Processing XX

24 February 2003 | Santa Clara, California, United States

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