Prof. Ernst-Bernhard Kley
Workpackage Leader at Friedrich-Schiller-Univ Jena
SPIE Involvement:
Author
Publications (114)

Proceedings Article | 20 November 2017 Open Access Paper
M. Erdmann, E.-B. Kley, U. Zeitner
Proceedings Volume 10565, 105651N (2017) https://doi.org/10.1117/12.2309264
KEYWORDS: Diffraction gratings, Etching, Binary data, Modulation, Silica, Spectroscopy, Diffraction, Stray light, Charge-coupled devices, Chromium

Proceedings Article | 31 October 2016 Paper
Dakui Lin, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu
Proceedings Volume 10022, 100220S (2016) https://doi.org/10.1117/12.2246356
KEYWORDS: Lithography, X-rays, Silica, Photomasks, X-ray lithography, Electron beam lithography, Optical design, Electron beams, Photoresist materials, Diffraction

Proceedings Article | 31 October 2016 Paper
Jinyu Li, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu
Proceedings Volume 10022, 100220T (2016) https://doi.org/10.1117/12.2246381
KEYWORDS: Electron beam lithography, Antireflective coatings, Lithography, Near field, Photomasks, Interfaces, Reflectivity, Glasses, Diffraction, Stray light

Proceedings Article | 15 September 2016 Paper
Proceedings Volume 9927, 992704 (2016) https://doi.org/10.1117/12.2236293
KEYWORDS: Silicon, Antireflective coatings, Mid-IR, Reactive ion etching, Interfaces, Etching, Transmittance, Coating, Optics manufacturing, Scattering

Proceedings Article | 15 September 2016 Presentation + Paper
Proceedings Volume 9927, 992706 (2016) https://doi.org/10.1117/12.2237644
KEYWORDS: Titanium dioxide, Polarizers, Far ultraviolet, Transmittance, Titanium, Refractive index, Polarization, Photomasks, Electron beam lithography, Diffraction

Proceedings Article | 15 March 2016 Paper
Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Ernst-Bernhard Kley, Uwe Zeitner
Proceedings Volume 9780, 978014 (2016) https://doi.org/10.1117/12.2218610
KEYWORDS: Lithography, Metals, Photomasks, Polymers, Electron beam lithography, Double patterning technology, Diffraction gratings, Aluminum, Optical components, Optical lithography, Photoresist materials, Nanolithography, Coating, Scanning electron microscopy

SPIE Journal Paper | 3 February 2016
Stéphane Bruynooghe, Marcel Schulze, Michael Helgert, Michel Challier, Diana Tonova, Michael Sundermann, Thomas Koch, Alexandre Gatto, Ernst-Bernhard Kley
JNP, Vol. 10, Issue 03, 033002, (February 2016) https://doi.org/10.1117/12.10.1117/1.JNP.10.033002
KEYWORDS: Antireflective coatings, Reflectivity, Refractive index, Glasses, Coating, Multilayers, Thin films, Reflection, Nanostructures, Etching

Proceedings Article | 23 September 2015 Paper
Proceedings Volume 9627, 96271G (2015) https://doi.org/10.1117/12.2191223
KEYWORDS: Diffraction gratings, Atomic layer deposition, Diffraction, Refractive index, Ion beams, Oxygen, Etching, Silica, Coating, Titanium dioxide

Proceedings Article | 23 September 2015 Paper
Proceedings Volume 9627, 96270P (2015) https://doi.org/10.1117/12.2192972
KEYWORDS: Atomic layer deposition, Silica, Refractive index, Etching, Composites, Diffusion, Aluminum, Oxides, Molecules, Spectroscopic ellipsometry

Proceedings Article | 20 August 2015 Paper
S. Bruynooghe, M. Helgert, M. Challier, D. Tonova, M. Sundermann, T. Koch, A. Gatto, M. Schulze, E.-B. Kley
Proceedings Volume 9558, 955804 (2015) https://doi.org/10.1117/12.2189810
KEYWORDS: Silica, Coating, Refractive index, Reflection, Antireflective coatings, Reflectivity, Thin films, Nanostructures, Multilayers, Etching

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 94260E (2015) https://doi.org/10.1117/12.2085777
KEYWORDS: Photomasks, Polarizers, Lithography, Etching, Lithographic illumination, Chromium, Photomicroscopy, Silica, Ion beams, Reactive ion etching

Proceedings Article | 27 February 2015 Paper
Proceedings Volume 9372, 93720F (2015) https://doi.org/10.1117/12.2081446
KEYWORDS: Reflectivity, Mirrors, Diffraction gratings, Reflectors, Silicon, Metrology, Modulation, Transmittance, Interferometers, Diffraction

Proceedings Article | 17 October 2014 Paper
Uwe Huebner, Matthias Falkner, Uwe Zeitner, Michael Banasch, Kay Dietrich, Ernst-Bernhard Kley
Proceedings Volume 9231, 92310E (2014) https://doi.org/10.1117/12.2065944
KEYWORDS: Gold, Electron beam lithography, Metamaterials, Optical metamaterials, Nanomaterials, Beam shaping, Terahertz radiation, Vestigial sideband modulation, Scanning electron microscopy, Nanolithography

Proceedings Article | 27 March 2014 Paper
Kay Dietrich, Dennis Lehr, Oliver Puffky, Ernst-Bernhard Kley, Andreas Tünnermann
Proceedings Volume 9051, 90510D (2014) https://doi.org/10.1117/12.2046214
KEYWORDS: Particles, Nanostructures, Nanomaterials, Nanolithography, Lithography, Electron beam lithography, Terahertz radiation, Metals, Gold, Dichroic materials

Proceedings Article | 7 March 2014 Paper
Uwe Zeitner, Torsten Harzendorf, Frank Fuchs, Michael Banasch, Holger Schmidt, Ernst-Bernhard Kley
Proceedings Volume 8974, 89740G (2014) https://doi.org/10.1117/12.2040206
KEYWORDS: Vestigial sideband modulation, Electron beam lithography, Lithography, Plasmonics, Nanolithography, Electron beams, Beam shaping, Metamaterials, Fabrication, Gaussian beams

Proceedings Article | 19 February 2014 Paper
Proceedings Volume 8995, 899504 (2014) https://doi.org/10.1117/12.2041729
KEYWORDS: Diffraction gratings, Silica, Lithography, Refractive index, Optical design, Atomic layer deposition, Etching, Diffraction, Electron beam lithography, Titanium dioxide

Proceedings Article | 19 February 2014 Paper
Proceedings Volume 8995, 89950B (2014) https://doi.org/10.1117/12.2039711
KEYWORDS: Reflectivity, Silicon, Reflectors, Optical components, Silica, Refractive index, Tolerancing, Light wave propagation, Resonators, Fabry–Perot interferometers

Proceedings Article | 15 March 2013 Paper
Proceedings Volume 8633, 86330M (2013) https://doi.org/10.1117/12.2006074
KEYWORDS: Reflectivity, Silicon, Light scattering, Mirrors, Crystals, Metrology, Optical coatings, Optical components, Beam splitters, Diffraction gratings

Proceedings Article | 15 March 2013 Paper
Proceedings Volume 8633, 86330Z (2013) https://doi.org/10.1117/12.2003930
KEYWORDS: Refractive index, Silicon, Optical filters, Diffraction gratings, Picosecond phenomena, Optical design, Diffraction, Silica, Binary data, Semiconductors

Proceedings Article | 15 March 2013 Paper
F. Zimmermann, S. Richter, A. Plech, S. Döring, M. Heinrich, M. Steinert, U. Peschel, E.-B. Kley, A. Tünnermann, S. Nolte
Proceedings Volume 8611, 86110Y (2013) https://doi.org/10.1117/12.2006180
KEYWORDS: Scattering, Scanning electron microscopy, Laser scattering, Etching, X-rays, Pulsed laser operation, Ultrafast phenomena, Ion beams, Particles, Light scattering

Proceedings Article | 17 September 2012 Paper
Proceedings Volume 8443, 844341 (2012) https://doi.org/10.1117/12.925542
KEYWORDS: Spatial resolution, X-rays, X-ray optics, Zone plates, Lenses, Point spread functions, Fresnel lenses, Mirrors, X-ray astronomy, Image segmentation

Proceedings Article | 13 September 2012 Paper
Proceedings Volume 8450, 84502Z (2012) https://doi.org/10.1117/12.928286
KEYWORDS: Diffraction gratings, Spectroscopy, Diffraction, Electron beam lithography, Lithography, Dielectric polarization, Dielectrics, Electron beams, Optical design, Laser applications

Proceedings Article | 2 May 2012 Paper
Proceedings Volume 8438, 84380M (2012) https://doi.org/10.1117/12.923748
KEYWORDS: Silicon, Nanostructuring, Solar cells, Nanolithography, Silicon films, Transparent conductors, Oxides, Etching, Interfaces, Reflectivity

Proceedings Article | 2 May 2012 Paper
Matthias Kroll, Martin Otto, Thomas Käsebier, Kevin Füchsel, Ralf Wehrspohn, Ernst-Bernhard Kley, Andreas Tünnermann, Thomas Pertsch
Proceedings Volume 8438, 843817 (2012) https://doi.org/10.1117/12.922380
KEYWORDS: Silicon, Solar cells, Absorption, Reflectivity, Interfaces, Optical coatings, Dielectrics, Antireflective coatings, Nanostructures, Etching

Proceedings Article | 17 April 2012 Paper
E.-Bernhard Kley, Holger Schmidt, Uwe Zeitner, Michael Banasch, Bernd Schnabel
Proceedings Volume 8352, 83520M (2012) https://doi.org/10.1117/12.920562
KEYWORDS: Vestigial sideband modulation, Nano optics, Beam shaping, Electron beam lithography, Chemical elements, Polarizers, Optical components, Lithography, Applied physics, Precision optics

Proceedings Article | 23 February 2012 Paper
Proceedings Volume 8270, 82700F (2012) https://doi.org/10.1117/12.906618
KEYWORDS: Polarizers, Silicon, Amorphous silicon, Ultraviolet radiation, Diffraction gratings, Refractive index, Optical testing, Etching, Optical properties, Mineralogy

Proceedings Article | 23 February 2012 Paper
Proceedings Volume 8270, 82700P (2012) https://doi.org/10.1117/12.908145
KEYWORDS: Reflectivity, Silicon, Tolerancing, Silica, Modulation, Reflectors, Polarization, Optical components, Diffractive optical elements, Diffraction gratings

Proceedings Article | 23 February 2012 Paper
Proceedings Volume 8270, 82700U (2012) https://doi.org/10.1117/12.908240
KEYWORDS: Etching, Silica, Reflectivity, Silicon, Tolerancing, Wet etching, Ions, Oxides, HF etching, Thin films

Proceedings Article | 16 February 2012 Paper
Proceedings Volume 8270, 827007 (2012) https://doi.org/10.1117/12.908184
KEYWORDS: Diffraction gratings, Silicon, Optical filters, Silica, Dielectrics, Dielectric filters, Refractive index, Diffraction, Sensors, Absorption

Proceedings Article | 4 October 2011 Paper
A. Szeghalmi, M. Arnold, A. Berger, N. Schammelt, K. Fuechsel, M. Knez, E. Kley, D. R. Zahn, A. Tuennermann
Proceedings Volume 8168, 81680K (2011) https://doi.org/10.1117/12.896818
KEYWORDS: Gold, Atomic layer deposition, Iridium, Thin films, Electrodes, Multilayers, Infrared imaging, Transmission electron microscopy, Coating, Metals

SPIE Journal Paper | 1 June 2011
OE, Vol. 50, Issue 06, 066501, (June 2011) https://doi.org/10.1117/12.10.1117/1.3584844
KEYWORDS: Extreme ultraviolet, Diffraction gratings, Diffraction, Plasma diagnostics, Molybdenum, Plasma, Beryllium, Absorption, Optical engineering, X-rays

Proceedings Article | 14 February 2011 Paper
Proceedings Volume 7927, 792710 (2011) https://doi.org/10.1117/12.875007
KEYWORDS: Computer generated holography, Diffraction, Binary data, Etching, Silica, Calibration, Optical design, Diffraction gratings, Reactive ion etching, Optical components

Proceedings Article | 29 July 2010 Paper
Proceedings Volume 7732, 77322B (2010) https://doi.org/10.1117/12.856463
KEYWORDS: Extreme ultraviolet, Diffraction gratings, Diffraction, Molybdenum, Beryllium, Plasma, Binary data, X-rays, Polymethylmethacrylate, Spectroscopy

Proceedings Article | 18 May 2010 Paper
Proceedings Volume 7725, 772502 (2010) https://doi.org/10.1117/12.854694
KEYWORDS: Silicon, Nanostructuring, Solar cells, Oxides, Transparent conductors, Electrodes, Antireflective coatings, Sputter deposition, Tin, Reflectivity

Proceedings Article | 18 May 2010 Paper
Matthias Kroll, Thomas Käsebier, Martin Otto, Roland Salzer, Ralf Wehrspohn, Ernst-Bernhard Kley, Andreas Tünnermann, Thomas Pertsch
Proceedings Volume 7725, 772505 (2010) https://doi.org/10.1117/12.854596
KEYWORDS: Silicon, Etching, Semiconducting wafers, Reflectivity, Scattering, Absorption, Light scattering, Surface finishing, Reflection, Reactive ion etching

Proceedings Article | 13 May 2010 Paper
Proceedings Volume 7716, 77161K (2010) https://doi.org/10.1117/12.854951
KEYWORDS: Diffraction gratings, Diffraction, Spectroscopy, Polarization, Lithography, Binary data, Optical design, Refractive index, Dielectric polarization, Reactive ion etching

Proceedings Article | 16 February 2010 Paper
Proceedings Volume 7591, 75910Z (2010) https://doi.org/10.1117/12.843526
KEYWORDS: Computer generated holography, Binary data, Diffraction, Optical components, Quantization, Chromium, Beam shaping, Electron beams, Lithography, Reflectivity

Proceedings Article | 19 February 2009 Paper
Thomas Weber, Hans-Jörg Fuchs, Holger Schmidt, Ernst-Bernhard Kley, Andreas Tünnermann
Proceedings Volume 7205, 720504 (2009) https://doi.org/10.1117/12.807993
KEYWORDS: Polarizers, Aluminum, Ultraviolet radiation, Metals, Diffraction gratings, Refractive index, Chromium, Photoresist materials, Etching, Diffraction

Proceedings Article | 14 May 2008 Paper
Proceedings Volume 6992, 69920M (2008) https://doi.org/10.1117/12.781916
KEYWORDS: Computer generated holography, Spatial frequencies, Chemical elements, Fourier transforms, Optical components, Signal to noise ratio, Refractive index, Wave propagation, Beam splitters, Computer simulations

Proceedings Article | 25 February 2008 Paper
Proceedings Volume 6873, 687317 (2008) https://doi.org/10.1117/12.763580
KEYWORDS: Fiber amplifiers, Pulsed fiber lasers, Fiber lasers, Diffraction gratings, Diffraction, Laser systems engineering, Semiconductor lasers, Optical amplifiers, Dielectrics, Modulation

Proceedings Article | 6 February 2008 Paper
Proceedings Volume 6883, 68830U (2008) https://doi.org/10.1117/12.767783
KEYWORDS: Diffraction gratings, Diffraction, Reflection, Interfaces, Silica, Reflectivity, Dielectrics, Coating, Optical design, Antireflective coatings

Proceedings Article | 6 February 2008 Paper
Proceedings Volume 6883, 68830N (2008) https://doi.org/10.1117/12.767778
KEYWORDS: Etching, Antireflective coatings, Silica, Aluminum, Reflection, Nanostructures, Oxygen, Polymers, Plasma etching, Ultraviolet radiation

Proceedings Article | 6 February 2008 Paper
Frank Brückner, Tina Clausnitzer, Oliver Burmeister, Daniel Friedrich, Ernst-Bernhard Kley, Karsten Danzmann, Andreas Tünnermann, Roman Schnabel
Proceedings Volume 6883, 68830X (2008) https://doi.org/10.1117/12.767775
KEYWORDS: Reflectivity, Diffraction gratings, Mirrors, Waveguides, Dielectrics, Diffraction, Tolerancing, Silicon, Reflection, Coating

Proceedings Article | 22 May 2007 Paper
Thomas Glinsner, Paul Lindner, Michael Mühlberger, Iris Bergmair, Rainer Schöftner, Kurt Hingerl, Holger Schmidt, Ernst-Bernhard Kley
Proceedings Volume 6591, 659103 (2007) https://doi.org/10.1117/12.721359
KEYWORDS: Crystals, Optical alignment, Aluminum, Photoresist processing, Scanning electron microscopy, Nanoimprint lithography, Lithography, Silicon, Photonic crystals, Coating

Proceedings Article | 31 August 2006 Paper
Proceedings Volume 6290, 629009 (2006) https://doi.org/10.1117/12.682739
KEYWORDS: Lithography, Micro optics, Optical components, Diffraction gratings, Fabrication, Laser systems engineering, Electron beam lithography, Semiconductors, Binary data, Wavefronts

Proceedings Article | 9 June 2006 Paper
Proceedings Volume 6149, 614902 (2006) https://doi.org/10.1117/12.674190
KEYWORDS: Metals, Electrons, Aluminum, Silica, Diffraction gratings, Nonlinear optics, Nanostructures, Coating, Diffraction, Gold

Proceedings Article | 20 October 2005 Paper
Proceedings Volume 5965, 596503 (2005) https://doi.org/10.1117/12.625195
KEYWORDS: Dielectrics, Holography, Dielectric filters, Gaussian beams, Optical filters, Beam shaping, Interference (communication), Holograms, Optical components, Spatial frequencies

Proceedings Article | 20 October 2005 Paper
Proceedings Volume 5965, 596505 (2005) https://doi.org/10.1117/12.625105
KEYWORDS: Photomasks, Diffraction, Holography, Near field, Scanning electron microscopy, Polarization, Electron beam lithography, Wave propagation, Lithography, Free space

Proceedings Article | 20 October 2005 Paper
Martina Gerken, René Boschert, Rainer Bornemann, Uli Lemmer, Detlef Schelle, Markus Augustin, Ernst-Bernhard Kley, Andreas Tünnermann
Proceedings Volume 5965, 59650F (2005) https://doi.org/10.1117/12.625661
KEYWORDS: Photonic crystals, Niobium, Crystals, Optical testing, Nanolithography, Scanning electron microscopy, Quartz, Nanostructuring, Optical properties, Spatial resolution

Proceedings Article | 20 October 2005 Paper
Proceedings Volume 5965, 596504 (2005) https://doi.org/10.1117/12.625111
KEYWORDS: Photomasks, Binary data, Photoresist materials, Waveguides, Lithography, Fabrication, Optical lithography, Etching, Coating, Dry etching

Proceedings Article | 15 October 2005 Paper
Proceedings Volume 5962, 596219 (2005) https://doi.org/10.1117/12.625170
KEYWORDS: Diffraction gratings, Diffraction, Wave propagation, Light wave propagation, Polarization, Waveguides, Silica, Dielectrics, Optical design, Geometrical optics

Proceedings Article | 28 September 2005 Paper
F. Garwe, U. Huebner, T. Clausnitzer, E.-B. Kley, U. Bauerschaefer
Proceedings Volume 5955, 59550T (2005) https://doi.org/10.1117/12.626854
KEYWORDS: Gold, Glasses, Magnetism, Nanostructures, Metamaterials, Infrared radiation, Metals, Optical properties, Nanowires, Nanorods

Proceedings Article | 26 August 2005 Paper
Proceedings Volume 5874, 58740O (2005) https://doi.org/10.1117/12.617335
KEYWORDS: Dielectrics, Dielectric filters, Gaussian beams, Optical filters, Interference (communication), Gaussian filters, Spatial frequencies, Etching, Binary data, Silica

Proceedings Article | 20 August 2005 Paper
T. Clausnitzer, E.-B. Kley, A. Tuennermann, A. Bunkowski, O. Burmeister, K. Danzmann, R. Schnabel, A. Duparre, S. Gliech
Proceedings Volume 5870, 58700J (2005) https://doi.org/10.1117/12.617334
KEYWORDS: Diffraction gratings, Diffraction, Scattering, Coating, Reflectivity, Mirrors, Dielectrics, Silica, Sensors, Scatter measurement

Proceedings Article | 18 August 2005 Paper
Proceedings Volume 5876, 58760J (2005) https://doi.org/10.1117/12.617395
KEYWORDS: Beam shaping, Electroluminescence, Chemical elements, Signal to noise ratio, Geometrical optics, Optical components, Transform theory, Fourier transforms, Lithography, Wavefronts

Proceedings Article | 21 March 2005 Paper
Proceedings Volume 5714, (2005) https://doi.org/10.1117/12.590461
KEYWORDS: Diffraction gratings, Diffraction, Cladding, Dielectrics, Fiber amplifiers, Silica, Femtosecond phenomena, Photonic crystal fibers, Fiber lasers, Laser systems engineering

Proceedings Article | 7 February 2005 Paper
Proceedings Volume 5636, (2005) https://doi.org/10.1117/12.576785
KEYWORDS: Diffraction gratings, Diffraction, Antireflective coatings, Thin films, Beam splitters, Coating, Refractive index, Silicon, Silica, Titanium dioxide

Proceedings Article | 22 January 2005 Paper
Proceedings Volume 5720, (2005) https://doi.org/10.1117/12.590473
KEYWORDS: Optical filters, Dielectrics, Dielectric filters, Gaussian beams, Etching, Spatial frequencies, Interference (communication), Gaussian filters, Laser damage threshold, Silica

Proceedings Article | 15 September 2004 Paper
Asma Jebali, Rainer Mahrt, Nikolaj Moll, Daniel Erni, Christian Bauer, Ernst Kley, Gian-Luca Bona, Werner Baechtold
Proceedings Volume 5450, (2004) https://doi.org/10.1117/12.545500
KEYWORDS: Polymers, Data modeling, Optical pumping, Etching, Maxwell's equations, Refractive index, Solids, Quartz, Luminescence, Physics

Proceedings Article | 9 July 2004 Paper
Markus Augustin, Rumen Iliew, Hans-Joerg Fuchs, Ulf Peschel, Ernst-Bernhard Kley, Stefan Nolte, Falk Lederer, Andreas Tuennermann
Proceedings Volume 5360, (2004) https://doi.org/10.1117/12.533478
KEYWORDS: Waveguides, Photonic crystals, Wave propagation, Niobium, Reactive ion etching, Etching, Refractive index, Semiconductors, Scanning electron microscopy, Scattering

Proceedings Article | 24 May 2004 Paper
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536311
KEYWORDS: Chromium, Photomasks, Reflection, Surface plasmons, Critical dimension metrology, Oxides, Polarization, Visible radiation, Scanning electron microscopy, Dielectric polarization

Proceedings Article | 26 February 2004 Paper
Proceedings Volume 5252, (2004) https://doi.org/10.1117/12.514182
KEYWORDS: Diffraction gratings, Diffraction, Etching, Silica, Dielectric polarization, Polarization, Chromium, Optical design, Beam splitters, Dielectrics

Proceedings Article | 29 December 2003 Paper
Proceedings Volume 5184, (2003) https://doi.org/10.1117/12.504583
KEYWORDS: Photomasks, Near field optics, Electron beam lithography, Holography, Binary data, Lithography, Diffraction gratings, Eye, Optical components, Antireflective coatings

Proceedings Article | 3 November 2003 Paper
Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.508492
KEYWORDS: Lithography, Photomasks, Calibration, Photoresist materials, Prisms, Optical lithography, Absorption, Photoresist developing, Optical components, Picture Archiving and Communication System

Proceedings Article | 3 November 2003 Paper
Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.505443
KEYWORDS: Optical fibers, Polarization, Sensors, Birefringence, Polarizers, Electronics, Optical filters, Optical components, Multimode fibers, Humidity

Proceedings Article | 3 November 2003 Paper
Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.505797
KEYWORDS: Etching, Lithography, Silica, Chemical elements, Photomasks, Semiconductor lasers, Fabrication, Calibration, Beam shaping, Photoresist processing

Proceedings Article | 3 November 2003 Paper
Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.507283
KEYWORDS: Polarization, Chromium, Polarimetry, Metals, Polarizers, Silica, Etching, Refractive index, Coating, Lithography

Proceedings Article | 3 November 2003 Paper
Proceedings Volume 5183, (2003) https://doi.org/10.1117/12.505751
KEYWORDS: Photomasks, Manufacturing, Lithography, Beam shaping, Analog electronics, Optical components, Photoresist processing, Optical lithography, Optics manufacturing, Glasses

Proceedings Article | 14 August 2003 Paper
Vladimir Yankov, Sergey Babin, Igor Ivonin, Alexander Goltsov, Anatolii Morozov, Leonid Polonskiy, Michael Spector, Andrei Talapov, Ernst Kley, Holger Schmidt, Robert Dahlgren
Proceedings Volume 5246, (2003) https://doi.org/10.1117/12.511426
KEYWORDS: Holograms, Digital holography, Planar waveguides, Dispersion, Holography, Photonics, Photonic integrated circuits, Refractive index, Photonic crystals, Volume holography

Proceedings Article | 17 June 2003 Paper
Vladimir Yankov, Sergey Babin, Igor Ivonin, Alexander Goltsov, Anatolii Morozov, Leonid Polonskiy, Michael Spector, Andrei Talapov, Ernst-Bernhard Kley, Holger Schmidt, Robert Dahlgren
Proceedings Volume 4989, (2003) https://doi.org/10.1117/12.488214
KEYWORDS: Planar waveguides, Fiber Bragg gratings, Wavelength division multiplexing, Mirrors, Manufacturing, Infrared cameras, Superposition, Volume holography, Lithography, Binary data

Proceedings Article | 3 March 2003 Paper
Proceedings Volume 4860, (2003) https://doi.org/10.1117/12.458953
KEYWORDS: Stars, Coronagraphy, Telescopes, Control systems, High dynamic range imaging, Nulling interferometry, Device simulation, Optics manufacturing, Optical components, Adaptive optics

Proceedings Article | 21 December 2001 Paper
Frank Wyrowski, Ernst-Bernhard Kley, Sven Buehling, Ton Nellissen, Lingli Wang, Maarten Dirkzwager
Proceedings Volume 4436, (2001) https://doi.org/10.1117/12.451293
KEYWORDS: Photomasks, Photoresist materials, Printing, Chromium, Etching, Electron beam lithography, Binary data, Light sources, Phase modulation, Computer simulations

Proceedings Article | 9 November 2001 Paper
Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448033
KEYWORDS: Computer generated holography, Diffraction gratings, Diffraction, Chemical elements, Wavefronts, Aspheric lenses, Optical components, Beam shaping, Quartz, Spherical lenses

Proceedings Article | 9 November 2001 Paper
Ernst-Bernhard Kley, Hans-Joerg Fuchs, Arnd Kilian
Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448027
KEYWORDS: Glasses, Silica, Etching, Chromium, Spherical lenses, Dry etching, Photomasks, Boron, Quartz, Phosphorus

Proceedings Article | 9 November 2001 Paper
Christian Bauer, Harald Giessen, Bernd Schnabel, Ernst-Bernhard Kley, Christopher Schmitt, Ullrich Scherf, Rainer Mahrt
Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448040
KEYWORDS: Polymers, Diffraction gratings, Laser resonators, Resonators, Photons, Laser damage threshold, Laser systems engineering, Etching, Optical pumping, Laser optics

Proceedings Article | 9 November 2001 Paper
Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448044
KEYWORDS: Beam shaping, Semiconductor lasers, Optical components, Lithography, Photomasks, Fabrication, Wave propagation, Surface roughness, Electron beams, Heat treatments

Proceedings Article | 9 November 2001 Paper
Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448054
KEYWORDS: Beam shaping, Optical components, Multimode fibers, Wave propagation, Spherical lenses, Lithography, Beam propagation method, High power lasers, Micro optics, Materials processing

Proceedings Article | 20 August 2001 Paper
Ton Nellissen, Lingli Wang, Maarten Dirkzwager, Frank Wyrowski, Ernst-Bernhard Kley, Harald Aagendahl, Sven Buehling
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436663
KEYWORDS: Photomasks, Photoresist materials, Printing, Detection and tracking algorithms, Diffraction, Collimation, Lithography, Chromium, Modulation, Optical lithography

Proceedings Article | 26 April 2001 Paper
Sven Buehling, Frank Wyrowski, Ernst-Bernhard Kley, Ton Nellissen, Lingli Wang, Maarten Dirkzwager
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425209
KEYWORDS: Photomasks, Photoresist materials, Printing, Chromium, Etching, Electron beam lithography, Binary data, Light sources, Phase modulation, Computer simulations

Proceedings Article | 6 October 2000 Paper
Ernst-Bernhard Kley, T. Clausnitzer, Matthias Cumme, Karsten Zoellner, Bernd Schnabel, A. Stich
Proceedings Volume 4231, (2000) https://doi.org/10.1117/12.402775
KEYWORDS: Binary data, Diffraction gratings, Wavefronts, Error analysis, Chromium, Photoresist processing, Etching, Electron beam lithography, Beam shaping, Diffraction

Proceedings Article | 6 October 2000 Paper
Bernd Schnabel, Ernst-Bernhard Kley
Proceedings Volume 4231, (2000) https://doi.org/10.1117/12.402777
KEYWORDS: Diffraction gratings, Diffraction, Compound parabolic concentrators, Electron beam lithography, Optical properties, Control systems, Lithography, Birefringence, Optical components, Solids

Proceedings Article | 6 October 2000 Paper
Proceedings Volume 4231, (2000) https://doi.org/10.1117/12.402780
KEYWORDS: Optical components, Lithography, Chemical elements, Beam shaping, Lenses, Micro optics, Spherical lenses, Wave propagation, Semiconductor lasers, Photomasks

Proceedings Article | 18 August 2000 Paper
Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395692
KEYWORDS: Photoresist materials, Photomasks, Lithography, Binary data, Silica, Reactive ion etching, Multiphoton lithography, Optical lithography, Diffraction, Optical components

Proceedings Article | 18 August 2000 Paper
Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395687
KEYWORDS: Beam shaping, Holography, Gaussian beams, Wavefronts, Optical components, Spherical lenses, Holograms, Holography applications, Superposition, Optical design

Proceedings Article | 18 August 2000 Paper
Tilman Glaser, Siegmund Schroeter, Hartmut Bartelt, Hans-Joerg Fuchs, Ernst-Bernhard Kley
Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395686
KEYWORDS: Diffraction gratings, Polarization, Optical isolators, Diffraction, Beam splitters, Polarizers, Binary data, Birefringence, Dielectric polarization, Quartz

Proceedings Article | 18 August 2000 Paper
Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395680
KEYWORDS: Ions, Etching, Photoresist materials, Calcium, Microlens, Surface roughness, Sputter deposition, Lenses, Ion beams, Microlens array

Proceedings Article | 31 August 1999 Paper
Ernst-Bernhard Kley, Hans-Joerg Fuchs, Karsten Zoellner
Proceedings Volume 3879, (1999) https://doi.org/10.1117/12.360534
KEYWORDS: Etching, Chromium, Phase measurement, Ion beams, Birefringence, Silica, Photomasks, Fabrication, Reactive ion etching, Coating

Proceedings Article | 31 August 1999 Paper
Proceedings Volume 3879, (1999) https://doi.org/10.1117/12.360523
KEYWORDS: Beam shaping, Chemical elements, Optical components, Lithography, Photoresist materials, Spherical lenses, Signal to noise ratio, Fabrication, Micro optics, Optical lithography

Proceedings Article | 31 August 1999 Paper
Proceedings Volume 3879, (1999) https://doi.org/10.1117/12.360513
KEYWORDS: Beam shaping, Chemical elements, Lithography, Optical components, Glasses, Fabrication, Electron beam lithography, Photomasks, Polymers, Micro optics

Proceedings Article | 1 June 1999 Paper
Proceedings Volume 3633, (1999) https://doi.org/10.1117/12.349333
KEYWORDS: Beam shaping, Photomasks, Thermal effects, Glasses, Gaussian beams, Silver, Electron beams, Lithography, Calibration, Ions

Proceedings Article | 30 April 1999 Paper
Rolf Goering, Bernd Hoefer, Anke Kraeplin, Peter Schreiber, Ernst-Bernhard Kley, Volkmar Schmeisser
Proceedings Volume 3631, (1999) https://doi.org/10.1117/12.348312
KEYWORDS: Semiconductor lasers, Microlens, Fiber lasers, Diodes, Prototyping, Diffraction gratings, Copper, Laser development, Heatsinks, High power lasers

SPIE Journal Paper | 1 February 1999
OE, Vol. 38, Issue 02, (February 1999) https://doi.org/10.1117/12.10.1117/1.602257
KEYWORDS: Dielectric polarization, Polarization, Metals, Diffraction gratings, Chromium, Etching, Visible radiation, Polarizers, Ion beams, Transmittance

Proceedings Article | 18 June 1998 Paper
Proceedings Volume 3291, (1998) https://doi.org/10.1117/12.310573
KEYWORDS: Manufacturing, Superposition, Chemical elements, Telecommunications, Optics manufacturing, Diffractive optical elements, Modes of laser operation, Optical components, Transmission electron microscopy, Modulation

Proceedings Article | 1 April 1998 Paper
Frank Wyrowski, Ernst-Bernhard Kley, Bernd Schnabel, Jari Turunen, Marko Honkanen
Proceedings Volume 3402, (1998) https://doi.org/10.1117/12.304958
KEYWORDS: Interfaces, Diffraction gratings, Refractive index, Transmittance, Electron beam lithography, Modulation, Electron beams, Dielectrics, Inspection, Physics

Proceedings Article | 15 March 1998 Paper
Proceedings Volume 3276, (1998) https://doi.org/10.1117/12.302393
KEYWORDS: Prisms, Monochromatic aberrations, Switches, Tolerancing, Fiber optics, Beam shaping, Refractive index, Gaussian beams, Channel projecting optics, Switching

Proceedings Article | 15 March 1998 Paper
Ernst-Bernhard Kley, Frank Thoma, Uwe Zeitner, Lars-Christian Wittig, Harald Aagedal
Proceedings Volume 3276, (1998) https://doi.org/10.1117/12.302404
KEYWORDS: Glasses, Photomasks, Optical lithography, Lithography, Electron beam lithography, Micro optics, Lenses, Fabrication, Beam shaping, Photoresist processing

Proceedings Article | 1 November 1997 Paper
Proceedings Volume 3134, (1997) https://doi.org/10.1117/12.295137
KEYWORDS: Manufacturing, Energy efficiency, Optics manufacturing, Polymethylmethacrylate, Computer simulations, Diffractive optical elements, Optical components, Chemical elements, Transform theory, Phase measurement

Proceedings Article | 1 November 1997 Paper
Michael Duparre, Michael Golub, Barbara Luedge, Richard Kowarschik, Ernst-Bernhard Kley, Hans-Joerg Fuchs
Proceedings Volume 3134, (1997) https://doi.org/10.1117/12.295138
KEYWORDS: Beam shaping, Chemical elements, Photomasks, Computer simulations, Etching, Gaussian beams, Manufacturing, Diffraction, Binary data, Optical components

Proceedings Article | 24 September 1997 Paper
Proceedings Volume 3099, (1997) https://doi.org/10.1117/12.281237
KEYWORDS: Polarization, Dielectric polarization, Binary data, Multiplexing, Metals, Electron beam lithography, Opacity, Diffractive optical elements, Chromium, Matrices

Proceedings Article | 22 September 1997 Paper
Proceedings Volume 3110, (1997) https://doi.org/10.1117/12.281398
KEYWORDS: Diffractive optical elements, Manufacturing, Energy efficiency, Optics manufacturing, Polymethylmethacrylate, Transform theory, Computer simulations, Etching, Interferometry, Modes of laser operation

Proceedings Article | 15 May 1997 Paper
Proceedings Volume 3010, (1997) https://doi.org/10.1117/12.274413
KEYWORDS: Electron beam lithography, Microelectronics, Optical components, Diffraction, Chemical elements, Photomasks, Optical design, Binary data, Interfaces, Optical simulations

Proceedings Article | 11 April 1997 Paper
Ernst-Bernhard Kley, Bernd Schnabel, Uwe Zeitner
Proceedings Volume 3008, (1997) https://doi.org/10.1117/12.271417
KEYWORDS: Electron beam lithography, Binary data, Polarization, Computer generated holography, Fabrication, Lenses, Photomasks, Glasses, Chemical elements, Diffraction

Proceedings Article | 11 April 1997 Paper
Bernd Schnabel, Ernst-Bernhard Kley
Proceedings Volume 3008, (1997) https://doi.org/10.1117/12.271418
KEYWORDS: Metals, Etching, Waveguides, Diffraction gratings, Dielectrics, Binary data, Polarization, Dielectric polarization, Ion beams, Optical properties

Proceedings Article | 1 November 1996 Paper
Proceedings Volume 2863, (1996) https://doi.org/10.1117/12.256214
KEYWORDS: Diffraction, Lenses, Lithography, Optical properties, Scanning electron microscopy, Electrons, Superposition, Cylindrical lenses, Error analysis, Physics

Proceedings Article | 1 November 1996 Paper
Ernst-Bernhard Kley, Bernd Schnabel, Heike Huebner, Uwe Zeitner
Proceedings Volume 2863, (1996) https://doi.org/10.1117/12.256221
KEYWORDS: Polarization, Polarimetry, Diffraction gratings, CCD cameras, Spatial resolution, Chemical elements, Lenses, Spectroscopy, Binary data, Charge-coupled devices

Proceedings Article | 1 November 1996 Paper
Proceedings Volume 2863, (1996) https://doi.org/10.1117/12.256223
KEYWORDS: Dielectric polarization, Dielectrics, Diffraction gratings, Binary data, Scanning electron microscopy, Profilometers, Diffraction, Spatial frequencies, Visible radiation, Reflection

Proceedings Article | 26 August 1996 Paper
Ines Anke, Ernst-Bernhard Kley, Heike Huebner, Bernd Schnabel, Ruediger Poehlmann
Proceedings Volume 2783, (1996) https://doi.org/10.1117/12.248505
KEYWORDS: Polymers, Silicon, Electroplating, Electron beams, Metals, Manufacturing, Chromium, Lenses, Binary data, Refractive index

Proceedings Article | 26 August 1996 Paper
Proceedings Volume 2783, (1996) https://doi.org/10.1117/12.248504
KEYWORDS: Electron beam lithography, Optical microsystems, Spatial frequencies, Holograms, Optical components, Photomasks, Waveguides, Electron beams, Sensors, Diffraction gratings

Proceedings Article | 7 May 1996 Paper
Michael Duparre, Barbara Luedge, Richard Kowarschik, Michael Golub, Ernst-Bernhard Kley, Hans-Joerg Fuchs
Proceedings Volume 2689, (1996) https://doi.org/10.1117/12.239615
KEYWORDS: Beam shaping, Photomasks, Computer simulations, Gaussian beams, Manufacturing, Etching, Optical components, Telescopes, Cameras, Optics manufacturing

SPIE Journal Paper | 1 May 1996
Michael Golub, Michael Duparre, Ernst-Bernhard Kley, Richard Kowarschik, Barbara Luedge, Werner Rockstroh, Hans-Joerg Fuchs
OE, Vol. 35, Issue 05, (May 1996) https://doi.org/10.1117/12.10.1117/1.600697
KEYWORDS: Beam shaping, Photomasks, Electron beam lithography, Infrared cameras, Gaussian beams, Binary data, Cameras, Optical components, Gas lasers, Optical engineering

Proceedings Article | 26 September 1995 Paper
Ernst-Bernhard Kley, Bernd Schnabel
Proceedings Volume 2640, (1995) https://doi.org/10.1117/12.222658
KEYWORDS: Binary data, Electron beam lithography, Compound parabolic concentrators, Electron beams, Micromachining, Beam shaping, Computer programming, Gaussian beams, Holograms, Lenses

Proceedings Article | 25 September 1995 Paper
William Chang, Ernst-Bernhard Kley, Hans-Joerg Fuchs, Bernd Schnabel, Eckhart Foerster, Felix Chukhovskii
Proceedings Volume 2516, (1995) https://doi.org/10.1117/12.221684
KEYWORDS: Crystals, Modulation, X-rays, Reflection, Diffraction, Silicon, X-ray optics, X-ray diffraction, Near field diffraction, Geometrical optics

Proceedings Article | 28 July 1994 Paper
R. Waldhaeusl, Ernst-Bernhard Kley, Peter Dannberg, Andreas Braeuer, Wolfgang Karthe
Proceedings Volume 2213, (1994) https://doi.org/10.1117/12.180954
KEYWORDS: Waveguides, Diffraction gratings, Polymers, Polymer multimode waveguides, Beam shaping, Electron beam lithography, Diffraction, Near field, Refractive index, Polymethylmethacrylate

Proceedings Article | 15 December 1993 Paper
Rolf Goering, Wolfgang Berner, Ernst-Bernhard Kley
Proceedings Volume 1992, (1993) https://doi.org/10.1117/12.165707
KEYWORDS: Modulation, Optical components, Micro optics, Chemical elements, Microlens, Collimation, Microlens array, Phase modulation, Fresnel lenses, Switching

Showing 5 of 114 publications
Proceedings Volume Editor (5)

Conference Committee Involvement (21)
High Contrast Metastructures V
17 February 2016 | San Francisco, California, United States
High Contrast Metastructures IV
11 February 2015 | San Francisco, California, United States
High Contrast Metastructures III
4 February 2014 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
3 February 2014 | San Francisco, California, United States
High Contrast Metastructures II
5 February 2013 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI
5 February 2013 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
24 January 2012 | San Francisco, California, United States
High Contrast Metastructures
22 January 2012 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
25 January 2011 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
25 January 2010 | San Francisco, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II
26 January 2009 | San Jose, California, United States
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics
21 January 2008 | San Jose, California, United States
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
8 July 2007 | Chengdu, China
Micromachining Technology for Micro-optics and Nano-optics V
23 January 2007 | San Jose, California, United States
Micromachining Technology for Micro-Optics and Nano-Optics IV
23 January 2006 | San Jose, California, United States
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
2 November 2005 | Xian, China
Optical Fabrication, Testing, and Metrology II
13 September 2005 | Jena, Germany
Micromachining Technology for Microoptics and Nanooptics III
25 January 2005 | San Jose, California, United States
Lithographic and Micromachining Techniques for Optical Component Fabrication II
3 August 2003 | San Diego, California, United States
Lithographic and Micromachining Techniques for Optical Component Fabrication
29 July 2001 | San Diego, CA, United States
Micro-Optical and Optical Fiber Measurement and Sensor Technologies
18 June 1997 | Munich, Germany
Showing 5 of 21 Conference Committees
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