Dr. Dirk Jürgens
System Engineer at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper
Joachim Kalden, Jens Timo Neumann, Dirk Jürgens, Paul Gräupner, Wolfgang Seitz, Peter Kürz
Proceedings Volume 12953, 129530Q (2024) https://doi.org/10.1117/12.3010847
KEYWORDS: EUV optics, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Optics manufacturing, Geometrical optics, Projection systems, Optical transmission, Metrology

Proceedings Article | 21 November 2023 Paper
Proceedings Volume 12750, 127500O (2023) https://doi.org/10.1117/12.2687658
KEYWORDS: Optics manufacturing, EUV optics, Scanners, Optical resolution, Imaging systems, High volume manufacturing, Projection systems, Mirrors, Metrology, Manufacturing

Proceedings Article | 5 October 2023 Paper
Daniel Golde, Björn Butscher, Paul Gräupner, Peter Kürz, Dirk Jürgens, Olaf Conradi, Jan van Schoot, Judon Stoeldraijer
Proceedings Volume 12802, 1280202 (2023) https://doi.org/10.1117/12.2673952
KEYWORDS: Mirrors, Extreme ultraviolet, Design and modelling, Semiconducting wafers, Extreme ultraviolet lithography, EUV optics, Scanners, Reticles, Optics manufacturing, Manufacturing

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12292, 1229204 (2022) https://doi.org/10.1117/12.2645875
KEYWORDS: Projection systems, Optics manufacturing, Lithography, Extreme ultraviolet, EUV optics, Extreme ultraviolet lithography

Proceedings Article | 15 September 2022 Presentation
Proceedings Volume 12325, 1232505 (2022) https://doi.org/10.1117/12.2640511

Proceedings Article | 4 March 2010 Paper
Jörg Zimmermann, Paul Gräupner, Jens Neumann, Dirk Hellweg, Dirk Jürgens, Michael Patra, Christoph Hennerkes, Manfred Maul, Bernd Geh, Andre Engelen, Oscar Noordman, Melchior Mulder, Sean Park, Joep De Vocht
Proceedings Volume 7640, 764005 (2010) https://doi.org/10.1117/12.847282
KEYWORDS: Diffractive optical elements, Fiber optic illuminators, Reticles, Lithographic illumination, Mirrors, Critical dimension metrology, Distortion, Source mask optimization, Manufacturing, Semiconducting wafers

Proceedings Article | 4 March 2010 Paper
Melchior Mulder, André Engelen, Oscar Noordman, Gert Streutker, Bert van Drieenhuizen, Cas van Nuenen, Wilfred Endendijk, Jef Verbeeck, Wim Bouman, Anita Bouma, Robert Kazinczi, Robert Socha, Dirk Jürgens, Joerg Zimmermann, Bastian Trauter, Joost Bekaert, Bart Laenens, Daniel Corliss, Greg McIntyre
Proceedings Volume 7640, 76401P (2010) https://doi.org/10.1117/12.845984
KEYWORDS: Mirrors, Diffractive optical elements, Fiber optic illuminators, Source mask optimization, Imaging systems, Electroluminescence, Polarization, Semiconducting wafers, Photomasks, Light

Proceedings Article | 11 December 2009 Paper
Melchior Mulder, André Engelen, Oscar Noordman, Robert Kazinczi, Gert Streutker, Bert van Drieenhuizen, Stephen Hsu, Keith Gronlund, Markus Degünther, Dirk Jürgens, Johannes Eisenmenger, Michael Patra, Andras Major
Proceedings Volume 7520, 75200Y (2009) https://doi.org/10.1117/12.837035
KEYWORDS: Mirrors, Fiber optic illuminators, Diffractive optical elements, Source mask optimization, Micromirrors, Light, Metrology, Semiconducting wafers, Switching, Scanners

Showing 5 of 8 publications
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