Mr. David Power Profile

David Power

Principal Engineer at TEL Technology Ctr America LLC

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Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation

Breaching high-NA EUV dimensions with 193i anti-spacer multipatterning

Michael Murphy, Jacob Dobson, Jodi Grzeskowiak, David Power, Charlotte Cutler, Andrew Weloth, David Conklin

Proceedings Volume 12957, 1295711 (2024) https://doi.org/10.1117/12.3010447

KEYWORDS: Extreme ultraviolet, Printing, Lithography, Optical lithography, Integrated circuits, Film thickness, Extreme ultraviolet lithography, Etching, Double patterning technology, Chemistry

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Proceedings Article | 9 April 2024 Presentation + Paper

Sub-20nm tip-to-tip enabled by anti-spacer patterning

J. Grzeskowiak, M. Murphy, D. Power, S. Grzeskowiak, E. Liu, D. Conklin, A. deVilliers

Proceedings Volume 12957, 129570U (2024) https://doi.org/10.1117/12.3009982

KEYWORDS: Double patterning technology, Advanced patterning, Photoresist materials, Optical lithography, Etching, Extreme ultraviolet, Design, Extreme ultraviolet lithography, Lithography, Scanning electron microscopy, Printing, Semiconducting wafers

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Proceedings Article | 20 March 2018 Presentation + Paper

Optimization of optical proximity correction to reduce mask write time using genetic algorithm

Gregory Dick, Liang Cao, Abhishek Asthana, Jing Cheng, David Power

Proceedings Volume 10588, 1058806 (2018) https://doi.org/10.1117/12.2297400

KEYWORDS: Optical proximity correction, Genetic algorithms, Optimization (mathematics), Photomasks, Data processing

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Proceedings Article | 16 March 2016 Paper

Wafer hotspot prevention using etch aware OPC correction

Ayman Hamouda, Dave Power, Mohamed Salama, Ao Chen

Proceedings Volume 9781, 978115 (2016) https://doi.org/10.1117/12.2220778

KEYWORDS: Etching, Optical proximity correction, Optical lithography, Semiconducting wafers, Calibration, Photomasks, Bridges, Yield improvement, Computer simulations, Lithography

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Proceedings Article | 15 March 2016 Paper

OPC recipe optimization using genetic algorithm

Abhishek Asthana, Bill Wilkinson, Dave Power

Proceedings Volume 9780, 97800J (2016) https://doi.org/10.1117/12.2219166

KEYWORDS: Inspection, Optical proximity correction, Genetic algorithms, Standards development, Optimization (mathematics), Resolution enhancement technologies, Computational lithography, Metals, Photomasks, Photovoltaics

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