Dr. Ayman Hamouda
Principal Engineer ASML at ASML
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870O (2018) https://doi.org/10.1117/12.2297368
KEYWORDS: Etching, Photomasks, Optical proximity correction, Optical lithography, Lithography, Printing, Deep ultraviolet, Critical dimension metrology, Mask making, Resolution enhancement technologies

Proceedings Article | 24 March 2017 Presentation + Paper
Ayman Hamouda, Mohamed Bahnas, Dan Schumacher, Ioana Graur, Ao Chen, Kareem Madkour, Hussein Ali, Jason Meiring, Neal Lafferty, Chris McGinty
Proceedings Volume 10147, 101470R (2017) https://doi.org/10.1117/12.2260769
KEYWORDS: Optical proximity correction, Optical lithography, Semiconductor manufacturing, Photomasks, Computational lithography, Databases, Resolution enhancement technologies, Visualization, Semiconducting wafers, Design for manufacturing, Cadmium

Proceedings Article | 25 October 2016 Paper
Ayman Hamouda, Hesham Abdelghany
Proceedings Volume 9985, 99852A (2016) https://doi.org/10.1117/12.2246563
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Optical lithography, Process modeling, Manufacturing, Yield improvement, Etching, Electron beam lithography, Data modeling

Proceedings Article | 16 March 2016 Paper
Proceedings Volume 9781, 978115 (2016) https://doi.org/10.1117/12.2220778
KEYWORDS: Etching, Optical proximity correction, Optical lithography, Semiconducting wafers, Calibration, Photomasks, Bridges, Yield improvement, Computer simulations, Lithography

Proceedings Article | 18 March 2015 Paper
Lalit Shokeen, Ayman Hamouda, Mark Terry, Dan Dechene, Stephen Hsu, Michael Crouse, Pengcheng Li, Keith Gronlund, Gary Zhang
Proceedings Volume 9427, 94270Z (2015) https://doi.org/10.1117/12.2086101
KEYWORDS: Scanners, Optical proximity correction, Source mask optimization, Process modeling, Logic, Photomasks, Semiconducting wafers, Optical lithography, Lithography, Etching

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9427, 94270X (2015) https://doi.org/10.1117/12.2085956
KEYWORDS: Etching, Critical dimension metrology, Optical proximity correction, Model-based design, Process modeling, Semiconducting wafers, Metals, Optical lithography, Calibration, Data modeling

Proceedings Article | 16 September 2014 Paper
Proceedings Volume 9235, 92351W (2014) https://doi.org/10.1117/12.2070544
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Model-based design, Printing, Optical lithography, Chemical mechanical planarization, Etching, Resolution enhancement technologies, Semiconducting wafers

Proceedings Article | 9 September 2013 Paper
Ayman Hamouda, Mohab Anis, Karim Karim
Proceedings Volume 8880, 88801I (2013) https://doi.org/10.1117/12.2027718
KEYWORDS: Optical proximity correction, Model-based design, Photomasks, Image segmentation, Optical lithography, Printing, Data modeling, Ions, Resolution enhancement technologies, Lithography

Proceedings Article | 12 April 2013 Paper
Bassem Hamieh, Hyun Chol Choi, Burcin Erenturk, Wei Guo, Ayman Hamouda, Huikan Liu, Gregory McIntyre, Jason Meiring, David Moreau, Alan Thomas, Alexander Wei
Proceedings Volume 8683, 86830J (2013) https://doi.org/10.1117/12.2011349
KEYWORDS: Photomasks, Source mask optimization, Printing, Data modeling, SRAF, Phase shifts, Photovoltaics, Image processing, Nanoimprint lithography, Binary data

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7974, 797411 (2011) https://doi.org/10.1117/12.882073
KEYWORDS: Optical proximity correction, Artificial intelligence, Metals, Resolution enhancement technologies, Model-based design, Photomasks, Lithography, Semiconducting wafers, Electrochemical etching, Optical lithography

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67302K (2007) https://doi.org/10.1117/12.747448
KEYWORDS: SRAF, Photovoltaics, Optical proximity correction, Resolution enhancement technologies, Model-based design, Metals, Optimization (mathematics), Manufacturing, Photomasks, Lithography

Proceedings Article | 30 October 2007 Paper
Srividya Jayaram, Ayman Yehia, Mohamed Bahnas, Hesham Maaty Omar, Zeki Bozkus, John Sturtevant
Proceedings Volume 6730, 67302E (2007) https://doi.org/10.1117/12.748035
KEYWORDS: SRAF, Photovoltaics, Printing, Model-based design, Tolerancing, Error analysis, Antimony, Critical dimension metrology, Semiconducting wafers, Image processing

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65203Y (2007) https://doi.org/10.1117/12.714395
KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Optical alignment, Optical lithography, Mask making, Model-based design, Beam shaping, Silicon, Visualization

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 65211L (2007) https://doi.org/10.1117/12.712748
KEYWORDS: SRAF, Optical proximity correction, Critical dimension metrology, Manufacturing, Photomasks, Model-based design, Antimony, Design for manufacturability, Optimization (mathematics), Resolution enhancement technologies

Proceedings Article | 21 March 2006 Paper
Ryan Burns, Yuping Cui, Zengqin Zhao, Ian Stobert, Pat LaCour, Ayman Yehia, Kareem Madkour, Mohamed Gheith, Ahmed Seoud
Proceedings Volume 6154, 61543G (2006) https://doi.org/10.1117/12.656649
KEYWORDS: Optical proximity correction, Photomasks, Inspection, Lithography, SRAF, Printing, Neck, Visualization, Standards development, Defect inspection

SPIE Journal Paper | 1 May 2004
OE, Vol. 43, Issue 05, (May 2004) https://doi.org/10.1117/12.10.1117/1.1695404
KEYWORDS: Brain-machine interfaces, Demultiplexers, Phased arrays, Dense wavelength division multiplexing, Waveguides, Integrated optics, Phased array optics, Refractive index, Optical engineering, Structural design

Showing 5 of 16 publications
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