Dr. Alexandra Krawicz
at TEL
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 10 April 2024 Poster
Proceedings Volume PC12953, PC129530Y (2024) https://doi.org/10.1117/12.3010880
KEYWORDS: Yield improvement, Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Lithography, Tin, Semiconductors, Integrated circuits, Inspection

Proceedings Article | 9 April 2024 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kayoko Cho, Hikari Tomori, Yuhei Kuwahara, Tomoya Onitsuka, Soichiro Okada, Shinichiro Kawakami, Arisa Hara, Seiji Fujimoto, Makoto Muramatsu, Reiko Tsuzuki, Xiang Liu, Arame Thiam, Yannick Feurprier, Kathleen Nafus, Michael Carcasi, Lior Huli, Kanzo Kato, Alexandra Krawicz, Michael Kocsis, Peter De Schepper, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Bruno La Fontaine, Ryan Miyakawa, Chris Anderson, Patrick Naulleau
Proceedings Volume 12957, 1295705 (2024) https://doi.org/10.1117/12.3010207
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Tin, Lithography, Etching

Proceedings Article | 28 November 2023 Presentation + Paper
Proceedings Volume PC12750, PC127500G (2023) https://doi.org/10.1117/12.2687901
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Lithography, Semiconductors, Integrated circuits, Industry, Fiber optic illuminators, Fabrication, Etching

Proceedings Article | 21 November 2023 Presentation + Paper
Cong Que Dinh, Seiji Nagahara, Kanzo Kato, Shinichiro Kawakami, Yuhei Kuwahara, Soichiro Okada, Kayoko Cho, Hikari Tomori, Junji Nakamura, Shoichi Terada, Makoto Muramatsu, Alexandra Krawicz, Kathleen McInerney, Nathan Antonovich, Lior Huli
Proceedings Volume 12750, 1275009 (2023) https://doi.org/10.1117/12.2687434
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Scanners, Photoresist processing, Metals

Proceedings Article | 1 May 2023 Poster + Paper
Proceedings Volume 12498, 1249822 (2023) https://doi.org/10.1117/12.2658880
KEYWORDS: Extreme ultraviolet, Metal oxides, Line edge roughness, Extreme ultraviolet lithography, Optical lithography, Inspection, Interfaces, Etching, Plasma etching, Photoresist processing

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume PC12499, PC1249903 (2023) https://doi.org/10.1117/12.2658971
KEYWORDS: Photoresist materials, Etching, Extreme ultraviolet lithography, Printing, Bridges, Thin film coatings, Stochastic processes, Scanners, Oxides, Metals

Proceedings Article | 30 April 2023 Presentation
Eric Liu, Akiteru Ko, Sophie Thibaut, Katie Lutker-Lee, Steven Grzeskowiak, Alexandra Krawicz, Christopher Cole, Hamed Hajibabaei, Sergey Voronin, Nayoung Bae, Angelique Raley, Lior Huli, Kanzo Kato, David Hetzer, Kathleen Nafus, Seiji Fujimoto, Seiji Nagahara, Satoru Shimura, Shinichiro Kawakami, Congque Dinh, Yuhei Kuwahara, Shigeru Tahara, Masanobu Honda, Tetsuya Nishizuka, Peter Biolsi, Hiromasa Mochiki
Proceedings Volume PC12499, PC124990H (2023) https://doi.org/10.1117/12.2659720
KEYWORDS: Etching, Optical lithography, Lithography, Extreme ultraviolet, Plasma etching, Plasma, Transistors, Semiconducting wafers, Photoresist processing, Photochemistry

Proceedings Article | 11 November 2022 Presentation
Seiji Nagahara, Arnaud Dauendorffer, Xiang Liu, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Sophie Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua LaRose, Jeffrey Shearer, Lior Huli, Philippe Foubert, Danilo De Simone
Proceedings Volume PC12292, PC122920N (2022) https://doi.org/10.1117/12.2642941
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Etching, Plasma etching, Lithography, Yield improvement, Stochastic processes, Plasma, Photoresist materials

Proceedings Article | 31 October 2022 Poster
Kanzo Kato, Lior Huli, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Satoru Shimura, Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Takahiro Kitano, Seiji Nagahara, Akihiro Sonoda
Proceedings Volume PC12292, PC122920Q (2022) https://doi.org/10.1117/12.2642878
KEYWORDS: Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Semiconductors, Oxides, Metals, Integrated circuits, Industrial chemicals, Etching

Proceedings Article | 25 May 2022 Presentation + Paper
Angélique Raley, Lior Huli, Steven Grzeskowiak, Katie Lutker-Lee, Alexandra Krawicz, Yannick Feurprier, Eric Liu, Kanzo Kato, Kathleen Nafus, Arnaud Dauendorffer, Nayoung Bae, Josh LaRose, Andrew Metz, Dave Hetzer, Masanobu Honda, Tetsuya Nishizuka, Akiteru Ko, Soichiro Okada, Yasuyuki Ido, Tomoya Onitsuka, Shinichiro Kawakami, Seiji Fujimoto, Satoru Shimura, Cong Que Dinh, Makoto Muramatsu, Peter Biolsi, Hiromasa Mochiki, Seiji Nagahara
Proceedings Volume 12056, 120560A (2022) https://doi.org/10.1117/12.2613063
KEYWORDS: Plasma etching, Etching, Extreme ultraviolet, Optical lithography, Plasma, Focus stacking software, Semiconducting wafers, Photoresist processing, Extreme ultraviolet lithography, Silicon carbide

Proceedings Article | 28 September 2021 Poster + Presentation
Proceedings Volume 11854, 118541D (2021) https://doi.org/10.1117/12.2602829
KEYWORDS: Optical lithography, Extreme ultraviolet, Photoresist processing, Oxides, Metals, Lithography, Integrated circuits, Extreme ultraviolet lithography, Etching

Showing 5 of 11 publications
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