Mr. Walter Wang Profile

Walter Wang

at Nanya Technology Corp

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 16 April 2011 Paper

A novel double patterning approach for 30nm dense holes

Dennis Shu-Hao Hsu, Walter Wang, Wei-Hsien Hsieh, Chun-Yen Huang, Wen-Bin Wu, Chiang-Lin Shih, Steven Shih

Proceedings Volume 7972, 79720D (2011) https://doi.org/10.1117/12.879374

KEYWORDS: Image processing, Double patterning technology, Optical lithography, Etching, Lithography, Manufacturing, Coating, Extreme ultraviolet, Materials processing, Overlay metrology

Read Abstract +

Proceedings Article | 26 March 2010 Paper

Carbon-rich spin on sidewall material for self-aligned double-patterning technology

Dennis Shu-Hao Hsu, Hiroaki Yaguchi, Rikimaru Sakamoto, Daisuke Maruyama, Yasushi Sakaida, Walter Wang, Chun-Yen Huang, Wen-Bin Wu, Bang-Ching Ho, Chiang-Lin Shih

Proceedings Volume 7639, 763908 (2010) https://doi.org/10.1117/12.846267

KEYWORDS: Ultraviolet radiation, Amplifiers, Double patterning technology, Thin film coatings, Etching, Chemical reactions, Photoresist processing, Diffusion, Polymers, Industrial chemicals

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Developing loading effect on lithography I-line process

Thomas Huang, Walter Wang, Chun-Yen Huang, Nick Tseng, Ting-Jhen Guo, Chiang-Lin Shih, Wen-Bin Wu

Proceedings Volume 7140, 71403J (2008) https://doi.org/10.1117/12.804659

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Lithography, Photomasks, Semiconductor manufacturing, Semiconductors, Manufacturing, Transmittance, Current controlled current source

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years