Mr. Vincent Patoz Profile

Vincent Patoz

Sales Manager at Safran Reosc

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Proceedings Article | 29 March 2011 Paper

Cooled EUV collector optics for LPP and DPP sources

X. Bozec, L. Moine, R. Wevers, S. Djidel, R. Mercier Ythier, R. Geyl, V. Patoz

Proceedings Volume 7969, 79690A (2011) https://doi.org/10.1117/12.876981

KEYWORDS: Mirrors, Extreme ultraviolet, Polishing, EUV optics, Manufacturing, Extreme ultraviolet lithography, Reflectivity, Cooling systems, Scanners, Plasma

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For several years Sagem has invested in technologies and engineering to develop innovative solutions for collecting optics for LPP and DPP EUV sources. Among the technological challenges for collecting mirrors, thermal control plays a very important role in avoiding degradation of in band EUV reflectivity and maintaining far field optical performance during scanner operation. Sagem proposes solutions based on a metallic mirror with embedded cooling circuits to stabilize the temperature of the mirror during source operation. Results of simulation as well as first technology validations obtained on prototypes will be shown to demonstrate the performance of the cooled mirror design. Another critical performance about the collector is the HSFR (micro roughness) requirements of the optical surface for limiting scattering and optimizing the in band EUV reflectivity. Thanks to the specific polishing process, HSFR values of below 2 Angstroms have been achieved on demonstrator metallic mirrors with high departure aspheres. Reflectivity measurements performed after coating of these parts with MoSi multilayers confirm that the obtained polishing quality is compliant with polishing specifications for high performance EUV optics. Finally, upcoming developments at Sagem in the field of EUV collecting optics will be presented.

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