Cooled EUV collector optics for LPP and DPP sources

X. Bozec; L. Moine; R. Wevers; S. Djidel; R. Mercier Ythier; R. Geyl; V. Patoz

doi:10.1117/12.876981

29 March 2011 Cooled EUV collector optics for LPP and DPP sources

X. Bozec, L. Moine, R. Wevers, S. Djidel, R. Mercier Ythier, R. Geyl, V. Patoz

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79690A (2011) https://doi.org/10.1117/12.876981
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

For several years Sagem has invested in technologies and engineering to develop innovative solutions for collecting optics for LPP and DPP EUV sources. Among the technological challenges for collecting mirrors, thermal control plays a very important role in avoiding degradation of in band EUV reflectivity and maintaining far field optical performance during scanner operation. Sagem proposes solutions based on a metallic mirror with embedded cooling circuits to stabilize the temperature of the mirror during source operation. Results of simulation as well as first technology validations obtained on prototypes will be shown to demonstrate the performance of the cooled mirror design. Another critical performance about the collector is the HSFR (micro roughness) requirements of the optical surface for limiting scattering and optimizing the in band EUV reflectivity. Thanks to the specific polishing process, HSFR values of below 2 Angstroms have been achieved on demonstrator metallic mirrors with high departure aspheres. Reflectivity measurements performed after coating of these parts with MoSi multilayers confirm that the obtained polishing quality is compliant with polishing specifications for high performance EUV optics. Finally, upcoming developments at Sagem in the field of EUV collecting optics will be presented.

Citation Download Citation

X. Bozec, L. Moine, R. Wevers, S. Djidel, R. Mercier Ythier, R. Geyl, and V. Patoz "Cooled EUV collector optics for LPP and DPP sources", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690A (29 March 2011); https://doi.org/10.1117/12.876981

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available