Dr. Vidya Ramanathan Profile

Dr. Vidya Ramanathan

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 26 March 2019 Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

Read Abstract +

Proceedings Article | 26 March 2019 Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

Read Abstract +

Proceedings Article | 24 March 2016 Paper

Root cause analysis of overlay metrology excursions with scatterometry overlay technology (SCOL)

Karsten Gutjahr, Dongsuk Park, Yue Zhou, Winston Cho, Ki Cheol Ahn, Patrick Snow, Richard McGowan, Tal Marciano, Vidya Ramanathan, Pedro Herrera, Tal Itzkovich, Janay Camp, Michael Adel

Proceedings Volume 9778, 97781M (2016) https://doi.org/10.1117/12.2219668

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Diffractive optical elements, Metrology, Photovoltaics, Etching, Detection and tracking algorithms, Signal processing, Optical properties

Read Abstract +

Proceedings Article | 24 March 2016 Paper

Improving OCD time to solution using Signal Response Metrology

Fang Fang, Xiaoxiao Zhang, Alok Vaid, Stilian Pandev, Dimitry Sanko, Vidya Ramanathan, Kartik Venkataraman, Ronny Haupt

Proceedings Volume 9778, 977806 (2016) https://doi.org/10.1117/12.2219775

KEYWORDS: Metrology, Optical metrology, Critical dimension metrology, Measurement devices, Time metrology, Lithography, Etching, Semiconducting wafers, Instrument modeling, Transistors, Model-based design, Signal processing, Scatterometry, Scanners, Data modeling, Control systems

Read Abstract +

Proceedings Article | 19 March 2015 Paper

HVM capabilities of CPE run-to-run overlay control

Lokesh Subramany, Woong Jae Chung, Karsten Gutjahr, Miguel Garcia-Medina, Christian Sparka, Lipkong Yap, Onur Demirer, Ramkumar Karur-Shanmugam, Brent Riggs, Vidya Ramanathan, John Robinson, Bill Pierson

Proceedings Volume 9424, 94241V (2015) https://doi.org/10.1117/12.2190852

KEYWORDS: Semiconducting wafers, Overlay metrology, Control systems, Optical parametric oscillators, Scanners, Process control, High volume manufacturing, Metrology, Yield improvement, Error analysis

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Signal response metrology (SRM): a new approach for lithography metrology

Stilian Pandev, Fang Fang, Young Ki Kim, Jamie Tsai, Alok Vaid, Lokesh Subramany, Dimitry Sanko, Vidya Ramanathan, Ren Zhou, Kartik Venkataraman, Ronny Haupt

Proceedings Volume 9424, 94241P (2015) https://doi.org/10.1117/12.2086056

KEYWORDS: Semiconducting wafers, Metrology, Finite element methods, Critical dimension metrology, Scanners, Single crystal X-ray diffraction, Scatterometry, Model-based design, Data modeling, Lithography

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Overlay target selection for 20-nm process on A500 LCM

Vidya Ramanathan, Lokesh Subramany, Tal Itzkovich, Karsten Gutjhar, Patrick Snow, Chanseob Cho, Lipkong Yap

Proceedings Volume 9424, 942424 (2015) https://doi.org/10.1117/12.2086016

KEYWORDS: Overlay metrology, Semiconducting wafers, Back end of line, Etching, Scatterometry, Metrology, Diffractive optical elements, Front end of line, Optical properties, Inspection

Read Abstract +

Proceedings Article | 14 April 2014 Paper

Run time scanner data analysis for HVM lithography process monitoring and stability control

Woong Jae Chung, Young Ki Kim, John Tristan, Jeong Soo Kim, Lokesh Subramany, Chen Li, Brent Riggs, Vidya Ramanathan, Ram Karur-Shanmugam, George Hoo, Jie Gao, Anna Golotsvan, Kevin Huang, Bill Pierson, John Robinson

Proceedings Volume 9050, 90502J (2014) https://doi.org/10.1117/12.2046330

KEYWORDS: Optical alignment, Scanners, Semiconducting wafers, Lithography, Visualization, Data analysis, Statistical analysis, Atomic force microscopy, Visual analytics, Data modeling

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Lithography focus/exposure control and corrections to improve CDU at post etch step

Young Ki Kim, Mark Yelverton, John Tristan, Joungchel Lee, Karsten Gutjahr, Ching-Hsiang Hsu, Hong Wei, Lester Wang, Chen Li, Lokesh Subramany, Woong Jae Chung, Jeong Soo Kim, Vidya Ramanathan, LipKong Yap, Jie Gao, Ram Karur-Shanmugam, Anna Golotsvan, Pedro Herrera, Kevin Huang, Bill Pierson

Proceedings Volume 9050, 90501Y (2014) https://doi.org/10.1117/12.2045433

KEYWORDS: Semiconducting wafers, Etching, Lithography, Finite element methods, Scatterometry, Critical dimension metrology, Factory automation, Scanners, High volume manufacturing, Scatter measurement

Read Abstract +

Proceedings Article | 2 April 2014 Paper

20nm MOL overlay case study

Lokesh Subramany, Michael Hsieh, Chen Li, Hui Peng Koh, David Cho, Anna Golotsvan, Vidya Ramanathan, Ramkumar Karur Shanmugam, Lipkong Yap

Proceedings Volume 9050, 90502Q (2014) https://doi.org/10.1117/12.2046598

KEYWORDS: Overlay metrology, Semiconducting wafers, Chemical mechanical planarization, Optical alignment, Metrology, Image quality, Optical filters, Image processing, Reticles, Scanners

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Integrated production overlay field-by-field control for leading edge technology nodes

Woong Jae Chung, John Tristan, Karsten Gutjahr, Lokesh Subramany, Chen Li, Yulei Sun, Mark Yelverton, Young Ki Kim, Jeong Soo Kim, Chin-Chou Kevin Huang, William Pierson, Ramkumar Karur-Shanmugam, Brent Riggs, Sven Jug, John Robinson, Lipkong Yap, Vidya Ramanathan

Proceedings Volume 9050, 90501P (2014) https://doi.org/10.1117/12.2046076

KEYWORDS: Scanners, Semiconducting wafers, Overlay metrology, Control systems, Statistical modeling, Error analysis, Data modeling, Optical lithography, Process control, Atomic force microscopy

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years