Dr. Dongyue Yang
Sr. Process Eng at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11327, 113270O (2020) https://doi.org/10.1117/12.2551904
KEYWORDS: Semiconducting wafers, Lithography, Critical dimension metrology, Diffraction, Scanners, Yield improvement, High volume manufacturing, Metrology, Wafer-level optics, Process control

Proceedings Article | 26 March 2019 Presentation + Paper
Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548
KEYWORDS: Overlay metrology, Scatterometry, Process control

Proceedings Article | 26 March 2019 Paper
Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati
Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725
KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

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