Mr. Tadashi Arai Profile

Tadashi Arai

at Canon Inc

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Author

Publications (6)

Proceedings Article | 12 April 2013 Paper

Sub-12nm optical lithography with 4x pitch division and SMO-lite

Michael Smayling, Koichiro Tsujita, Hidetami Yaegashi, Valery Axelrad, Tadashi Arai, Kenichi Oyama, Arisa Hara

Proceedings Volume 8683, 868305 (2013) https://doi.org/10.1117/12.2011329

KEYWORDS: Optical lithography, Photomasks, Logic, Optical proximity correction, Double patterning technology, Semiconducting wafers, Transmission electron microscopy, Source mask optimization, Neodymium, Etching

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Proceedings Article | 8 November 2012 Paper

Improvement of lithographic performance and reduction of mask cost by simple OPC

Koichiro Tsujita, Koji Mikami, Hiroyuki Ishii, Tadashi Arai, Ryo Nakayama, Michael Smayling, Valery Axelrad, Hidetami Yaegashi, Kenichi Oyama

Proceedings Volume 8522, 852209 (2012) https://doi.org/10.1117/12.961118

KEYWORDS: Photomasks, Optical proximity correction, Source mask optimization, Metals, Lithography, Photovoltaics, Semiconducting wafers, Scanning electron microscopy, SRAF, Inspection

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Proceedings Article | 23 March 2011 Paper

Supreme lithographic performance by simple mask layout based on lithography and layout co-optimization

Koichiro Tsujita, Tadashi Arai, Hiroyuki Ishii, Yuichi Gyoda, Kazuhiro Takahashi, Valery Axelrad, Michael Smayling

Proceedings Volume 7973, 79730D (2011) https://doi.org/10.1117/12.878663

KEYWORDS: Photomasks, Lithography, Optical proximity correction, SRAF, Lithographic illumination, Source mask optimization, Binary data, Double patterning technology, Computer programming, Nanoimprint lithography

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Proceedings Article | 4 March 2010 Paper

Lithography and layout co-optimization beyond conventional OPC concept

Koichiro Tsujita, Koji Mikami, Hiroyuki Ishii, Tadashi Arai, Kazuhiro Takahashi

Proceedings Volume 7640, 76401A (2010) https://doi.org/10.1117/12.846264

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Source mask optimization, Manufacturing, Lithographic illumination, Scanners, Optical lithography, Composites, Logic devices

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Proceedings Article | 16 March 2009 Paper

Advanced aberration control in projection optics for double patterning

Toshiyuki Yoshihara, Takashi Sukegawa, Nobuhiko Yabu, Masatoshi Kobayashi, Tadashi Arai, Tsuyoshi Kitamura, Atsushi Shigenobu, Yasuo Hasegawa, Kazuhiro Takahashi

Proceedings Volume 7274, 72741L (2009) https://doi.org/10.1117/12.813625

KEYWORDS: Projection systems, Double patterning technology, Monochromatic aberrations, Reticles, Polarization, Wavefront aberrations, Overlay metrology, Distortion, Laser induced plasma spectroscopy, Lithography

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Proceedings Article | 1 April 2008 Paper

Optimization procedure of exposure tools with polarization aberrations

Tadashi Arai, Akihiro Yamada, Kenichiro Mori, Yoshinori Osaki, Toshiyuki Yoshihara, Yasuo Hasegawa

Proceedings Volume 6924, 69241I (2008) https://doi.org/10.1117/12.771962

KEYWORDS: Polarization, Projection systems, Birefringence, Jones matrices, Distortion, Metrology, Laser induced plasma spectroscopy, Optical simulations, Wavefront aberrations, Image processing

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Showing 5 of 6 publications

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