Dr. Sven E. Henrichs Profile

Dr. Sven E. Henrichs

Senior Technologist at Intel Corp

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Author

Publications (7)

Proceedings Article | 29 May 2007 Paper

Progress on EUV mask fabrication for 32-nm technology node and beyond

Guojing Zhang, Pei-Yang Yan, Ted Liang, Seh-jin Park, Peter Sanchez, Emily Shu, Erdem Ultanir, Sven Henrichs, Alan Stivers, Gilroy Vandentop, Barry Lieberman, Ping Qu

Proceedings Volume 6607, 66070R (2007) https://doi.org/10.1117/12.728941

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Inspection, Extreme ultraviolet, Multilayers, Reflectivity, Etching, Mask making, Metrology, Defect inspection

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Proceedings Article | 5 April 2007 Paper

Scatterometry measurement of nested lines, dual space, and rectangular contact CD on phase-shift masks

Kyung Lee, Sanjay Yedur, Sven Henrichs, Malahat Tavassoli, Kiho Baik

Proceedings Volume 6518, 651856 (2007) https://doi.org/10.1117/12.729246

KEYWORDS: Critical dimension metrology, Photomasks, Cadmium, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Scatter measurement, Lithography, Binary data, Metrology

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Proceedings Article | 21 March 2007 Paper

Design for manufacturing approach to second level alternating phase shift mask patterning

Sven Henrichs, Mahesh Chandramouli, Min Chun Tsai

Proceedings Volume 6521, 65211W (2007) https://doi.org/10.1117/12.712297

KEYWORDS: Neodymium, Photomasks, Optical lithography, Tolerancing, Phase shifts, Manufacturing, Design for manufacturing, Data conversion, Overlay metrology, Lithography

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Proceedings Article | 24 March 2006 Paper

CD-etch depth measurement from advanced phase-shift masks and wafers using optical scatterometry

Kyung Lee, Sanjay Yedur, Sven Henrichs, Malahat Tavassoli

Proceedings Volume 6152, 61521P (2006) https://doi.org/10.1117/12.655642

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Scatterometry, Semiconducting wafers, Scatter measurement, Cadmium, Photomasks, Quartz, Atomic force microscopy, Etching

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Proceedings Article | 15 March 2006 Paper

Alt- phase-shift mask technology for 65nm logic applications

Kishore Chakravorty, Sven Henrichs, Wei Qiu, Joas Chavez, Yi-Ping Liu, Firoz Ghadiali, Karmen Yung, Nathan Wilcox, Mary Silva, Jian Ma, Ping Qu, Brian Irvine, Henry Yun, Wen-Hao Cheng, Jeff Farnsworth

Proceedings Volume 6154, 61540M (2006) https://doi.org/10.1117/12.654691

KEYWORDS: Quartz, Photomasks, Manufacturing, Etching, Optical lithography, Logic, Critical dimension metrology, Phase shifts, Optical proximity correction, Reticles

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Proceedings Article | 5 November 2005 Paper

Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask

Jian Ma, Ke Han, Kyung Lee, Yulia Korobko, Mary Silva, Joas Chavez, Brian Irvine, Sven Henrichs, Kishore Chakravorty, Robert Olshausen, Mahesh Chandramouli, Bobby Mammen, Ramaswamy Padmanaban

Proceedings Volume 5992, 59921P (2005) https://doi.org/10.1117/12.632160

KEYWORDS: Overlay metrology, Neodymium, Quartz, Chromium, Photomasks, Tolerancing, Phase shifts, Etching, Scanning electron microscopy, Optical testing

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Proceedings Article | 28 June 2005 Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359

KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

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Showing 5 of 7 publications

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