Mr. Robert H. Olshausen Profile

Robert H. Olshausen

Senior Process Engineer at Intel Corp

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Author

Publications (3)

Proceedings Article | 5 November 2005 Paper

Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask

Jian Ma, Ke Han, Kyung Lee, Yulia Korobko, Mary Silva, Joas Chavez, Brian Irvine, Sven Henrichs, Kishore Chakravorty, Robert Olshausen, Mahesh Chandramouli, Bobby Mammen, Ramaswamy Padmanaban

Proceedings Volume 5992, 59921P (2005) https://doi.org/10.1117/12.632160

KEYWORDS: Overlay metrology, Neodymium, Quartz, Chromium, Photomasks, Tolerancing, Phase shifts, Etching, Scanning electron microscopy, Optical testing

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Proceedings Article | 5 November 2005 Paper

Production performance of a Sigma7300 DUV mask writer

Bob Olshausen, Mahesh Chandramouli, Dustin Wall, Bruce Auches, Damon Cole

Proceedings Volume 5992, 59920V (2005) https://doi.org/10.1117/12.633167

KEYWORDS: Spatial light modulators, Binary data, Deep ultraviolet, Neodymium, Electron beam lithography, Calibration, Data conversion, Overlay metrology, Critical dimension metrology, Photoresist processing

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Proceedings Article | 28 June 2005 Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359

KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

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