Dr. Stefan R. Brandl
at Osram Opto Semiconductors
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69231Y (2008) https://doi.org/10.1117/12.771221
KEYWORDS: Semiconducting wafers, Particles, Head, Scanning electron microscopy, Photoresist processing, Coating, Water, Modulation, Scanners, Interfaces

Proceedings Article | 5 April 2007 Paper
E. Golan, D. Meshulach, N. Raccah, J. Ho. Yeo, O. Dassa, S. Brandl, C. Schwarz, B. Pierson, W. Montgomery
Proceedings Volume 6518, 65180S (2007) https://doi.org/10.1117/12.712400
KEYWORDS: Immersion lithography, Deep ultraviolet, Inspection, Semiconducting wafers, Scanners, Lithography, Water, Defect inspection, Defect detection, Optical resolution

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615306 (2006) https://doi.org/10.1117/12.655725
KEYWORDS: Semiconducting wafers, Photomasks, Immersion lithography, Photoresist processing, Line edge roughness, Lithography, Temperature metrology, Particles, Scanners, Head

Proceedings Article | 22 March 2006 Open Access Paper
Proceedings Volume 6151, 615101 (2006) https://doi.org/10.1117/12.663785
KEYWORDS: Nanotechnology, Immersion lithography, Water, Lithography, Semiconductors, Semiconducting wafers, Photoresist developing, Thin film coatings, Scanners, Photoresist materials

Proceedings Article | 20 March 2006 Paper
Proceedings Volume 6154, 61540T (2006) https://doi.org/10.1117/12.656697
KEYWORDS: Semiconducting wafers, Digital watermarking, Photoresist processing, Polymers, Scanners, Coating, Defect inspection, Standards development, Platinum, Bridges

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